二手 TEL / TOKYO ELECTRON Alpha 8SE #182012 待售

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ID: 182012
TEOS furnace, L-type Medium temperature General Configuration: Safety Specification: TEL Standard System Layout Type: 200mm configuration System Paint Color: Biege white Furnace Front Surface Finish: Painted / SS Process Pressure (Torr): N/A Process Temperature (ºC): 1000 (Max) FTP Heater: Not Installed Rapid Cooling Unit: Not Installed Heater Type: Mid Temp VMM-40-101 Process Gasses: Process Gas 1: N2 - Process Gas 2: O2 - Process Gas 3: ClF3 Process Gas 4: TEOS Cleaning Gas 1: SETC-TEOS 200cc Cleaning Gas 2: N/A Gas Distribution System: Basic Style: Integrated Gas System (Fujikin) Tubing Material: Stainless Steel Tubing Finish: Electro-polished Tubing Bends: Mechanical Bends OK Manual Valve: Fujikin Air-Operated Valve: Fujikin Filter: Millipore Regulator: Fujikin MFC: AERA Press. Transducer: MKS/NAGANO KEIKI Press. Transducer Display Reference: Compound External Torch Unit: Std Flow Torch Vaporizor: N/A Liquid Source Auto-Refill: N/A Auto-Refill Provided By: N/A Auto-Refill Tubing Interconnect By: N/A Auto-Refill Power Provided By: N/A Gas System Schem. Dwg / Parts List: TEL Supplied Panel Heater for Furnace Opening: N/A Wafer/Cassette Handling: Wafer Type: 200mm SEMI STD Notch Wafer Notch / Flat Aligner: Installed Cassette Type: Fluoroware KA200-80MHR Cassette -Number of Wafers: 26 Cassette Storage Qty.: 21 or 16 Monitor Cassette Operation: IN In-batch/OUT In-batch Cassette In-Out Sequence: In -P1,P2,..,M / Out -P1,P2,..,M Transfer-stage Protrusion Sensor: Installed Fork Type/Material: 1+4 / Al203 Fork -Wafer Presence Sensor: Installed Fork -Wafer Position Sensor or Guide: Installed (Position Sensor) Fork -Variable Pitch: Installed Wafer Loading/Unloading Sequence: ED-->P-->M / M-->P-->ED System Controls: System Controller: Waves Remote MMI and Gas Flowchart: FPD & GFC Installed Signal Tower / Colors: Installed / 4-Color Signal Tower Location(s): (Furnace Front) Temperature Control: Furnace Temperature Controller: M560A Facility Elect. -Equip. Pwr Input( 2 line): Voltage 3phase: 208VAC, 125A, 50Hz Voltage 1phase: 100VAC, 50A, 50 Hz.
TEL/TOKYO ELECTRON ALPHA 8SE是一种用于生产外延离子植入晶片的扩散炉及辅助设备。该系统适用于中大规模生产用于制造计算机芯片等电子元件的半导体晶片。TEL ALPHA-8SE扩散炉的温度范围为400°C至1050°C,并装有多个GaAs源。四个独立调节的石英灯可在整个晶片表面提供稳态均匀加热。此外,该单元还提供了专有的控制算法,允许用户对石英灯的激活和停用序列进行编程。炉内设计为减少污染,有陶瓷衬里腔室和可拆卸的内熔壳衬里,便于清洗。本机设有两个同心锁载室,方便安全地装卸晶片。还包括一个自动卡带到卡带传输工具,以提高效率。这项资产还承认使用先进的光学识别模型来改进晶片的处理的形状和大小不同的晶片的存在。TOKYO ELECTRON ALPHA-8 SE扩散炉设计具有自动关闭设备和接地故障电路中断器等安全特性。该系统还具有编程的报警/记录功能,可以提醒操作员当前和潜在的问题。其他功能如成熟的计算机接口和远程操作也可用。总体而言,TOKYO ELECTRON ALPHA 8SE扩散炉及其附件是一种高效、准确的半导体晶圆生产应用解决方桉。该机为外延离子植入晶片的高精度制造提供了安全可靠的环境。先进的控制工具和附件为操作员提供了提高晶圆产量的必要工具。
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