二手 TEGAL 903E #293654462 待售

Etcher, 6" Through the wall Handles: 3"-6" Silicon Reactor chamber with upper and lower electrode Super spatulas Shuttle wafer transfer Typical temperature controller JULABO Chiller: 0-80°C ENI ACG-10B Solid state RF Matching network, 13.56 MHz (Fully automated) ENI ACG-10B RF Generator 13.56 MHz RF Power: 50-1,000 W Wafer quartz pin: Up / Down Calibration and built-in diagnostic function SEC / GEM Communication function Multi-level password protection Distilled water Capacity: 2.8 gal Outlet pressure: 40 psig, 45 psig max Flow connecting hose must withstand coolant at 40 psig at 80°C Display: Real-time graphic Storage capacity: 20 Recipes Gasses: Gas 1: 15-20 psig +/- 5psig Gas 2: 15-20 psig +/- 5psig Gas 3: 15-20 psig +/- 5psig Gas 4: 15-20 psig +/- 5psig Clean channel needle valve O2: 20-30 psig +/- 5psig Cabinet exhaust: 100 CFM (2.832 LPM) min Typical process: Material etched: Silicon oxide, polyimide, SOG and PECVD nitride Gases: CHF3, SF6, Helium Typical process pressure: 1600-3000 m Torr Typical RF-power level: 400-600 W Typical temperature: Upper electrode, 24/30°C, Lower electrode, 19/23°C Power supply: 200-240 VAC, 50/60 Hz, 30 Amp, 3 Wire, 1 Phase, 2 Pole.