二手 TEL / TOKYO ELECTRON Alpha 303i #9357815 待售
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ID: 9357815
晶圆大小: 12"
LP P-Doped poly furnace, 12"
Process: D-Poly-small flow
Boat operation: (2) Boats
ASYST / ATR9100
Furnace unit:
Heater type: VMM-56-002 5 zones / 500°C -1000°C
T/C For over temperature protection: Kit, chamber O.H.SNSR
Temperature controller: MA901-8FK09-Z250A
Wafer / Carrier handing:
Wafer type: Semi standard notch, 12"
Carrier type: FOUP / 25-Slots
(16) Carrier storages
Fork type / material: 1+4 / Al203
W/T Wafer I/F speed (U/D)
Wafer loading / Unloading sequence: ED => P => M / M => P => ED
Boat / Pedestal:
Production wafers: (100) Wafers
Boat material: SiC with CVD-coat
Boat type: (117) Slots ladder, 8mm
Boat rotation
Pedestal type: Quartz
Process tube:
Quartz outer and inner tube
Inner type: Straight
Internal T/C type
Outer tube interior wall type
Tube sealing: O-Ring seal
Fab constraint:
Waves system controller
Front operation panel
Front MMI and gas flow chart: MMI and GFC
General pressure display unit: Pressure-Mpa / Vac-Torr
Gas cabinet exhaust display unit: SI (Pa)
Furnace temperature controller: M560A
Vacuum system:
Main valve: CKD VEC
Vacuum exhaust system
Vacuum pressure controller: CKD VEC
Vacuum gage:
Pressure control: MKS Capacitance manometer
Press monitor: MKS Capacitance manometer (133 kPa)
Pump monitor: MKS Capacitance manometer
Gas distribution system:
Basic style: Integrated gas system
Tubing: Stainless steel / Electrical-polish (STD)
FUIJKIN Manual valve
FUIJKIN Air-operated valve
MYKROLIS Filter
VERIFLO Regulator
Soft backfill injector
MFC:
SiH4: 3 SLM
PH3: 500 SCCM
PH3: 50 SCCM
PH3: 30 SCCM
ClF3: 5 SLM
N2: 3 SLM
(4) N2: 5 SLM
Process pressure: 73 Pa, 133 Pa
Process temperature: 510°C, 525°C, 530°C.
TEL/TOKYO ELECTRON ALPHA 303i是设计用于IC相关生产的高性能扩散炉设备。它配备了先进的加热系统，可以更快、更一致的结果。该炉由硬质和厚厚的不锈钢构成，以确保长期的可靠性和准确性。它包括一个能够以极高的速率将样品放入炉中的自动化样品转移单元。在性能方面,TEL ALPHA-303I能够在几分钟内执行高达900°C的快速加热时间。它配备了创新的温度控制机，确保在整个加热过程中温度极为均匀。即使在使用非常大的基板时，该工具也能保持一致的温度而没有任何差异。此外，TOKYO ELECTRON ALPHA-303 I还配备了先进的电子功率控制资产，可降低功耗并提供高质量的温度控制。TEL/TOKYO ELECTRON ALPHA-303 I包含多种附加功能以改善其性能。它有一个集成的化学气相沉积（CVD）模块，能够对电基板进行量身定制的掺杂，使其成为IC相关生产的理想选择。除此之外，它还包括石英船、陶瓷盖、钟形罐等多种配件。这些附加组件通过改善热量分配进一步提高了设备的性能。总体而言，TEL ALPHA-303 I是为IC相关生产而设计的高性能扩散炉模型。它由不锈钢制成，以保证寿命和准确性。它还配备了包括自动化样品传输设备、快速加热时间、温度控制系统、CVD模块等多种功能。此外，它还包括各种配件，可以进一步提升其性能。
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