二手 SEZ / LAM RESEARCH DV-34 #9233096 待售

看起来这件物品已经卖了。检查下面的类似产品或与我们联系,我们经验丰富的团队将为您找到它。

ID: 9233096
晶圆大小: 12"
优质的: 2007
Single wafer processing system Particle, polymer, & residue removal Wafers Wafer type: Standard Wafer surface treatment Cassette interfaces (25) Wafers Wafer robot (dual arm): BROOKS DBM-2406 V Robot controller: BROOKS EDC-2400 Dual ceramic end effector End effector size: 12 Options: OHT (Over Head Transfer) Light curtain Ionizer: 5285e / 4630 No open cassette adapter No wafer protrusion sensor (200mm) No carrier ID reader (RFID) No AGV Process modules: 4 / 8 Chambers (L / R) 4 chambers PSL-1 & PSL-2 (Left side): Medium-1 arm (Standard): Chemical used Medium-2 arm (Option): Chemical used DIW Arm Chuck (ADV pin) Spindle & elevating units PM I/O & Safety Box No active jet nozzle PSR-1 & PSR-2 (Right side): Medium-1 arm (Standard): Chemical used Medium-2 arm (Option): Chemical used DIW Arm Chuck (ADV pin) Spindle & elevating units PM I/O & Safety box No active jet nozzle Liquid / Chem supply cabinets (CHC1 / CHC2): CHC1: (Standard & Dual tank) Tank A: Medium REZI38 Mix ratio / Temperature 25°C Medium fill port, type: Auto fill Medium paddle wheel DIW Fill port, type: Auto fill DIW Paddle wheel Medium in-line filtration system Sampling port Buffer tank Suckback valves ULTRASONIC Flow meter Tank B: Used for chemical Medium REZI38 Mix ratio / Temperature 25°C Medium fill port, type: Auto fill Medium paddle wheel DIW Fill port, type: Auto fill DIW Paddle wheel Medium in-line filtration system Sampling port Buffer tank Suckback valves ULTRASONIC Flow meter Dual in-line heater & cooler No DI/O3 line Process pump No booster pump Recirculation pump Drain pump CHC2: System standard: (8) Chambers System option: (4) Chambers Tank A: Medium paddle wheel DIW Paddle wheel No medium in-line filtration system Sampling port No buffer tank Suckback valves ULTRASONIC Flow meter Tank B: Medium paddle wheel DIW paddle wheel No medium in-line filtration system Sampling port No buffer tank Suckback valves ULTRASONIC Flow-meter Dual in-line heater & cooler No DI/O3 line Process pump No booster pump installed Recirculation pump Drain pump CDS I/O & safety box Separate drain Chemical supply: Med-1 Pre mix Med-2 Pre mix DIW Option: HORIBA Chemical analyzer Safety: Earthquake protection FM 4910 Compliant material No main unit drip pan No drip pan leak detection Host control: SECS II (HSMS) No SECS II (RS232) User interface: Status lamp (R/Y/B/G) Sound module Front & back side UI (touch+keyboard) Options: Wafer handling robot display (CCD / Monitor) Process chamber display No dedicated backing pump No XRD module No ozone module Transformer: 30 kVA Transformer CE compliant (Input 208 Y) No transformer CE compliant with GFI (Input 208 Y) UPS No entire system (30 kVA): In 400 VAC / Out 400 VAC No control PC only (2 kVA): In 230 VAC / Out 230 VAC No pre-etch thickness No post-etch thickness No target uniformity of etch No backside surface conditioning No rough finish No polished finish No front-side etch No back-side etch No backside etch & bevel clean No oxide thinning / Removal No nitride thinning / Removal No polysilicon thinning / Removal No bevel clean No undercut Missing parts: (2) ECO Tune motors (8) Dispenser motors (2) Brake pin cylinders (2) Dispenser nozzles (2) VALVlE SAM-3250-NZD401FFI(12) Drain pump Filter Power supply: 208 VAC, 20 kVA Power Distribution Box (PDB) CE Color code No UL color code 2007 vintage.
SEZ/LAM RESEARCH DV-34是一种高性能的蚀刻器/asher,可提供最高效可靠的基板加工。该工具具有先进的特点和卓越的精度,非常适合许多不同的应用,从溅射和阳极氧化到抗去除和光刻。蚀刻器/灰烬气体输送设备旨在最大限度地提高吞吐量,同时最大限度地减少基板损坏。它还提供了对气流和工艺参数的精确控制,以提供一致的结果。蚀刻器/asher的旋转基板允许对所有尺寸不超过8英寸的基板进行快速旋转和移动处理。它采用通用驱动系统,压力和流量可调节,以适应不同的基板和工艺。此外,其气体输送装置是可调的,以匹配所需的工艺参数,允许在蚀刻和灰化过程中精确控制。它还在向上或向下缩放时配备了腔室保护装置,确保设备和基板保持在最佳状态。在软件方面,SEZ DV-34 蚀刻器/asher有一个灵活的控制机器,用于高级工艺优化和监控。它提供了气体流动和腔室状况的实时反馈,以及报警通知、自动超时和遥控功能。用户界面直观易用,提供简单的编程和过程控制。这使得LAM RESEARCH DV-34一个可靠和通用的工具,适用于许多不同的应用.高均匀性、重复性和可靠性使得DV-34蚀刻器/灰度器成为半导体研究和生产的绝佳选择。它能够以高达200微米的精度进行湿蚀刻、干蚀刻和灰化处理。低功耗和工具级诊断使其成为高通量生产环境的一个有吸引力的选择,而其灵活性和易用性也使其成为高级研究的绝佳选择。
还没有评论