二手 KOKUSAI Quixace II NITRIDE #9182061 待售
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ID: 9182061
晶圆大小: 12"
优质的: 2007
Vertical LPCVD furnace, 12"
Cartridge heater
Heater control
Over-temperature
Thyristor unit for control
I/O Shutter stage: AGV / PGV / OHT Stage
FOUP Loader
Rotation FOUP storage
FOUP Opener
Wafer detection
Wafer transfer
Variable wafer pitch converter
Boat elevator
Boat changer
Furnace port shutter
Boat rotation
AWTC Port
Flange-upper
Flange-lower
Quartz boat
Quartz outer tube
Quartz inner tube
Quartz adiabatic plate
Quartz boat fixing ring
Quartz nozzle 1: D4CN55589
Quartz nozzle 2: D4KN31319#D
Quartz boat fixing ring
Quartz boat
Quartz outer tube
Quartz inner tube
Quartz adiabatic plate
Quartz nozzle 1: D4CN55589
Quartz nozzle 2: D4KN31319#D
Quartz nozzle 3: D5CP15682
Quartz nozzle 4: D5CP15683
Quartz nozzle 5: D5CP15684
Quartz boat fixing ring
SiC Boat
Quartz outer tube
SiC inner tube
SiC adiabatic plate
Quartz nozzle 1
Quartz nozzle 2
Quartz boat fixing ring
Gas unit (IGS): D4VX38302
Tape heater:
Gas pipe 1: D4EX19130
Gas pipe 2: D4EX19131
Diffuser: D4CX33281
Mass flow controller: FC-PA785T-BW-TC Series
Filter: WGSLS Series
Regulator: PGM Series
Pressure gauge: ZT16-S01
Hand valve: MMGD5-11D-W Series
Check valve 1: MCGP5-F1X1 Series
Needle valve: MMGD5-11D-W Series
Air valve: MAGD5 Series
Connection & fittings: VCR / UPG / SWG
MFC 1: NH3, 0.5SLM
MFC 2: N2, 30SLM
MFC 3: SiH2Cl2, 0.2SLM
MFC 4: SiH2Cl2, 0.2SLM
MFC 5: SiH2Cl2, 0.2SLM
MFC 6: SiH2Cl2, 0.2SLM
MFC 7: NH3, 2SLM
MFC 8: NH3, 0.5SLM
MFC 9: NH3, 0.3SLM
MFC 10: NH3, 0.3SLM
MFC 11: NH3, 0.3SLM
MFC 12: NF3, 1SLM
Vacuum sensor (VG11): 1000 Torr
Vacuum sensor (VG12)
Vacuum sensor (VG13): 2 Torr
Vacuum sensor monitor
Main valve: VEC-SHA8-X0327
Exhaust piping: D4CX38671
Exhaust dilution line: D4CX38671
Reactor tube press leak line: D4CX38671
Jacket heater: 150° C
Exhaust pipe: 150° C
Process effluent trap: MKS
Baratron vacuum calibration port
Inlet flange heater: ESH-12964-01
(2) Injector port heaters:
ESH-12965-01
ESH-12966-01
Seal cap heater: ESH-12450-02
O2 Monitor / Detector
FOUP Opener system
N2 Purge system
Load area MFC
Loading area
Furnace port
Radiator
Filters:
Carbon / Chemical 1 filters
Carbon / Chemical 2 filters
Carbon / Chemical 3 filters
Main operation controller: SW Rev 01.05.05
EDA Controller: SW Rev 01.00.02
DDC Temperature controller: SW Rev 06.00.00
Process module controller: SW Rev 01.05.05
Wafer handling controller: SW Rev 02.04.06
(2) FOUP I/O
FOUP RFID Reader
Wafer mapping sensor: F3M-S1225
FOUP Sensor: E3T-ST11
SECS/GEM Communication: SW Rev 06.01.02
Includes:
Hazardous gases
Manual
Shut off valve
Lock out / Tag out
Electrical: Lock out / Tag out
Robot: Lock out / Tag out.
KOKUSAI Quixace II NITRIDE是专为氮化物加工而设计的扩散炉。它是在基板上沉积氮化物层以及各种金属和其他材料的有效和可靠的工具。它的高级设计和模块化结构为用户的生产过程提供了更大的灵活性。该炉先进的氮气注入设备确保所有氮化物过程在必要的受控环境下进行。该系统是可调的,可以根据每种基材的特定工艺要求量身定制,从而产生卓越的氮化物质量和可靠性。该装置还提供精确的扩散温度和时间控制,使得可重复和一致的结果。炉子的高性能得到了各种通用配件的进一步补充。其中有一台用于更快工艺初创企业的快速降泵机、一个用于高温退火的加权箱室和一个便于快速冷却的盖箱炉。所包括的自动气体控制工具为用户提供了为氮化物工艺预处理多种气体的能力。Quixace II NITRIDE还具有一系列安全功能,可帮助维护安全环境。其中包括多点报警资产、互锁诊断模型和过程监控设备。所有这些系统确保用户在沉积过程中能够保持对炉子的完全控制。KOKUSAI Quixace II NITRIDE扩散炉是一种先进可靠的氮化物加工工具以及一系列其他材料。其氮气喷射控制系统、种类繁多的配件和方便用户的操作,使其成为同类最高效可靠的扩散炉之一。结合其可用的安全功能,它是广泛工业应用的完美工具。
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