二手 TEL / TOKYO ELECTRON Alpha 303i-K #9373155 待售

ID: 9373155
晶圆大小: 12"
优质的: 2006
Vertical LPCVD furnace, 12" Process: TEOS (100) Process wafers I/O Port / SMIF: FOUP No load lock 25-Carrier slots Boat type: Single Main controller (WAVES) Operation screen: Touch screen Gas flow chart: Front and rear M560 Temperature controller Vacuum pressure control: CKD VEC Controller transformer: 208 V, Single phase Heater transformer: 208 V, 3 Phase Gases: Gas 1: N2 Gas 2: N2 Gas 3: O2 Gas 4: TEOS Gas 5: N2 Gas distribution: Basic style: Conventional Tubing material: SUS-316L Tubing finish: VCR Manual valve: CKD Air operated valve: CKD MFC: HORIBA STEC Exhaust distribution: Air operated valve type: IGS Connect Main valve: CKD VEC Cold trap No pump line Wafer / Cassette handling: (16) Cassette storage Cassette In/Out port Cassette handling robot Wafer transfer type: 1 + 4 Fork material: AL2O3 Fork variable pitch Fork wafer presence sensor Elevator handling: Boat elevator Auto shutter Boat rotation Mechanical parts Heating chamber: Heater type: VMM-56-002, 100 wfs (5) T/C Type (5) Spike T/C Furnace cabinets includes clean air flow system Scavenger and water cooling unit Power supply unit (U/P Box): Control unit Transformers SCR Breaker unit FOUP and wafer handling automation: (2) FOUP Load ports FOUP Transfer Stocker: (18) FOUPs FIMS Port KHI Wafer load automation Variable pitch change mechanism with (5) forks Auto tube shutter Boat elevator with boat rotation mechanism Integrated gas system in gas cabinet and TEOS LSC baking system: O2 Gas line TEOS Gas line Purge N2 Vacuum vent Exhaust vent Piping tape heater Main valve type: CKD Hot, P/N: VEC-VH8G-X0101 Vacuum gage Pressure switch Piping: 100 A VAC Does not include: Outer/Inner T/C N2 Load lock N2 Boat cooling shower Dual boat operation B.S Sensor: 0-10 Torr, 0-1000 Torr Cable length: 12 m (Power box) AC Power box: 208V,3 Phase, 4 Wires 2006 vintage.
TEL/TOKYO ELECTRON ALPHA 303i-K是一种先进的扩散炉及配件设备,使客户能够进行高质量、低成本、高通量的半导体制造加工。该系统具有单区炉、气体输送装置、板载晶片装载机、自动晶片传输臂和控制器。单区炉利用低速、低膨胀石英管满足部件扩散要求,提高了热均匀性和晶圆温度稳定性。TEL ALPHA 303IK的最高工作温度为1,100 °C (2,012 °F),非常适合介电层和金属化层及相关工艺。此外,该机器还采用了一种创新的保护性大气气体停滞工具,这种工具有助于确保一致的流量和响应,从而在各种气体的情况下实现最佳性能。板载晶片加载器提供了一种将晶片快速可靠地送入资产的高效、自动化的方法。TOKYO ELECTRON ALPHA 303 I K凭借其大容量和多重负载选项,装备精良,可处理多种晶圆尺寸和基板。结合自动晶片传输臂,ALPHA 303IK无需手动处理晶片,从而提高了吞吐量时间。该型号易于操作和维护,其控制器具有直观设计的菜单和窗口,可增强可用性。控制器提供坡道和浸泡设置、炉子操作参数和气体输送设置等控制参数。此外,控制器还可以与外部PC连接,以便远程监控和评估流程数据,从而确保流程性能和可靠性。TOKYO ELECTRON ALPHA 303i-K是客户需要高效、经济高效的扩散炉及配件设备的终极解决方桉。该系统具有单区炉、自动晶片传输臂、车载晶片装载机、保护性大气气体停滞装置和直观控制器。TEL ALPHA 303 I K完全自动化,用户友好,性能可靠,是要求苛刻的半导体制造工艺的理想选择。
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