二手 SEZ / LAM RESEARCH DV-38F #9022268 待售
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ID: 9022268
System, parts machine
Position 1: LD, ULD Ports
Robot (Transfer unit): RBT (RS-8240)
Ionizer: Controller model 5024
Position 2: Buffer station
Robot (Transfer unit): Dual ECO Gripper left/right
Robot arm: Al anodized
Ionizer: AeroBar model 5285 (e)
Horiba HF monitor CM-210
Position 3, 4, 5, 6, 7, 8, 9: PMR1-PMR4, PML1-PML3
Robot (Transfer unit): Rear machine handling - (Twin ECO gripper)
Chamber material: PP
Chamber shape: Ring type
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chamber lower section: PP
Chemical supply piping: PFA
Drain piping: PVDF
Chamber cleaning: DIW
Ionizer: QuadBar 4630-DS
ABB Protronic 500 Temp controller: in-line heater controller
Position 10: PML4
Robot (Transfer unit): Rear machine handling - (Twin ECO gripper)
Chamber material: PP
Chamber shape: Ring type
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chamber lower section: PP
Chemical supply piping: PFA
Drain piping: PVDF
Chamber cleaning: DIW
Trebor 110R Pump
Entegris 0.03um Filter
Quickchange disposable filter QCDYATMTF Housing
Ionizer: QuadBar 4630-DS
Position 11: CHC1L
Chamber material: PP
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chemical supply piping: PFA
Drain piping: PVDF
Siemens heater
Almatec chemical drain pump
Trebor 110R Pump
Entegris 0.03um Filter
Quickchange disposable filter QCDYATMTF Housing
Levitronix BPS-3 process supply pump
Position 12: CHC1L
Chamber material: PP
Chamber chuck material: PVDF / PETP / Stainless steel
Robot arm: PVDF (Pins), PETP (Assembly)
Chemical supply piping: PFA
Drain piping: PVDF
Siemens heater
Almatec chemical drain pump
Levitronix BPS-3 process supply pump
Position 13:
Chamber chuck material: Chuck drive unit Al - anodized
Megasonic: Honda-Ultrasonic flow meter USF100A type
230 VAC, 1 P+N, 50/60 Hz
Max current: 2 A
Breaking capacity: 10,000 AIC
Does not include chemical supply module.
SEZ/LAM RESEARCH DV-38F是可用于半导体加工的最先进的等离子体蚀刻/分离器之一。是一种低温、低功耗、高性能的蚀刻器/asher设备，可用于各种材料的材料沉积、蚀刻和平面化。该系统设计通用可靠，可实现精确等离子体控制和沉积速率优化。该单元由一个腔室、一个气箱、一个电源、一个控制器和一个过滤机组成。腔室设计最多可容纳六个晶片，使工具可以一次处理多个晶片。它还配备了隔热盖，保持室内内容在恒定的温度。气体箱提供加工晶片所需的气体，包括蚀刻和沉积所需的反应性气体。该电源用于产生能够精确控制离子轰击能量的高频等离子体。控制器从整个资产中收集数据，并调整气流和功率设置，以获得最佳的等离子体蚀刻和沉积。最后，过滤模型过滤废气，确保清洁操作。经济特区DV-38F为蚀刻和沉积提供准确的过程控制，以及各种各样的定制和过程优化选项。它能够处理平面结构和三维结构，在多个晶片上具有很高的均匀性。该设备非常适合各种材料，具有低温要求和低功耗水平。此外,LAM RESEARCH DV-38F还具有一个用户友好的界面,具有远程访问和自我诊断功能,便于设置和持续监控。系统还有一个即时反馈单元，提供进程本身的实时数据。因此,DV-38F是任何寻找可靠且经济高效的蚀刻机/粉碎机的半导体制造或研究设施的完美解决方桉。
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