二手 LAM RESEARCH Alliance A6 9400 DFM-P #9133861 待售
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ID: 9133861
晶圆大小: 6"-8"
优质的: 2000
System, 6"-8"
(2) Blade BROOKS Mag 7 robots
(3) Monitors
Load lock:
Load lock type: Auto door
VCE Elevator: Bellows
Mapping sensor
Cassette type: (25) Slot cassettes
VCE Gate valve
VCE Vacuum isolation valves
TM Vacuum isolation valves
TM Pneumatic valves
TM LID Information:
Pneumatic cylinder lift
Up / Down / Actuate switch
Transport system control
Transport VME:
MVME 147-011, VME335, DIOXVME-240
Multiplexer PCB
Light tower PCB
Chamber information:
Position 1:
Chamber type: No
Position 2:
Chamber type: 9400 DFM-P Poly etch chamber
Chamber process: Poly
Turbo pump with controller: ALCATEL ATH 1600M
VAT Gate valve: VAT65 Pendulum valve
RF Generator bias: ADVANCED ENERGY RFG1250HALO 13.56 MHz
RF Generator TCP: ADVANCED ENERGY RFDS 13.56 MHz
Position 3:
Chamber type: 9400 DFM-P Poly etch chamber
Chamber process: Poly
Turbo pump with controller: ALCATEL ATH 1600M
VAT Gate valve: VAT65 Pendulum valve
RF Generator bias: ADVANCED ENERGY RFG1250HALO 13.56 MHz
RF Generator TCP: ADVANCED ENERGY RFDS 13.56 MHz
Gas box information
PM1 Gas box
PM2 Gas box
MFC Channel gas MFC type
MFC Size
(SCCM)
AC 01 – CHA C4F8 FC-D980CU 50
AC 02 – CHA O2 FC-D780CU 100
AC 03 – CHA CHF3 FC-D780CU 50
AC 04 – CHA CF4 FC-D780CU 200
AC 05 – CHA O2(30%) HE FC-D780CU 100
AC 06 – CHA C4F6 FC-D780CU 50
AC 07 – CHA CH2F2 FC-D780CU 100
AC 08 – CHA CF4 FC-D780CU 1000
AC 09 – CHA H2 FC-D780CU 1500
AC 10 – CHA AR FC-D780CU 1000
AC 11 – CHA N2 FC-D780CU 1000
AC 12 – CHA O2 FC-D780CU 3000
PM3 Gas box
MFC Channel gas MFC type
MFC Size
(SCCM)
AC 01 – CHA C4F8 FC-D780CU 50
AC 02 – CHA O2 FC-D780CU 100
AC 03 – CHA CHF3 FC-D780CU 50
AC 04 – CHA CF4 FC-D980CU 200
AC 05 – CHA O2(30%) HE FC-D780CU 100
AC 06 – CHA C4F6 FC-D780CU 50
AC 07 – CHA CH2F2 FC-D780CU 100
AC 08 – CHA CF4 FC-D780CU 1000
AC 09 – CHA H2 FC-D780CU 1500
AC 10 – CHA AR FC-D780CU 1000
AC 11 – CHA N2 FC-D780CU 1000
AC 12 – CHA O2 FC-D780CU 3000
Wafer present sensors (WPS)
TM & VCE Pump option: Single pump type
Fab clean room configuration: Bulkhead configuration
RPM: 685-495112-100
2000 vintage.
LAM RESEARCH Alliance A6 9400 DFM-P是一种可以完成各种应用的蚀刻工艺的后蚀刻等离子体灰烬。对于范围广泛的半导体制造商来说,asher是一个可靠的高性能选项,它具有一套高级功能。A6 9400有两个独立的高频射频源，实现了快速、高质量的蚀刻。它具有可移动的自动化轨道,具有多种负载/卸载选项,可通过多种基板尺寸和蚀刻要求实现高效吞吐量。腔室压力是可调的，因此压力范围可以根据特定材料蚀刻要求精确定制。此外，Asher具有低压射频预清洁阶段，允许减少后蚀刻中的颗粒污染。A6 9400还具有低温背侧冷却剂，保证了均匀的蚀刻和更快的加工时间。A6 9400 DFM-P构建在LAM成熟可靠的CXT平台上,确保了高级功能和高性能。该设备可以处理多种基材尺寸，能够在大面积上批量均匀，均匀性优越。它配备了直观的软件和硬件控制功能，包括全自动腔室操作、改进的诊断能力以及安全保护。此外,增强的粒子交互功能允许更好的控制和更长的运行时间,从而提高了流程和生产率。除了先进的功能外，A6 9400 DFM-P设计方便维护和设置。其内部部件可通过内置的服务门轻松进入，从而方便快捷地进入气管线、阀门和安全联锁装置。该系统还配备了可拆卸的门盖，用于快速安装和清洁，方便地访问装载机组件。该单元包括一个标准配方表，允许对所有蚀刻参数和配方进行"脚本"，从而提高了可重复性。A6 9400还提供可选的氧气传感器,可确保准确和可重复的过程控制。总体而言，Alliance A6 9400 DFM-P是一款功能强大、可靠、高效的蚀刻后等离子体灰烬。该机器提供了改进吞吐量、粒子控制和精密蚀刻的高级功能,可用于各种应用。凭借其直观的控制、出色的工艺重复性和易于维护，asher是任何半导体生产线的理想工具。
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