二手 LAM RESEARCH 2300 Versys Kiyo #9301851 待售

ID: 9301851
晶圆大小: 12"
优质的: 2016
Etcher, 12" Seismic brackets system SEMI Wafer Cassette type: 25-Slots Gas system type: IGS Gas box Mylar floor template Manuals electronic CD-ROM Positions: Position 1: 2300 Microwave strip Position 2 and 3: 2300 Versys Kiyo Non-standard systems: NSR300156 Kiyo NSR301982 RMV Kiyo PM Position-4 Process modules: (2) Quick clean kits for 2300 Versys Kiyo (1) Quick clean kit for 2300 MW Strip Options: Standard chamber pinnacle (-814) Tunable ESC Wafer clamping mechanism Standard fingers RF Ground bracket (-006) Quartz edge ring Standard Quartz tunable injector Standard injector shield Standard plasma screen (-032) Gas weldment: Enhanced passivated (-110) Standard ESC Hose kit Compression ESC Facility plate Liner: ACME Coated universal (-838) Standard chamber manometer Wafer lift mechanism: Direct drive Voltage control interface: 800 V O-rings: Chemraz Standard TCP Coil TCP Source dual: 1500 W 300MM Turbo pump: 2200 L/S BOCE (Seiko Seiki) Heated foreline Endpoint detection: 2300 LSR with OES 2 Standard chamber viewport window Chamber isolation valve: Barrier seal door Viton vacuum valve Lower isolation valve: Chemraz dry (-006) Water control passive: RF PCW Control Pump to TCU: 25ft TCU to PM: 50ft PM to Pump interconnect: 50ft TCU to RPDB: 25ft Pump to RPDB: 25ft Microwave strip options: O-rings: Fluorosilicon / TEV Microwave source: Quartz Baffle: Quartz Leak check port Chamber isolation valve: Barrier seal door Throttle valve (-003) 2-Line on-board gas delivery PM to Pump interconnect: 50ft Pump to RPDB: 25ft Gas box: Standard gas containment Top exhaust gas system Gas box: Advanced chamber condition control MFC Type: STEC SEC-Z313 No display in transducer (16) Gas lines Heated gas lines: Position 1 and 2 Gas box inlet option: Regulated inlet gas panel Standard gas filter Non-standard PM/GB Feature: (2) FUJIKIN NSR 301983 MFC on PM4 IGSGB <PM4> Line6 : FUJIKIN FCST1005NZFC_4J2, SO2 at 200sccm Line16 : FUJIKIN FCST1005NZFC_4J2, Ar at 500sccm 2300 Platform Standard front fascia Front end load port cassette: (3) FOUPs Cassette ID: Keyence BCR Carrier ID Factory automation: OHT PIO Sensor Airlock wafer fingers: Stainless wafer pads EPX Backing pumps for TM Control rack configuration: Side monitor user interface Earth Leakage Breaker (ELB) RPDB Interconnect cables: TM to RPDB, 50ft Signal tower System options: System calibration and alignment Service step for PM Robot CDM Non-Standard TM Feature: NSR6975 Facility IF board kit and SW Key NSR101080 Vespel endeffector on V2 TM Gas box configuration: PM2: Line / MFC Type / Gas type / Gas Flow Line 01 / SZ313 / SICL4 / 50 Line 03 / SZ313 / NF3 / 500 Line 04 / SZ313 / CL2 / 200 Line 05 / SZ313 / HBr / 500 Line 06 / SZ313 / SO2 / 200 Line 07 / SZ313 / CH2F2 / 200 Line 09 / SZ313 / O2 / 10 Line 10 / SZ313 / SF6 / 50 Line 11 / SZ313 / O2 / 500 Line 12 / SZ313 / N2 / 100 Line 13 / SZ313 / CF4 / 200 Line 14 / SZ313 / CHF3 / 300 Line 15 / SZ313 / He / 500 Line 16 / SZ313 / Ar / 500 PM3: Line / MFC Type / Gas type / Gas Flow Line 01 / SZ313 / SICL4 / 50 Line 03 / SZ313 / NF3 / 500 Line 04 / SZ313 / CL2 / 200 Line 05 / SZ313 / HBr / 500 Line 06 / SZ313 / SO2 / 200 Line 07 / SZ313 / CH2F2 / 200 Line 09 / SZ313 / O2 / 10 Line 10 / SZ313 / SF6 / 50 Line 11 / SZ313 / O2 / 500 Line 12 / SZ313 / N2 / 100 Line 13 / SZ313 / CF4 / 200 Line 14 / SZ313 / CHF3 / 300 Line 15 / SZ313 / He / 500 Line 16 / SZ313 / Ar / 500 PM4: Line / MFC Type / Gas type / Gas flow Line 01 / SZ313 / SICL4 / 50 Line 03 / SZ313 / NF3 / 500 Line 04 / SZ313 / CL2 / 200 Line 05 / SZ313 / HBr / 500 Line 06 / SZ313 / SO2 / 200 Line 07 / SZ313 / CH2F2 / 200 Line 09 / SZ313 / O2 / 10 Line 10 / SZ313 / SF6 / 50 Line 11 / SZ313 / O2 / 500 Line 12 / SZ313 / N2 / 100 Line 13 / SZ313 / CF4 / 200 Line 14 / SZ313 / CHF3 / 300 Line 15 / SZ313 / He / 500 Line 16 / SZ313 / Ar / 500 2016 vintage.
LAM RESEARCH 2300 Versys Kiyo是一款用途广泛、高效的蚀刻设备,专为硅单晶薄膜沉积、先进光刻、表面划痕修复等应用而设计。该系统是一种高端蚀刻器/asher,配备了等离子体蚀刻、干氧化物沉积、蚀刻、抗沉积等先进技术。2300 Versys Kiyo具有20kHz的等离子体输入频率,以及用于可靠蚀刻过程的各种工艺气体。它是一个全自动的机器,照顾整个过程,从加载晶圆到卸载结果。为确保准确和可重复的结果,蚀刻器具有自动晶圆处理单元和内置真空室。LAM RESEARCH 2300 Versys Kiyo还采用了最新的原位成像和先进的工艺控制功能,允许用户监控流程并即时进行快速更改。为确保一致、高精度的结果,该机配备了6轴倾斜和2轴偏航定位器。它还提供了一个可选的室内离子源,用于使用受控大气工艺进行蚀刻。2300 Versys Kiyo具有先进的功能和耐用可靠的结构,是各种要求苛刻的蚀刻和灰化应用的绝佳选择。该工具经认证符合严格的安全标准,并配备了在蚀刻过程中提供额外一层保护的故障安全资产。此外,LAM RESEARCH 2300 Versys Kiyo的效率高,周转速度快,非常适合产品设计的快速原型设计和快速开发。
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