二手 MATTSON Aspen II #9398659 待售

ID: 9398659
晶圆大小: 8"
ICP System, 8" MATTSON Endpoint detection system With fixed filters: 430 and 520 Cable length: 19 ft (3) RF Cables and signal cables (2) Heaters MFC Chambers: Back chamber: 366 MHz CPU: Analog in and PCB out Floppy Disk Drive (FDD): DI/DO Cards Chassis: Power supply Gas channel: Bottom feed channel Cool down station: No water cooling Gas lines Right chamber: 366 MHz CPU: SEC II Card Floppy Disk Drive (FDD): Robot stepper (SMC-PC3) Chassis: Backing plain Gas channel: Junction box Cool down station: Lexan plates Gas lines with filters Front end: 26" Opening with separate operator interface 4-Color light tower Operator / Engineering monitor: TFT Design monitor Gas box with sub frames EMO Buttons Interlock circuit: Push button switches Hanging panels Load lock: Single load lock (2) Cassette stations Capability of queuing lots Pin search assembly: Proximity sensors Load lock seal: Lip seal Platform and cassette: (4) 25-Slot cassettes Rotating cassette nests, 8" Cool down station: Flat cool down station without water lines Load lock fast exchange Transfer robot: Main robot: 3-Axis robot with flex cable Robot arm: (4) Adjustable paddles with standard arm Slit door Wafer sensors: Paddles, front and rear cassettes Shuttle: 26" Process module: Chamber right and back: Tube type: Quartz tube Standard process window ICP Chamber O-ring type: Flurosilicon Temperature controller: WATLOW 988 / EZ Zone Thermal couples: Spring loaded TC Lift pin assembly Grids / Guide rings: Extended guide ring Electrical feed through Manifold and ceramic parts Isolation valve Top plate Load lock Chamber Pressure controller: VAT Valve pressure controller Chamber manometer: 10 Torr Load lock manometer: 100 Torr Shuttle manometer: 1000 Torr RF / MW System: RF System: Top RF 13.56 MHz (3) RFPP10 RF Generators: (2) Power cables missing TRAZER AMU 10D-2 RF Top match, P/N: 914-92003-00: (2) Vacuum capacitors missing Re-silvered RF coils (125) RF Vacuum caps: 100PF AC Box: 2-3 Phase generators with safety cover DC Box Gas system: Gas VCR gasket: Stainless steel and Nickel Gas line / Gas / Range Gas 1 / O2 / 1000 SCCM Gas 2 / N2 / 1000 SCCM Gas 3 / N2/H2 (4%) / 2000 SCCM Gas 4 / CF4 / 100 SCCM Side: Gas 1 / O2 / 5 SLM Gas 2 / N2 / 1 SLM Gas 3 / CF4 / 200 SCCM Gas 4 / O2 / 1 SLM Rear: Gas 1 / O2 / 10 SLM Gas 2 / N2 / 1 SLM Gas 3 / CF4 / 200 SCCM Gas 4 / O2 / 1 SLM.
MATTSON Aspen II是一款先进的蚀刻设备,提供高吞吐量、低拥有成本的精密蚀刻。它旨在提高生产率,同时提供高度的灵活性和对蚀刻参数的控制。Aspen II用于需要蚀刻各种材料的多种类型的应用和研究项目。适用于蚀刻硅、石英、钼和不锈钢等多种基材。该系统具有可调节的台阶,可轻松蚀刻大或小基板,包括角、边和台阶。大蚀刻室允许一次蚀刻多个晶片,以加快生产速度。MATTSON Aspen II很好地配备了超精密机器人X、Y、Z驱动器,最大速度为11毫米/秒。它还具有基于视觉的高速对准和自动聚焦功能。该单元还具有一个冷却器,以最佳冷却基板,以稳定蚀刻过程。蚀刻速率非常稳定,提供灵活的蚀刻条件,具有重复高性能结果的能力。该机装有真空泵,能够创造低真空环境,腔室压力为5 mTorr。该工具还有一个内置的预室除气资产,允许原始蚀刻条件。Aspen II还能够在沿垂直轴的蚀刻速率高于沿水平轴的蚀刻速率的情况下进行各向异性蚀刻。MATTSON Aspen II具有广泛的蚀刻化学,包括氧气、氯气、六氟化硫和氟基。为了确保可重现的结果,该模型还具有对电力、温度和离子源等关键参数的远程控制功能。此外,这些设备可以很容易地集成到现有的半导体工艺中。Aspen II是高性能、高通量蚀刻的绝佳选择。其坚固的结构和精密的性能使其成为许多不同蚀刻应用的理想选择。
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