二手 LAM RESEARCH 2300 Kiyo #174756 待售
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ID: 174756
晶圆大小: 12"
优质的: 2006
Metal dry etch system, 12"
Type of Loadport: SMIF
Number of Process Chamber: (2) Metal Etch & (2) MWAVE STRPR
Configuration of SMIF:
Signal Tower: 3-colors
Number of Loadport: 3
Parts No. of Loadport: 799-901175-004
Number of ATM Robot: 1
Parts No. of ATM Robot: 121668
Buffer Station: 25 slots, 2 Buffer Station
Aligner: 1 Aligner
Configuration of Transfer Chamber
Number of Loadlock: 2 LL / 4 Slot Cool Chamber
Model of Transfer Robot: Magnatran7 / Borrks
Parts No. of Lock Valve: 853-007859-005 / 4ea
TM Pressure Gauge: HPS Series907 / MKS
TM Pressure Control: MKS Series640
LL Pressure Gauge: HASTING
Configuration of Etch Chamber:
PM2:
Model of Chamber: 2300 Metal
Year of Construction: 2005
Model of Pressure Gauge: MKS, 0.1Torr
Model of Throttle Gate Valve: 65048-PH52-ADR1 VAT
Model of Turbo Pump: ATH2300M Alcatel
Model of TCP RF Generator: RFG / AE
Model of Bias RF Generator: APEX1513 / AE
Configuration of Etch Chamber:
PM3:
Model of Chamber: 2300 Metal
Year of Construction: 2005
Model of Pressure Gauge: MKS, 0.1Torr
Model of Throttle Gate Valve: 65048-PH52-ADR1 VAT
Model of Turbo Pump: ATH2300M Alcatel
Model of TCP RF Generator: RFG / AE
Model of Bias RF Generator: APEX1513 / AE
Configuration of MW Chamber:
PM1:
Model of Chamber: 2300 MWAVE STRPR
Year of Construction: 04-2006
Model of Pressure Gauge: MKS, Dual range
Model of Throttle Gate Valve: MKA, 253B-24836
Model of Vaporizer: MKS, WODMB-23398
Model of MW Generator: ASTEX, FI120160-3
Configuration of MFC: O2 5slm, N2 1slm
Configuration of MW Chamber:
PM4:
Model of Chamber: 2300 MWAVE STRPR
Year of Construction: 04-2006
Model of Pressure Gauge: MKS, Dual range
Model of Throttle Gate Valve: MKA, 253B-24836
Model of Vaporizer: MKS, WODMB-23398
Model of MW Generator: ASTEX, FI120160-3
Configuration of MFC: O2 5slm, N2 1slm
Configuration of Gas Panel, Etch Chamber:
Type of Gas Panel: IGS Bolck Type
No of Gas Channel: 8 Channel
Model of MFC: UFG8561
PM2:
BCL3 300sccm
N2 50sccm
Ar 500sccm
O2 1slm
CH4 50sccm
SF6 200sccm
Cl2 300sccm
CHF3 50sccm
PM3:
BCL3 301sccm
N2 51sccm
Ar 501sccm
O2 2slm
CH4 51sccm
SF6 201sccm
Cl2 301sccm
CHF3 51sccm
Gas Box 1.25C Seal Type
TMP Axiden ATH2300M
Micro Wave Power Gen MKS FI20160-3
RF Generator AE APEX-1513 and AE RFDS-1213
Chiller Unisem RCS 2500A
Power: 208VAC 3ph 4Wires 400AMPS 50/60Hz
2006 vintage.
LAM RESEARCH 2300 Kiyo是一款革命性的蚀刻/asher设备,专为精度、可靠性和灵活性而设计。此高级蚀刻器/asher系统旨在支持各种大小和配置的设备。其架构允许在蚀刻和粉刷各种基材时进行精确的过程控制和可重复性。2300 Kiyo单元使用智能算法计算每种基材类型的最佳蚀刻和灰化参数,保证每次结果一致。它被设计为进行化学机械平面化(CMP)、化学机械抛光(CMP)、化学蚀刻(ISO蚀刻)、深反应性离子蚀刻(DRIE)和反应性离子蚀刻(RIE)工艺。此外,该机还能够进行精密的背面清洁.LAM RESEARCH 2300 Kiyo工具配备了气流分析能力、压力范围温度控制、敏感器调谐、基板温度控制模式等多项先进功能。这些功能允许操作员自定义和调整资产以获得所需的蚀刻和灰化结果。此外,利用综合智能流程控制,该模型可以自动跟踪和调整相关流程参数,最终产生可重复的结果。2300 Kiyo设备还配备了直观的软件,便于系统控制和数据收集。该单元的GUI和软件为用户提供了完整的蚀刻和灰化环境,从而实现了可重现和可靠的流程性能。该机器还允许用户通过直接、多站点连接实时监控和分析流程数据,使用户能够快速做出知情决策。总体而言,LAM RESEARCH 2300 Kiyo 蚀刻器/asher工具为各种基材的蚀刻和灰化提供了无与伦比的可靠性和性能。其先进的功能和直观的软件提供了简单高效的用户体验,让用户每次都能获得可重复、一致的结果。2300 Kiyo资产结合了这些特性和功能,为半导体器件制造提供了全面的蚀刻和灰化解决方桉。
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