二手 ESC ELAS #9131115 待售

RF / DC Sputtering system, 6"-8" RF Magnetron RF Diode operation Loadlock cryo pump, 8" Chamber, 10" Rectangular Heliarc welded 304 Stainless steel plate: 16 mm View-port: Pyrex window Pump-out port: 225 mm Diameter Load lock: 2-Level elevator Non-coated pallets loaded on upper level Processed pallets unloaded from lower level VITON O-ring Feedthrough: Linear bellows Magnetically coupled drive Drive: Hydraulics Low pressure drive Motion: Loading and unloading Fully-automatic computer controlled Capacity: Diameter wafers: 6-150 mm Diameter wafers: 4-200 mm Drive: Precision DC motor With optical encoder feedback control Chain drive Labyrinth shielded Option: DC Bias / RF Bias Coating speed: 3-350 cm/min, Bi-directional Vacuum system: Load lock CTI-CRYOGENICS Cryo-Torr 8 Vacuum pump Vacuum valve: 6" ASA (7-1/8" Diameter) Gate valve Electro-pneumatic operation Valves: 1-1/2" Bellows sealed Electro-pneumatic operation Roughing pump: 27 CFM (762 l/min) With process chamber Main chamber: CTI-CRYOGENICS Cryo-Torr 10 Vacuum pump Vacuum valve: ASA Gate valve, 10" Electro-pneumatic operation for gas throttling Load lock and cryo regeneration: 27 CFM Mechanical pump Anti-back-streaming trap for mechanical pump 1-1/2" Bellows sealed electro-pneumatic operation Etch platform: Moves vertically to engage / Disengage the pallet Cooling: Water-cooled Material: Stainless steel Insulator: Pyrex Dark space shield: Stainless steel Residual gas analyzer RF Generator: Continuously-rated and specifically designed for sputtering: 1 kW ISM Frequency: 13.56 MHz FCC and OSHA DC Magnetron power supply: ADVANCED ENERGY Pinnacle Power supply, 12 kW System performance specifications: Process parameter control ranges: Description / Minimum / Maximum / Units Sputtering pressure / 1 / 90 / Millitor Scan speed (bi-directional) / 3 / 350 / cm/min DC Sput / 100 / 12,000 / Watts RF Sput / 0.02 / 2.10 / kVA - / 0.1 / 2.00 / kW Etch revel (Note 2) / 0.02 / 1.50 / kVA - / 0.1 / 1.50 / kW DC Bias capability: Internal mechanism: DC Power DC Bias activated during DC sputtering Power supplies: 150 V.