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580 結果發現: 用過的 Mask Aligners

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  • SVG / PERKIN ELMER / ASML: MICRALIGN 640

    Projection mask alignment system.
  • NIKON PROJECTION ALIGNER

    NIKON: PROJECTION ALIGNER

    System 100 V, 50 / 60 Hz, 6 A.
  • CANON MPA 600 FA

    CANON: MPA 600 FA

    Aligners, 4"-6" Mask sizes: 5”-7” Resolution: 1.5 um (Using positive resist) Illumination: High pressure mercury lamp: 2 kW Wavelengths: 365nm (I-Line), 405nm (H-line), 436nm (G-line) Intensity: (@ 1800 Watts power output) >700mW, 4" >650mW, 5" >600mW, 6" Intensity / Exposure uniformity: Within ± 3% CTC: Monitors and controls system temperature within ±3°C PDC: Provides fine distortion compensation Automatic alignment: HeNe (633nm) Laser beam scanning Alignment modes: Spot beam / Sheet beam Accuracy: 3 Sigma <=.54um Required facilities: MPA-600FA: 200 VAC, 3-Phase, 6 kVA, 50/60 Hz Air supply (CTC): 200 VAC, 3-Phase, 8 kVA, 50/60 Hz CDA (Clean dry air) Pressure: Flow rate 130 lit/min Vacuum: >50 cmHg Exhaust flow (For illuminator): 6.5 m/sec - 9.5 m/sec (Measured at illuminator output).
  • CANON: PLA 501 S

    Aligner, 3"-4" IR Back side alignment.
  • SVG / PERKIN ELMER / ASML 340HT

    SVG / PERKIN ELMER / ASML: 340HT

    Aligner System can be modified to any configuration.
  • CANON PLA 600 FA

    CANON: PLA 600 FA

    Aligners, 4"-6" With 500W UV or DUV Illumination system Print resolution:1 mu.
  • KARL SUSS / MICROTEC MA 24

    KARL SUSS / MICROTEC: MA 24

    Aligner, 4" Alignment accuracy (between upper and lower side of the wafer): <2 Microns Alignment table rotation: <2° Double side exposure Cassette to cassette handling Bright field and dark field illumination Diffraction reducing optical systems 350W HBO Lamps.
  • CANON PLA 500 FA

    CANON: PLA 500 FA

    Mask aligner.
  • ORIEL / NEWPORT -

    ORIEL / NEWPORT: -

    Mask aligner Collimated lens: 10" Diameter Calibrated stereo zoom optics Sliding mask alignment fixture and microscope Choice of: 6 x 6" masks for 5" wafers 7 x 7" masks for 6" wafers 9 x 9" masks for 8" wafers.
  • KARL SUSS / MICROTEC MA 6

    KARL SUSS / MICROTEC: MA 6

    Mask aligner, 4" 6" Capable (With kit) Topside alignment / Exposure only With 1000W lamp Split field microscope Power supply: 350 / 500 / 1000.
  • KARL SUSS / MICROTEC MA 4

    KARL SUSS / MICROTEC: MA 4

    Mask aligner, 4" Hard / soft contact modes (1) Micron resolution Split field video optics Requires 115V, house nitrogen or CDA, house vacuum Power supply: 350 Watt.
  • JAPAN SCIENCE ENGINEERING: MA-4200

    Mask aligner, 2" 2007 vintage.
  • DNK MA-4200

    DNK: MA-4200

    Mask aligner.
  • CANON: PLA-501FA

    Aligners, 4"and 5".
  • KARL SUSS / MICROTEC MA-150
  • EVG / EV GROUP 620

    EVG / EV GROUP: 620

    Mask aligner, 4" BSA Lamphouse: 500W Automatic filter exchanger Conversion kit: 6" 2008 vintage.
  • EVG / EV GROUP 6200

    EVG / EV GROUP: 6200

    Double sided mask aligner.
  • KARL SUSS / MICROTEC MJB-21

    KARL SUSS / MICROTEC: MJB-21

    Double sided mask aligner (2) 350 Watt lamp houses UV 400 Optics (2) Internal sensors: 65nm / 405nm (2) SUSS CIC 500 Constant intensity UV power supplies SUSS Split-field bottom side microscope: (2) 150 Watt fiber optic microscope illuminators (2) 10x Objectives (2) 10x Eyepieces Proximity Soft contact capable Soft contact chuck (2) Mask holders Manuals.
  • KARL SUSS / MICROTEC MA 6

    KARL SUSS / MICROTEC: MA 6

    Mask aligner Lamp power supply CIC00/1000 for constant power and constant intensity Exposure optics: UV400 Exposure timer M204 Splitfield microscope with photo tubes Included: (10) Occulars Set of objectives OLYMPUS MPlan FL N 10x/0,30 Mask holder bottom loading, 5" Wafer diameter: 100 mm Chuck specification for substrates / 100 mm wafer for soft contact.
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