二手 TEL / TOKYO ELECTRON Unity IIe #9093721 待售
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ID: 9093721
晶圆大小: 8"
优质的: 1998
Dry etcher, 8"
Configuration: Unity 2 DRM
Chamber type: DRM
Software version: Ver 3.61-Rev 212
Wafer type: Flat
Main body type: Wide
Chamber: 2-Chamber
Robot type: Yaskawa/Twin arm
Robot drive: Yaskawa/VS2A
Robot drive: Yaskawa/Vosh
Pendulum valve: VAT/65046-PH52
Isolations V/V: Present
Pressure gauge: MKS/627A-13614-S
TMP1: Seiko Seiki/STP-1303W1
TMP2: Seiko Seiki/STP-1303W1
TMP Con't1: Seiko Seiki/STP-1303W1
TEMP Con't2: Seiko Seiki/STP-1303W1
Generator1: ENI/OEM-25B-01
Generator2: ENI/OEM-25B-01
Matcher1: ENI/MWD-25LD
Matcher2: ENI/MWD-25LD
Chiller1: SMC INR499-201
Gas: 8-Line STEC/Aera
B.HE (CNT): STEC/SEC-7440
B.HE (Edge): STEC/SEC-7440
Main controller:
ISA SLOT1 NE2000 PLUS3N-2 Present
ISA SLOT2 IBX4101 Present
ISA SLOT3 EMPTY Present
ISA SLOT4 AT-BCN/A Present
HDD(SYSTEM) Present
HDD(DATA) Present
VME slot 1 SVA 004a Present
VME slot 2 SVA603 Present
VME slot 3 MVME612 Present
VME slot 4 GST-M-SET-312 Present
VME slot 5 TVB0002 Present
VME slot 6 TVB0010-1 Present
VME slot 7 TEB102-1 Present
VME slot 8 EMPTY
VME slot 9 TVB0008 Present
VME slot 10 TEB3101-1 Present
TYB221-1/PUMP Present
TYB415-1/RF Present
TYB212-1/RF Present
TYB416-1/PUMP Present
TYB414-1/CONT Present
TYB425-1/INT Present
P/C1 Controller:
Slot 1 APC(PB-2) Present
Slot 2 TYB112-1/DIO Present
Slot 3 TYB111/MAIO Present
Slot 4 TYB121/COM Present
Slot 5 TYB121/COM Present
Slot 6 TEMP Present
Slot 7 EMPTY
P/C2 Controller:
Slot 1 APC(PB-2) Present
Slot 2 TYB112-1/DIO Present
Slot 3 TYB111/MAIO Present
Slot 4 TYB121/COM Present
Slot 5 TYB121/COM Present
Slot 6 TEMP Present
Slot 7 EMPTY
T/C Controller:
Slot 1 COM Present
Slot 2 TYB112-1/DIO1 Present
Slot 3 TYB112-1/DIO2 Present
Slot 4 TYB112-1/DIO3 Present
Slot 5 MAIO Present
Slot 6 TYB131-1/ILK Present
Gas Box module:
TYB 211-A/GAS(1) Present
TYB 211-A/GAS(2) Present
1998 vintage.
TEL/TOKYO ELECTRON UNITY IIe 蚀刻器/asher是一种可靠、经济高效、高效的蚀刻和灰化工艺,非常适合设备级处理、产量管理和产品创新。TEL Unity IIe是TEL先进的等离子体蚀刻器和分离器之一,旨在提供极其精确的处理。该工艺室额定为10,000级清洁，并配备了自动燃气开关、自动平衡配电等先进的工艺控制功能，确保了优越的蚀刻和灰化性能。TOKYO ELECTRON UNITY IIe使用低压等离子体蚀刻工艺，非常适合创造高纵横比特性。它采用了PECVD涂层,可创建精确的保形涂层以提高蚀刻和灰化精度。为了提高工艺经济性，Unity IIe能够单次处理大型晶片。它采用8x300mm晶圆尺寸，温度可编程用于优越的基材粘附。TEL/TOKYO ELECTRON UNITY IIe还附有多站晶片卡带加载、自动清除故障安全保护以及直观的自动晶片加载技术，以确保出色的晶片处理和吞吐量。TEL Unity IIe还具有可配置的工艺气体管线,可用于蚀刻、灰化或两种工艺的组合。它有五个独立的气体输送系统，能够优化蚀刻剖面以获得最佳蚀刻结果。此外，TOKYO ELECTRON UNITY IIe还配备了可定制的工艺配方、可调参数，以及高级在线反馈控制，以获得卓越的蚀刻精度。Unity IIe设计用于各个行业，如半导体、消费电子、MEMS和LED制造。TEL/TOKYO ELECTRON UNITY IIe凭借其强大的蚀刻和灰化能力，每小时可快速处理260-300个晶圆，同时实现优越的均匀性。它能够完全控制过程参数，以确保重复和一致的结果，提高产品的可靠性和产量。
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