二手 LAM RESEARCH 2300 Versys Kiyo #9301851 待售
网址复制成功!
单击可缩放
ID: 9301851
晶圆大小: 12"
优质的: 2016
Etcher, 12"
Seismic brackets system
SEMI Wafer
Cassette type: 25-Slots
Gas system type: IGS Gas box
Mylar floor template
Manuals electronic CD-ROM
Positions:
Position 1: 2300 Microwave strip
Position 2 and 3: 2300 Versys Kiyo
Non-standard systems:
NSR300156 Kiyo
NSR301982 RMV Kiyo PM Position-4
Process modules:
(2) Quick clean kits for 2300 Versys Kiyo
(1) Quick clean kit for 2300 MW Strip
Options:
Standard chamber pinnacle (-814)
Tunable ESC Wafer clamping mechanism
Standard fingers RF Ground bracket (-006)
Quartz edge ring
Standard Quartz tunable injector
Standard injector shield
Standard plasma screen (-032)
Gas weldment: Enhanced passivated (-110)
Standard ESC Hose kit
Compression ESC Facility plate
Liner: ACME Coated universal (-838)
Standard chamber manometer
Wafer lift mechanism: Direct drive
Voltage control interface: 800 V
O-rings: Chemraz
Standard TCP Coil
TCP Source dual: 1500 W
300MM Turbo pump: 2200 L/S BOCE (Seiko Seiki)
Heated foreline
Endpoint detection: 2300 LSR with OES 2
Standard chamber viewport window
Chamber isolation valve: Barrier seal door
Viton vacuum valve
Lower isolation valve: Chemraz dry (-006)
Water control passive:
RF PCW Control
Pump to TCU: 25ft
TCU to PM: 50ft
PM to Pump interconnect: 50ft
TCU to RPDB: 25ft
Pump to RPDB: 25ft
Microwave strip options:
O-rings: Fluorosilicon / TEV
Microwave source: Quartz
Baffle: Quartz
Leak check port
Chamber isolation valve: Barrier seal door
Throttle valve (-003)
2-Line on-board gas delivery
PM to Pump interconnect: 50ft
Pump to RPDB: 25ft
Gas box:
Standard gas containment
Top exhaust gas system
Gas box:
Advanced chamber condition control
MFC Type: STEC SEC-Z313
No display in transducer
(16) Gas lines
Heated gas lines: Position 1 and 2
Gas box inlet option: Regulated inlet gas panel
Standard gas filter
Non-standard PM/GB Feature:
(2) FUJIKIN NSR 301983 MFC on PM4 IGSGB <PM4>
Line6 : FUJIKIN FCST1005NZFC_4J2, SO2 at 200sccm
Line16 : FUJIKIN FCST1005NZFC_4J2, Ar at 500sccm
2300 Platform
Standard front fascia
Front end load port cassette: (3) FOUPs
Cassette ID: Keyence BCR Carrier ID
Factory automation: OHT PIO Sensor
Airlock wafer fingers: Stainless wafer pads
EPX Backing pumps for TM
Control rack configuration:
Side monitor user interface
Earth Leakage Breaker (ELB)
RPDB
Interconnect cables: TM to RPDB, 50ft
Signal tower
System options:
System calibration and alignment
Service step for PM
Robot CDM
Non-Standard TM Feature:
NSR6975 Facility IF board kit and SW Key
NSR101080 Vespel endeffector on V2 TM
Gas box configuration:
PM2:
Line / MFC Type / Gas type / Gas Flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
PM3:
Line / MFC Type / Gas type / Gas Flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
PM4:
Line / MFC Type / Gas type / Gas flow
Line 01 / SZ313 / SICL4 / 50
Line 03 / SZ313 / NF3 / 500
Line 04 / SZ313 / CL2 / 200
Line 05 / SZ313 / HBr / 500
Line 06 / SZ313 / SO2 / 200
Line 07 / SZ313 / CH2F2 / 200
Line 09 / SZ313 / O2 / 10
Line 10 / SZ313 / SF6 / 50
Line 11 / SZ313 / O2 / 500
Line 12 / SZ313 / N2 / 100
Line 13 / SZ313 / CF4 / 200
Line 14 / SZ313 / CHF3 / 300
Line 15 / SZ313 / He / 500
Line 16 / SZ313 / Ar / 500
2016 vintage.
LAM RESEARCH 2300 Versys Kiyo是一款用途广泛、高效的蚀刻设备,专为硅单晶薄膜沉积、先进光刻、表面划痕修复等应用而设计。该系统是一种高端蚀刻器/asher,配备了等离子体蚀刻、干氧化物沉积、蚀刻、抗沉积等先进技术。2300 Versys Kiyo具有20kHz的等离子体输入频率,以及用于可靠蚀刻过程的各种工艺气体。它是一个全自动的机器,照顾整个过程,从加载晶圆到卸载结果。为确保准确和可重复的结果,蚀刻器具有自动晶圆处理单元和内置真空室。LAM RESEARCH 2300 Versys Kiyo还采用了最新的原位成像和先进的工艺控制功能,允许用户监控流程并即时进行快速更改。为确保一致、高精度的结果,该机配备了6轴倾斜和2轴偏航定位器。它还提供了一个可选的室内离子源,用于使用受控大气工艺进行蚀刻。2300 Versys Kiyo具有先进的功能和耐用可靠的结构,是各种要求苛刻的蚀刻和灰化应用的绝佳选择。该工具经认证符合严格的安全标准,并配备了在蚀刻过程中提供额外一层保护的故障安全资产。此外,LAM RESEARCH 2300 Versys Kiyo的效率高,周转速度快,非常适合产品设计的快速原型设计和快速开发。
还没有评论