二手 KOKUSAI Quixace II NITRIDE #9182061 待售

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ID: 9182061
晶圆大小: 12"
优质的: 2007
Vertical LPCVD furnace, 12" Cartridge heater Heater control Over-temperature Thyristor unit for control I/O Shutter stage: AGV / PGV / OHT Stage FOUP Loader Rotation FOUP storage FOUP Opener Wafer detection Wafer transfer Variable wafer pitch converter Boat elevator Boat changer Furnace port shutter Boat rotation AWTC Port Flange-upper Flange-lower Quartz boat Quartz outer tube Quartz inner tube Quartz adiabatic plate Quartz boat fixing ring Quartz nozzle 1: D4CN55589 Quartz nozzle 2: D4KN31319#D Quartz boat fixing ring Quartz boat Quartz outer tube Quartz inner tube Quartz adiabatic plate Quartz nozzle 1: D4CN55589 Quartz nozzle 2: D4KN31319#D Quartz nozzle 3: D5CP15682 Quartz nozzle 4: D5CP15683 Quartz nozzle 5: D5CP15684 Quartz boat fixing ring SiC Boat Quartz outer tube SiC inner tube SiC adiabatic plate Quartz nozzle 1 Quartz nozzle 2 Quartz boat fixing ring Gas unit (IGS): D4VX38302 Tape heater: Gas pipe 1: D4EX19130 Gas pipe 2: D4EX19131 Diffuser: D4CX33281 Mass flow controller: FC-PA785T-BW-TC Series Filter: WGSLS Series Regulator: PGM Series Pressure gauge: ZT16-S01 Hand valve: MMGD5-11D-W Series Check valve 1: MCGP5-F1X1 Series Needle valve: MMGD5-11D-W Series Air valve: MAGD5 Series Connection & fittings: VCR / UPG / SWG MFC 1: NH3, 0.5SLM MFC 2: N2, 30SLM MFC 3: SiH2Cl2, 0.2SLM MFC 4: SiH2Cl2, 0.2SLM MFC 5: SiH2Cl2, 0.2SLM MFC 6: SiH2Cl2, 0.2SLM MFC 7: NH3, 2SLM MFC 8: NH3, 0.5SLM MFC 9: NH3, 0.3SLM MFC 10: NH3, 0.3SLM MFC 11: NH3, 0.3SLM MFC 12: NF3, 1SLM Vacuum sensor (VG11): 1000 Torr Vacuum sensor (VG12) Vacuum sensor (VG13): 2 Torr Vacuum sensor monitor Main valve: VEC-SHA8-X0327 Exhaust piping: D4CX38671 Exhaust dilution line: D4CX38671 Reactor tube press leak line: D4CX38671 Jacket heater: 150° C Exhaust pipe: 150° C Process effluent trap: MKS Baratron vacuum calibration port Inlet flange heater: ESH-12964-01 (2) Injector port heaters: ESH-12965-01 ESH-12966-01 Seal cap heater: ESH-12450-02 O2 Monitor / Detector FOUP Opener system N2 Purge system Load area MFC Loading area Furnace port Radiator Filters: Carbon / Chemical 1 filters Carbon / Chemical 2 filters Carbon / Chemical 3 filters Main operation controller: SW Rev 01.05.05 EDA Controller: SW Rev 01.00.02 DDC Temperature controller: SW Rev 06.00.00 Process module controller: SW Rev 01.05.05 Wafer handling controller: SW Rev 02.04.06 (2) FOUP I/O FOUP RFID Reader Wafer mapping sensor: F3M-S1225 FOUP Sensor: E3T-ST11 SECS/GEM Communication: SW Rev 06.01.02 Includes: Hazardous gases Manual Shut off valve Lock out / Tag out Electrical: Lock out / Tag out Robot: Lock out / Tag out.
KOKUSAI Quixace II NITRIDE是专为氮化物加工而设计的扩散炉。它是在基板上沉积氮化物层以及各种金属和其他材料的有效和可靠的工具。它的高级设计和模块化结构为用户的生产过程提供了更大的灵活性。该炉先进的氮气注入设备确保所有氮化物过程在必要的受控环境下进行。该系统是可调的,可以根据每种基材的特定工艺要求量身定制,从而产生卓越的氮化物质量和可靠性。该装置还提供精确的扩散温度和时间控制,使得可重复和一致的结果。炉子的高性能得到了各种通用配件的进一步补充。其中有一台用于更快工艺初创企业的快速降泵机、一个用于高温退火的加权箱室和一个便于快速冷却的盖箱炉。所包括的自动气体控制工具为用户提供了为氮化物工艺预处理多种气体的能力。Quixace II NITRIDE还具有一系列安全功能,可帮助维护安全环境。其中包括多点报警资产、互锁诊断模型和过程监控设备。所有这些系统确保用户在沉积过程中能够保持对炉子的完全控制。KOKUSAI Quixace II NITRIDE扩散炉是一种先进可靠的氮化物加工工具以及一系列其他材料。其氮气喷射控制系统、种类繁多的配件和方便用户的操作,使其成为同类最高效可靠的扩散炉之一。结合其可用的安全功能,它是广泛工业应用的完美工具。
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