二手 SEZ / LAM RESEARCH DV-34 #9233096 待售
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ID: 9233096
晶圆大小: 12"
优质的: 2007
Single wafer processing system
Particle, polymer, & residue removal
Wafers
Wafer type: Standard
Wafer surface treatment
Cassette interfaces
(25) Wafers
Wafer robot (dual arm): BROOKS DBM-2406 V
Robot controller: BROOKS EDC-2400
Dual ceramic end effector
End effector size: 12
Options:
OHT (Over Head Transfer)
Light curtain
Ionizer: 5285e / 4630
No open cassette adapter
No wafer protrusion sensor (200mm)
No carrier ID reader (RFID)
No AGV
Process modules: 4 / 8 Chambers (L / R) 4 chambers
PSL-1 & PSL-2 (Left side):
Medium-1 arm (Standard): Chemical used
Medium-2 arm (Option): Chemical used
DIW Arm
Chuck (ADV pin)
Spindle & elevating units
PM I/O & Safety Box
No active jet nozzle
PSR-1 & PSR-2 (Right side):
Medium-1 arm (Standard): Chemical used
Medium-2 arm (Option): Chemical used
DIW Arm
Chuck (ADV pin)
Spindle & elevating units
PM I/O & Safety box
No active jet nozzle
Liquid / Chem supply cabinets (CHC1 / CHC2):
CHC1: (Standard & Dual tank)
Tank A:
Medium REZI38 Mix ratio / Temperature 25°C
Medium fill port, type: Auto fill
Medium paddle wheel
DIW Fill port, type: Auto fill
DIW Paddle wheel
Medium in-line filtration system
Sampling port
Buffer tank
Suckback valves
ULTRASONIC Flow meter
Tank B:
Used for chemical
Medium REZI38 Mix ratio / Temperature 25°C
Medium fill port, type: Auto fill
Medium paddle wheel
DIW Fill port, type: Auto fill
DIW Paddle wheel
Medium in-line filtration system
Sampling port
Buffer tank
Suckback valves
ULTRASONIC Flow meter
Dual in-line heater & cooler
No DI/O3 line
Process pump
No booster pump
Recirculation pump
Drain pump
CHC2:
System standard: (8) Chambers
System option: (4) Chambers
Tank A:
Medium paddle wheel
DIW Paddle wheel
No medium in-line filtration system
Sampling port
No buffer tank
Suckback valves
ULTRASONIC Flow meter
Tank B:
Medium paddle wheel
DIW paddle wheel
No medium in-line filtration system
Sampling port
No buffer tank
Suckback valves
ULTRASONIC Flow-meter
Dual in-line heater & cooler
No DI/O3 line
Process pump
No booster pump installed
Recirculation pump
Drain pump
CDS I/O & safety box
Separate drain
Chemical supply:
Med-1 Pre mix
Med-2 Pre mix
DIW
Option: HORIBA Chemical analyzer
Safety:
Earthquake protection
FM 4910 Compliant material
No main unit drip pan
No drip pan leak detection
Host control:
SECS II (HSMS)
No SECS II (RS232)
User interface:
Status lamp (R/Y/B/G)
Sound module
Front & back side UI (touch+keyboard)
Options:
Wafer handling robot display (CCD / Monitor)
Process chamber display
No dedicated backing pump
No XRD module
No ozone module
Transformer: 30 kVA
Transformer CE compliant (Input 208 Y)
No transformer CE compliant with GFI (Input 208 Y)
UPS
No entire system (30 kVA): In 400 VAC / Out 400 VAC
No control PC only (2 kVA): In 230 VAC / Out 230 VAC
No pre-etch thickness
No post-etch thickness
No target uniformity of etch
No backside surface conditioning
No rough finish
No polished finish
No front-side etch
No back-side etch
No backside etch & bevel clean
No oxide thinning / Removal
No nitride thinning / Removal
No polysilicon thinning / Removal
No bevel clean
No undercut
Missing parts:
(2) ECO Tune motors
(8) Dispenser motors
(2) Brake pin cylinders
(2) Dispenser nozzles
(2) VALVlE SAM-3250-NZD401FFI(12)
Drain pump
Filter
Power supply: 208 VAC, 20 kVA
Power Distribution Box (PDB)
CE Color code
No UL color code
2007 vintage.
SEZ/LAM RESEARCH DV-34是一种高性能的蚀刻器/asher,可提供最高效可靠的基板加工。该工具具有先进的特点和卓越的精度,非常适合许多不同的应用,从溅射和阳极氧化到抗去除和光刻。蚀刻器/灰烬气体输送设备旨在最大限度地提高吞吐量,同时最大限度地减少基板损坏。它还提供了对气流和工艺参数的精确控制,以提供一致的结果。蚀刻器/asher的旋转基板允许对所有尺寸不超过8英寸的基板进行快速旋转和移动处理。它采用通用驱动系统,压力和流量可调节,以适应不同的基板和工艺。此外,其气体输送装置是可调的,以匹配所需的工艺参数,允许在蚀刻和灰化过程中精确控制。它还在向上或向下缩放时配备了腔室保护装置,确保设备和基板保持在最佳状态。在软件方面,SEZ DV-34 蚀刻器/asher有一个灵活的控制机器,用于高级工艺优化和监控。它提供了气体流动和腔室状况的实时反馈,以及报警通知、自动超时和遥控功能。用户界面直观易用,提供简单的编程和过程控制。这使得LAM RESEARCH DV-34一个可靠和通用的工具,适用于许多不同的应用.高均匀性、重复性和可靠性使得DV-34蚀刻器/灰度器成为半导体研究和生产的绝佳选择。它能够以高达200微米的精度进行湿蚀刻、干蚀刻和灰化处理。低功耗和工具级诊断使其成为高通量生产环境的一个有吸引力的选择,而其灵活性和易用性也使其成为高级研究的绝佳选择。
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