二手 MATTSON Aspen II #9398659 待售
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ID: 9398659
晶圆大小: 8"
ICP System, 8"
MATTSON Endpoint detection system
With fixed filters: 430 and 520
Cable length: 19 ft
(3) RF Cables and signal cables
(2) Heaters
MFC
Chambers:
Back chamber:
366 MHz CPU: Analog in and PCB out
Floppy Disk Drive (FDD): DI/DO Cards
Chassis: Power supply
Gas channel: Bottom feed channel
Cool down station: No water cooling
Gas lines
Right chamber:
366 MHz CPU: SEC II Card
Floppy Disk Drive (FDD): Robot stepper (SMC-PC3)
Chassis: Backing plain
Gas channel: Junction box
Cool down station: Lexan plates
Gas lines with filters
Front end:
26" Opening with separate operator interface
4-Color light tower
Operator / Engineering monitor: TFT Design monitor
Gas box with sub frames
EMO Buttons
Interlock circuit: Push button switches
Hanging panels
Load lock:
Single load lock
(2) Cassette stations
Capability of queuing lots
Pin search assembly: Proximity sensors
Load lock seal: Lip seal
Platform and cassette:
(4) 25-Slot cassettes
Rotating cassette nests, 8"
Cool down station: Flat cool down station without water lines
Load lock fast exchange
Transfer robot:
Main robot: 3-Axis robot with flex cable
Robot arm: (4) Adjustable paddles with standard arm
Slit door
Wafer sensors: Paddles, front and rear cassettes
Shuttle: 26"
Process module:
Chamber right and back:
Tube type: Quartz tube
Standard process window
ICP Chamber O-ring type: Flurosilicon
Temperature controller: WATLOW 988 / EZ Zone
Thermal couples: Spring loaded TC
Lift pin assembly
Grids / Guide rings: Extended guide ring
Electrical feed through
Manifold and ceramic parts
Isolation valve
Top plate
Load lock
Chamber
Pressure controller:
VAT Valve pressure controller
Chamber manometer: 10 Torr
Load lock manometer: 100 Torr
Shuttle manometer: 1000 Torr
RF / MW System:
RF System: Top RF 13.56 MHz
(3) RFPP10 RF Generators: (2) Power cables missing
TRAZER AMU 10D-2 RF Top match, P/N: 914-92003-00: (2) Vacuum capacitors missing
Re-silvered RF coils
(125) RF Vacuum caps: 100PF
AC Box: 2-3 Phase generators with safety cover
DC Box
Gas system:
Gas VCR gasket: Stainless steel and Nickel
Gas line / Gas / Range
Gas 1 / O2 / 1000 SCCM
Gas 2 / N2 / 1000 SCCM
Gas 3 / N2/H2 (4%) / 2000 SCCM
Gas 4 / CF4 / 100 SCCM
Side:
Gas 1 / O2 / 5 SLM
Gas 2 / N2 / 1 SLM
Gas 3 / CF4 / 200 SCCM
Gas 4 / O2 / 1 SLM
Rear:
Gas 1 / O2 / 10 SLM
Gas 2 / N2 / 1 SLM
Gas 3 / CF4 / 200 SCCM
Gas 4 / O2 / 1 SLM.
MATTSON Aspen II是一款先进的蚀刻设备,提供高吞吐量、低拥有成本的精密蚀刻。它旨在提高生产率,同时提供高度的灵活性和对蚀刻参数的控制。Aspen II用于需要蚀刻各种材料的多种类型的应用和研究项目。适用于蚀刻硅、石英、钼和不锈钢等多种基材。该系统具有可调节的台阶,可轻松蚀刻大或小基板,包括角、边和台阶。大蚀刻室允许一次蚀刻多个晶片,以加快生产速度。MATTSON Aspen II很好地配备了超精密机器人X、Y、Z驱动器,最大速度为11毫米/秒。它还具有基于视觉的高速对准和自动聚焦功能。该单元还具有一个冷却器,以最佳冷却基板,以稳定蚀刻过程。蚀刻速率非常稳定,提供灵活的蚀刻条件,具有重复高性能结果的能力。该机装有真空泵,能够创造低真空环境,腔室压力为5 mTorr。该工具还有一个内置的预室除气资产,允许原始蚀刻条件。Aspen II还能够在沿垂直轴的蚀刻速率高于沿水平轴的蚀刻速率的情况下进行各向异性蚀刻。MATTSON Aspen II具有广泛的蚀刻化学,包括氧气、氯气、六氟化硫和氟基。为了确保可重现的结果,该模型还具有对电力、温度和离子源等关键参数的远程控制功能。此外,这些设备可以很容易地集成到现有的半导体工艺中。Aspen II是高性能、高通量蚀刻的绝佳选择。其坚固的结构和精密的性能使其成为许多不同蚀刻应用的理想选择。
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