二手 TEL / TOKYO ELECTRON Alpha 303i-K #9373155 待售
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ID: 9373155
晶圆大小: 12"
优质的: 2006
Vertical LPCVD furnace, 12"
Process: TEOS
(100) Process wafers
I/O Port / SMIF: FOUP
No load lock
25-Carrier slots
Boat type: Single
Main controller (WAVES)
Operation screen: Touch screen
Gas flow chart: Front and rear
M560 Temperature controller
Vacuum pressure control: CKD VEC
Controller transformer: 208 V, Single phase
Heater transformer: 208 V, 3 Phase
Gases:
Gas 1: N2
Gas 2: N2
Gas 3: O2
Gas 4: TEOS
Gas 5: N2
Gas distribution:
Basic style: Conventional
Tubing material: SUS-316L
Tubing finish: VCR
Manual valve: CKD
Air operated valve: CKD
MFC: HORIBA STEC
Exhaust distribution:
Air operated valve type: IGS Connect
Main valve: CKD VEC
Cold trap
No pump line
Wafer / Cassette handling:
(16) Cassette storage
Cassette In/Out port
Cassette handling robot
Wafer transfer type: 1 + 4
Fork material: AL2O3
Fork variable pitch
Fork wafer presence sensor
Elevator handling:
Boat elevator
Auto shutter
Boat rotation
Mechanical parts
Heating chamber:
Heater type: VMM-56-002, 100 wfs
(5) T/C Type
(5) Spike T/C
Furnace cabinets includes clean air flow system
Scavenger and water cooling unit
Power supply unit (U/P Box):
Control unit
Transformers
SCR
Breaker unit
FOUP and wafer handling automation:
(2) FOUP Load ports
FOUP Transfer
Stocker: (18) FOUPs
FIMS Port
KHI Wafer load automation
Variable pitch change mechanism with (5) forks
Auto tube shutter
Boat elevator with boat rotation mechanism
Integrated gas system in gas cabinet and TEOS LSC baking system:
O2 Gas line
TEOS Gas line
Purge N2
Vacuum vent
Exhaust vent
Piping tape heater
Main valve type: CKD Hot, P/N: VEC-VH8G-X0101
Vacuum gage
Pressure switch
Piping: 100 A VAC
Does not include:
Outer/Inner T/C
N2 Load lock
N2 Boat cooling shower
Dual boat operation
B.S Sensor: 0-10 Torr, 0-1000 Torr
Cable length: 12 m (Power box)
AC Power box: 208V,3 Phase, 4 Wires
2006 vintage.
TEL/TOKYO ELECTRON ALPHA 303i-K是一种先进的扩散炉及配件设备,使客户能够进行高质量、低成本、高通量的半导体制造加工。该系统具有单区炉、气体输送装置、板载晶片装载机、自动晶片传输臂和控制器。单区炉利用低速、低膨胀石英管满足部件扩散要求,提高了热均匀性和晶圆温度稳定性。TEL ALPHA 303IK的最高工作温度为1,100 °C (2,012 °F),非常适合介电层和金属化层及相关工艺。此外,该机器还采用了一种创新的保护性大气气体停滞工具,这种工具有助于确保一致的流量和响应,从而在各种气体的情况下实现最佳性能。板载晶片加载器提供了一种将晶片快速可靠地送入资产的高效、自动化的方法。TOKYO ELECTRON ALPHA 303 I K凭借其大容量和多重负载选项,装备精良,可处理多种晶圆尺寸和基板。结合自动晶片传输臂,ALPHA 303IK无需手动处理晶片,从而提高了吞吐量时间。该型号易于操作和维护,其控制器具有直观设计的菜单和窗口,可增强可用性。控制器提供坡道和浸泡设置、炉子操作参数和气体输送设置等控制参数。此外,控制器还可以与外部PC连接,以便远程监控和评估流程数据,从而确保流程性能和可靠性。TOKYO ELECTRON ALPHA 303i-K是客户需要高效、经济高效的扩散炉及配件设备的终极解决方桉。该系统具有单区炉、自动晶片传输臂、车载晶片装载机、保护性大气气体停滞装置和直观控制器。TEL ALPHA 303 I K完全自动化,用户友好,性能可靠,是要求苛刻的半导体制造工艺的理想选择。
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