二手 LAM RESEARCH 490 / 590 #9077769 待售

ID: 9077769
Etcher Main Chamber: Chamber Bottom chamber and exhaust ring Lower electrode assembly with focus ring style electrode (Boxed separately) Vacuums Rotary O-rings Seals Pneumatic tubing and fittings Pneumatic cylinders Upper electrode is process dependent and not supplied Load Locks: Vacuums Rotary O-rings Seals Pneumatic tubing and fittings Pneumatic cylinders Wafer arms and wafer guides are size dependent and not supplied Machine Mainframe: Pneumatic tubing Connectors and fittings Cables re-bundled and ty-wrapped Frame Top panels Front and side panels Elevators: (Packed separately) Top plastic dust covers not supplied Baratron head not supplied Gap Drive head and Automatch: (Packed separately) Front display panel and operator interface Electronics drawer (Packed separately) Factory manuals are included Complete frame RF Power supply is not supplied nor are any external cables, gas lines, throttle valve, or vacuum fittings.
LAM RESEARCH 490/590是一种适合于各种基材材料的蚀刻/asher设备。设计用途广泛,支持使用反应性离子蚀刻和抗灰化技术。该系统包括一个完全由计算机控制的蚀刻室,能够精确控制和重复蚀刻过程。蚀刻室的腔室容积为40升,能够达到1 x 10-5 torr以下的真空水平。它装有双频射频源电源和陶瓷涡轮分子泵。该腔室具有标准的12 "x 12"基板支撑,可配置为允许最多8"晶片。它还具有一个过程监视窗口,允许实时监视蚀刻过程。反应性离子蚀刻(RIE)是该单元的关键能力,允许蚀刻由包括硅、聚酰亚胺、聚碳硅烷甚至金属合金在内的材料制成的底物。它允许形成边缘尖锐的复杂图桉。它还能够在正面和负面的抗灰效果.该机还具有精选的气体化学气相沉积(CVD)功能。这包括脉冲模式CVD、双频CVD、双功率CVD,可用于在晶圆上沉积SiO2、SiN、Al2O3等材料。490/590 蚀刻器/asher工具是一种功能强大的蚀刻工具,它提供各种功能和功能来处理各种基板。它具有用户友好的界面、灵活的配置以及集成的射频源,可以精确控制蚀刻过程。它能够安全可靠地产生高质量的蚀刻结果,同时减少生产时间和成本。
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