二手 ALCATEL / ADIXEN / PFEIFFER 601E I-Speeder #165552 待售
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ID: 165552
晶圆大小: 6"
优质的: 2001
Silicon etcher, 6"
Wafer size: 6", converted from 4"
Semco ESC
Genmark 4 robot with wafer aligner
4” single wafer vacuum loadlock assembly
Chuck table with controlled-temperature from –30°C~ +60°C
Substrate holder: 4” wafer electrostatic clamping system with center kit
Low-pressure plasma source with laser view port adaptor on top of the source
System control and monitoring with PLC & PC, Windows NT & Alcatel GUI
UPS power for PLC control
Operates the machine in manual, semi-automatic, or fully-automatic modes
Chamber primary pump: ADP122
Cold trap with heated pump line
Maglev turbomolecular pump: ATH 1300M
DN 200 heated throttle & isolation valve VAT series 64 + By-pass + line with controller
Loadlock dry pump ACP28
Loadlock molecular pump MDP 5011
Lauda Chiller RK8CP
Power transformer: input AC200-220V, output AC400V
Baratron 100Pa
Source power supply: 2kW RF with RF20S generator controller
Bias power supply: 500W with RF5S generator controller
Robot loading version
User’s manual on CD ROM and PC HD
Electrical schematics on cleanroom paper
Telediagnostic (modem+software)
Process Module:
Room (Bosch) temperature process. (including Bosch patent)
Substrate holder electrostatic clamping system
Wafer centering kit 100mm
Source: 2kW RF
Bias: 0.5kW RF
Heated process chamber walls
Laser view port adapter on top of the source
Reactor Pumping:
Alcatel ADP 122
Maglev turbomolecular pump ATH 1300M
DN200 heated throttle & isolation valve VAT series 64 + by-pass
Completed pumping line is heated, while a coldtrap is installed before the dry pump
Gas lines:
4 UNIT mfc’s, type 1 gas lines, installed in the main frame of the A601E
SF6-500 sccm, C4F8 – 200400 sccm, O2 –20 sccm, O2-200 sccm
oad/Unload Module:
Robot loading
Optical fiber for wafer localization
Ferrofluidics feedthrough on transfer arm
Molecular drag pump MDP 5011
Mechanical pump needed
Control Module:
PLC & PC
Windows NT & Alcatel GUI
Telediagnostic(modem & software)
Substrate holder:
Electrostatic clamping system version
Additional spare electrostatic ceramic (4”): yes, but used
Pumping station:
ADP122 and ACP28 dry pumps pack for process chamber and loadlock
Gas lines:
Gas cabinet for 6 gas lines
Different UNIT MFC’s flow range/standard
Transfer module and loadlock
GENMARK cassette loading robot
Flat finder/aligner
Documentation:
Hard copy of the user manual
Documentation set on cleanroom paper
CD-ROM with User manual
Normal Paper: manuals of all sub-units
Cleanroom Paper: Electrical diagrams
Additional Parts:
Cryo kit for Bosch and Cryo process
Electrostatic Chuck 6” wafer size kit for manual or robot loading version
Tool has been mainly used for R&D purposes
Modifications:
RK8CP chiller
Upgrade of Maglev ATH 1300 to ATH 1600 turbomolecular pump
Upgrade of ACP20 to ACP28 dry pump
51 foot pump cable
Light tower
Upgrade of 2 kW RFPP generator to ENI 3 kW RF generator
UNIT MFC: SF6 / 1000 sccm UFC 180
SECS II protocol
Software upgrade (PC and pLC)
2001 vintage.
ALCATEL/ADIXEN/PFEIFFER 601E I-Speeder是为半导体和微电子应用而设计的高性能蚀刻器和asher。该设备的设计可提供卓越的性能和最佳的吞吐量(特征尺寸可低至2.5µm,工艺包括蚀刻、粘合、清洁和拆卸。I-Speeder配备了可靠的双梁系统,在整个工件上提供精确的精度和均匀性。它的流体电阻率和灵活性,以适应多个过程使它成为一个通用的工具,大多数半导体的需求。I-Speeder利用先进真空技术的专门单元,实现了优越的蚀刻速率、更低的颗粒计数和减少的氧化物污染。该单元采用双循环控制器,可精确调整工艺参数。独特的组合等离子体锥机和专利陶瓷磁场线圈有助于保护工件,同时确保卓越的蚀刻效果。I-Speeder总共配备了八个预先安装的自动化流程,提供了一致的结果,减少了操作员培训和设置时间。这一功能强大的单元旨在允许安装第三方硬件和软件,而无需额外的硬件。此外,它还自动记录详细的过程参数,从而使跟踪蚀刻过程变得简单。I-Speeder是一个全面的蚀刻器和asher解决方桉,具有多种功能和优点。它提供了一个强大、高效、可靠的过程,导致优越的微型化成型和优越的控制。通用工具非常适合大多数半导体蚀刻要求,并提供卓越的性能,其功能尺寸可降低到2.5 μ m,处理时间更快。此外,该部门还得到ADIXEN和ALCATEL的支持,提供卓越的客户服务和技术支持。
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