二手 LAM RESEARCH 2300e4 Kiyo EX #293619084 待售

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ID: 293619084
晶圆大小: 12"
优质的: 2012
Poly etcher, 12" (3) Load ports SEMI Wafer Cassette type: 25-Slots Gas box type: Jetstream 2300 Platform Chamber type: Versys Kiyo E Series 2300 Versys Kiyo E Series PTK Chamber Temperature controlled window HP Crystal window Coated ceramic injector Standard bayonet style injector shield Gas weldment with coated Standard injector shield Enhanced plasma screen SRC Enhanced grounded liner Top and side gas feed TCP Source: Plasma 2000 W Enhanced TCP Coil support: Bias match: 1.5 kW HVBP Electrostatic chuck: EPX ERMZ ESC Facility plate: Pl with routing ESC Hose kit: Low temperature Wafer lift mechanism: Prime movers Voltage control interface: 1200 V High bias kit Single piece QUARTZ edge ring Turbo pump, 12" OES2 Endpoint detection Standard chamber viewport window Heated foreline clamp cover Chamber isolation valve: Barrier seal door Vacuum valve: Viton Lower isolation valve: Valqua Chamber manometer UPC Enhanced Water control: Passive RF PCW control PCW Hoses: Chemical resistant Exhaust duct: Reduced profile Standard service cover Pump to TCU, 50 ft TCU to PM, 100 ft Interconnect: Pump to PM, 100 ft TCU to RPDB, 25 ft Pump to RPDB, 25 ft Regulated inlet gas panel Gas system: Jetstream Mounting location: Transport module Window door Lock-out tag-out manual valve FIB Facilitization Facility box: Top gas connection Enhanced containment Regulated with filter regulation Nickel filter SST Filter Future PM: 4 Positions Jetstream gases of 2302 Kiyo E Series: Tuning gas Heated lines position 1 and 2 Gas no / Gas / MFC Size / MFC Model 1 / SiCL4 / 100 SCCM / STEC Z719 2 / CL2 / 500 SCCM / STEC D219 3 / HBr / 500 SCCM / STEC D219 4 / CF4 / 400 SCCM / STEC D219 5 / BCl3 / 200 SCCM / MFC Z719 6 / He / 500 SCCM / STEC D219 7 / CH2F2 / 200 SCCM / STEC D219 8 / Ar / 1000 SCCM / STEC D219 9 / 30%HE/O2 / 50 SCCM / STEC D219 10 / NF3 / 1000 SCCM / STEC D219 11 / N2 / 250 SCCM / STEC D219 12 / SO2 / 200 SCCM / MFC D219 13 / SF6 / 200 SCCM / STEC D219 14 / CHF3 / 200 SCCM / MFC D219 15 / O2 / 500 SCCM / STEC D219 17 / C4F6 / 200 SCCM / MFC D219 ATM: Front end load port: 3 FOUP BROOKS Cassette ID: Hermos carrier ID Factory automation: OHT PIO Sensor Input buffer station: 25-Slot CTC Computer storage: Hard Disk Drive (HDD) mirrored VTM Load lock A and B: Standard RPDB Subpanel R-O-G-B Signal tower Pre-facilities: PM Peripherals backing pumps: ESR100WN RPDB Backing pump CB Size: 30 A TCU CB Size: 30A TCU YR-8020 2300 Versys Kiyo E Series process module (PM1, PM2, PM3 and PM4): SiCl4, Cl2, HBr, CF4, He, Ar, CH2F2, 30%He/O2, NF3, N2, SO2, SF6, CHF3, O2 Does not include: Dry pumps Hard Disk Drive (HDD) Power supply: 208 AC, 3 Phase 2012 vintage.
LAM RESEARCH 2300e4 Kiyo EX是一款为半导体器件制造而设计的高性能蚀刻器/asher。它是一种坚固的工具,能够在高达1000摄氏度的温度下蚀刻和粉刷各种材料,包括硅、二氧化硅、铝和钨等。2300e4 Kiyo EX以RF阻抗匹配和预配置蚀刻/灰分两种主要配置运行。在射频阻抗匹配模式下,可以处理六种基材类型,提供高产、低成本的加工。它配备了射频发生器,产生高精度和可重复的结果。它还具有一个综合压力装置,在最佳压力条件下维持工艺气体。在预配置的蚀刻/灰分模式下,LAM RESEARCH 2300e4 Kiyo EX具有先进的几个特点,如先进的离子束光学、多室等离子体控制系统和碳化硅室门。先进的离子束光学提高了过程控制和轮廓精度,而多腔等离子体控制系统为蚀刻和灰分配方提供了灵活性。此外,碳化硅室门使用户能够管理等离子体反应和减少碎片。除了蚀刻/灰烬功能外,2300e4 Kiyo EX还提供高精度的轮廓测量设备。此系统允许用户以高分辨率监视蚀刻/灰烬配置文件,从而确保始终保持高质量的过程。为了进一步提高其蚀刻/灰分能力,LAM RESEARCH 2300e4 Kiyo EX包含一个温度控制器,可以对沉积和蚀刻进行精确的温度控制。它还具有数字数据记录和存储功能、用于配方优化的可编程控制器以及用于设备维护的自动诊断测试台。2300e4 Kiyo EX是为生产优质半导体器件而设计的可靠高效的蚀刻器/asher。它提供了先进的离子束光学和温度控制功能、高精度的轮廓测量机、数字数据记录和存储功能、用于配方优化的可编程控制器以及用于刀具维护的自动诊断测试台。LAM RESEARCH 2300e4 Kiyo EX具有强大的特性和易用性,是任何半导体器件制造工厂的绝佳选择。
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