二手 TEGAL 6550 #9155217 待售
网址复制成功！
单击可缩放
ID: 9155217
晶圆大小: 8"
优质的: 2003
Reactive Ion Etcher (RIE) system, 8"
Platform: Rinse / Strip, through-the-wall, signal tower
PDM: Standard
System includes:
(2) Patented spectra plasma process modules
Standard ceramic electrostatic clamp (200 mm)
High temperature electrostatic clamp (200 mm)
(2) Integrated diode array optical analyzers
(2) Recirculating temperature control units
Vacuum cassette elevator loadlock
Core vacuum transport module with robot
Wafer aligner module
ICP Strip process module
Spin rinse / Dry process module
Atmospheric transport module with robot
Remote RF generator cabinet
Remote power distribution module
Integrated human interface and control system
Remote LCD interface module
Cleanroom signal tower (3 Color standard)
PM 1: Spectra 1.0, Special HT-ESC
MFC Type: MYKROLIS TYLAN FC2900
Gas 1: BCl3, 0-200sccm
Gas 2: Cl2, 0-50sccm
Gas 3: SF6, 0-50sccm
Gas 4: HBr, 0-50sccm
Gas 5: CF4, 0-50sccm
Gas 6: Ar, 0-200sccm
Gas 7: He (Water temperature control)
LF Generator: 600 watts
HF Generator: 1200 watts
Gas injection: Open ring
PM Turbo pump: 1000L/s
End point: Diode array
LE Temp range: Filtered house cooling water
PM 2: Spectra, special high vacuum mod's
MFC Type: MYKROLIS TYLAN FC2900
Gas 1: Spare
Gas 2: Spare
Gas 3: He, 0-200sccm
Gas 4: Spare
Gas 5: Ar, 0-100+sccm
Gas 6: Ar, 0-500+sccm
Gas 7: He (Water temperature control)
LF Generator: 300 watts
HF Generator: 1200 watts
Gas injection: Open ring
PM Turbo pump: 1000L/s
End point: Diode array
LE Temperature range: Noah precision: GALDEN PFPE HT170
PM 3: ICP Strip module
MFC Type: MILLIPORE TYLAN 2900
Gas 1: O2, 0-2000sccm
Gas 2: N2, 0-500sccm
Gas 3: He, 0-500sccm
PM4: DI Water rinse module
Gas 3: PM3 (strip)
Gas 4: PM2 (etch)
Gas 5: PM2 (etch)
Chambers:
ICP Cl2 / CFxHy Etch chamber (primary etch chamber)
ICP Low-voltage Ar mill "SOM"
Anti-corrosion treatment used with He / H2 or N2 / H2
Anti-corrosion water rinser
O2-Based asher
EDWARDS QDP-40,80
Gas reactor column EDWARDS M150
CE Marked
AC Supply: 400 V, 3 Phase, 50 Hz, 5 wire
2003 vintage.
TEGAL 6550是一种蚀刻器/asher，设计用于正面和背面晶片处理。该系统提供了在基板层内创建3维图桉的高效和经济高效的方法。6550实现了高度选择性的加工，同时利用干蚀刻和湿蚀刻。蚀刻器/asher在基板内具有3维视场,可创建精确的图样,而不会造成层的任何物理变形。它还具有6位高分辨率机械移位,非常适合自动和手动对准。TEGAL 6550具有基板移位速率的可调速度，以及用于跟踪较宽图样的激光扫描系统。蚀刻器/asher利用先进的计算机控制平台,具有可集成到其他系统的联网功能。此外，6550还配备了一个内置软件包，用于执行不同的蚀刻任务。该软件包用户友好、直观，方便用户理解和优化蚀刻过程。TEGAL 6550配有多种组件,包括驱动板、电源和冷却系统。它还提供了一个集成的、隔离的射频发生器，以提高蚀刻工艺的吞吐量。此功能可确保最大程度地控制蚀刻过程。6550还具有多项高级安全功能,包括自动断电功能,该功能在不使用时关闭系统,以及内置的ETCHER安全开关,该开关允许仅访问已批准的用户。总而言之，TEGAL 6550是为高精度基板加工而设计的先进蚀刻器/asher。它具有很高的可靠性和经济效益,并具有精确和精确蚀刻所需的所有功能。
还没有评论