二手 LAM RESEARCH A6 9600 PTX #201020 待售
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ID: 201020
Etcher
Process: metal
SMIF type: API
Chamber type: PTX
Chambers: (2) PM, (2) Strip
Automation online component: SECS I/II, SECSGEM
Chamber config
Process module 1:
Focus ring: 716-460216-002
Quartz plate: 716-000941-001
Process module 2:
Esc: 718-094523-281
Liner, chamber, vat 65, Trnsn manf: 839-495013-002
Liner, chamber, trnsn manf, adptr: 715-495014-001
Liner, chamber, trnsn manf: 714-495015-001
Liner, chamber, al, alli, bsr, 9600XX: 715-330825-007
Top quartz: 716-330891-002
Insul, esc, 9600XX: 716-330915-001
Pl, sh hd, cer, 21 hole, 9600PTX: 716-330892-007
Ring, gnd, chamber, bsr, ac cpld: 715-330889-002
Edge ring: 716-330045-281
Uniformity ring: 716-331051-002
Process module 3:
Esc: 718-094523-281
Liner, chamber, vat 65, Trnsn manf: 839-495013-002
Liner, chamber, trnsn manf, adptr: 715-495014-001
Liner, chamber, trnsn manf: 714-495015-001
Liner ,chamber, al, alli, bsr, 9600XX: 715-330825-007
Top quartz: 716-330891-002
Insul, esc, 9600XX: 716-330915-001
Pl, sh hd, cer, 21 hole, 9600PTX: 716-330892-007
Ring, gnd, chamber, bsr, ac cpld: 715-330889-002
Edge ring: 716-330045-281
Uniformity ring: 716-331051-002
Process module 4:
Focus ring: 716-460216-002
Quartz plate: 716-000941-001
EPD
Channel: end point filter box for PM 1 and PM 2
Channel (nm): 853-540066-011 703/261nm, 853-540066-011 703/261nm
Gas and B/H module (PM 1, 2, 3, 4 respectively)
Gas line qty (analog): 3, 8, 8, 3
Gas box model (analog): all universal
Gas 1: O2 5000, BCl3 200, BCl3 200, O2 5000
Gas 2: N2 1000, O2 1000, O2 1000, N2 1000
Gas 3: H2O 1000, Cl2 400, Cl2 400, H2O 1000
Gas 4: n/a, N2 200, N2 200, n/a
Gas 5: n/a, CF4 100, CF4 100, n/a
Gas 6: n/a, Ar 200, Ar 200, n/a
Gas 7: n/a, N2 20, N2 20, n/a
Gas 8: n/a, CHF3 50, CHF3 50, n/a
Helium pressure control unit: n/a, UPC-1300, UPC-1300, n/a
VAC (PM 1, 2, 3, 4 respectively)
Turbo pump: n/a, ATH-1600, ATH-1600, n/a
Turbo pump controller: n/a, ACT1300M/1600M, ACT1300M/1600M, n/a
Dry pump (TM and VCE): all single pump
Chamber manometer: MKS 10Torr, MKS 0.1Torr, MKS 0.1Torr, MKS 10Torr
Turbo manometer: n/a, MKS 10Torr 625A, MKS 10Torr 625A, n/a
Foreline manometer: all MKS 10Torr 625A
Pressure control valve: VAT64, Pendulum VAT65, Pendulum VAT65, VAT64
VAT controller: all software 65PM.3E.20
Temperature control (PM 1, 2, 3, 4 respectively)
Temperature control system: all 16 channel
Chiller type: 1 CH TCU, n/a, n/a, 1 CH TCU
RF generator: UPPER:RFDS1250/LOW:RFDS1250-HALO, n/a, n/a, UPPER:RFDS1250/LOW:RFDS1250-HALO
Match: (L-853-330951-021)/(U-853-032294-002), Stripper SmatchMatch, Stripper SmatchMatch, (L-853-330951-021)/(U-853-032294-002)
TR system
Platform: A6
Light tower: standard 4 light
Robot type: Brooks Mag-7
Arm type: dual arm
Wafer handling interface: Kalrze end effector
TM cover lift arm with PRK function
VCE inspection: lip seal
Computer system:
PC
Software version 2.2
Remote UI
Standard power
1996 vintage.
LAM RESEARCH A6 9600 PTX是一种蚀刻/灰化设备，用于生产微电子器件，如半导体IC和晶体管的蚀刻和灰化工艺。该系统旨在产生高分辨率的结果，在蚀刻和灰烬处理过程中具有极好的均匀性和对器件层的最小损伤。该单元由多个组件组成,这些组件协同工作,为用户提供高效的蚀刻/灰化过程。机器的主要部件是等离子源组件、外部加工室、真空泵及其相关的控制电子设备。这些组件协同工作以创建化学反应环境,允许用户控制成功蚀刻和灰化过程所需的反应和条件。等离子源组件被设计为产生一个高密度的等离子束，它将与过程腔内包含的材料发生反应。该工艺室设计用于容纳样品材料，并用反应性气体溷合物填充。真空泵用于排出工艺室以及排出蚀刻和灰分工艺产生的任何副产物。该工具由控制电子设备控制，包括频率合成器、幅度调制器和事件控制接口。频率合成器负责为用户提供在过程中准确调整等离子体参数以获得最佳吞吐量和均匀性的能力。振幅调制器用于调节射频输入功率，从而产生所需的等离子束密度和轮廓。事件控制界面允许用户设置多级进程，如蚀刻和灰烬。A6 9600 PTX能够处理从晶圆小于3"到12"的生产尺寸。该资产能够蚀刻金属、聚合物和电介质等多种材料。该模型还能够进行高度各向异性的蚀刻过程。该设备的均匀性和可重复性使其非常适合用于集成电路和晶体管的生产。
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