二手 TEL / TOKYO ELECTRON Alpha 8SE #182012 待售
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ID: 182012
TEOS furnace, L-type
Medium temperature
General Configuration:
Safety Specification: TEL Standard
System Layout Type: 200mm configuration
System Paint Color: Biege white
Furnace Front Surface Finish: Painted / SS
Process Pressure (Torr): N/A
Process Temperature (ºC): 1000 (Max)
FTP Heater: Not Installed
Rapid Cooling Unit: Not Installed
Heater Type: Mid Temp VMM-40-101
Process Gasses:
Process Gas 1: N2 -
Process Gas 2: O2 -
Process Gas 3: ClF3
Process Gas 4: TEOS
Cleaning Gas 1: SETC-TEOS 200cc
Cleaning Gas 2: N/A
Gas Distribution System:
Basic Style: Integrated Gas System (Fujikin)
Tubing Material: Stainless Steel
Tubing Finish: Electro-polished
Tubing Bends: Mechanical Bends OK
Manual Valve: Fujikin
Air-Operated Valve: Fujikin
Filter: Millipore
Regulator: Fujikin
MFC: AERA
Press. Transducer: MKS/NAGANO KEIKI
Press. Transducer Display Reference: Compound
External Torch Unit: Std Flow Torch
Vaporizor: N/A
Liquid Source Auto-Refill: N/A
Auto-Refill Provided By: N/A
Auto-Refill Tubing Interconnect By: N/A
Auto-Refill Power Provided By: N/A
Gas System Schem. Dwg / Parts List: TEL Supplied
Panel Heater for Furnace Opening: N/A
Wafer/Cassette Handling:
Wafer Type: 200mm SEMI STD Notch
Wafer Notch / Flat Aligner: Installed
Cassette Type: Fluoroware KA200-80MHR
Cassette -Number of Wafers: 26
Cassette Storage Qty.: 21 or 16
Monitor Cassette Operation: IN In-batch/OUT In-batch
Cassette In-Out Sequence: In -P1,P2,..,M / Out -P1,P2,..,M
Transfer-stage Protrusion Sensor: Installed
Fork Type/Material: 1+4 / Al203
Fork -Wafer Presence Sensor: Installed
Fork -Wafer Position Sensor or Guide: Installed (Position Sensor)
Fork -Variable Pitch: Installed
Wafer Loading/Unloading Sequence: ED-->P-->M / M-->P-->ED
System Controls:
System Controller: Waves
Remote MMI and Gas Flowchart: FPD & GFC Installed
Signal Tower / Colors: Installed / 4-Color
Signal Tower Location(s): (Furnace Front)
Temperature Control:
Furnace Temperature Controller: M560A
Facility Elect. -Equip. Pwr Input( 2 line):
Voltage 3phase: 208VAC, 125A, 50Hz
Voltage 1phase: 100VAC, 50A, 50 Hz.
TEL/TOKYO ELECTRON ALPHA 8SE是一种用于生产外延离子植入晶片的扩散炉及辅助设备。该系统适用于中大规模生产用于制造计算机芯片等电子元件的半导体晶片。TEL ALPHA-8SE扩散炉的温度范围为400°C至1050°C,并装有多个GaAs源。四个独立调节的石英灯可在整个晶片表面提供稳态均匀加热。此外,该单元还提供了专有的控制算法,允许用户对石英灯的激活和停用序列进行编程。炉内设计为减少污染,有陶瓷衬里腔室和可拆卸的内熔壳衬里,便于清洗。本机设有两个同心锁载室,方便安全地装卸晶片。还包括一个自动卡带到卡带传输工具,以提高效率。这项资产还承认使用先进的光学识别模型来改进晶片的处理的形状和大小不同的晶片的存在。TOKYO ELECTRON ALPHA-8 SE扩散炉设计具有自动关闭设备和接地故障电路中断器等安全特性。该系统还具有编程的报警/记录功能,可以提醒操作员当前和潜在的问题。其他功能如成熟的计算机接口和远程操作也可用。总体而言,TOKYO ELECTRON ALPHA 8SE扩散炉及其附件是一种高效、准确的半导体晶圆生产应用解决方桉。该机为外延离子植入晶片的高精度制造提供了安全可靠的环境。先进的控制工具和附件为操作员提供了提高晶圆产量的必要工具。
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