二手 EATON NOVA / AXCELIS GSD 200E2 #9026352 待售

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ID: 9026352
Ion implanter, 8" (13) Batch wafers Application process: High current implanter System software Version: 4.9.1 (Sun OS) Utility gas: CDA, Machine air, Swagelok, 3/8" Sus male Ar, Process air, Swagelok, 3/8" Sus male PN2, Process vent, Swagelok, 3/8" Sus male GN2, Purge vent, Swagelok, 3/8" Sus male Exhaust: (2) Environment, GEX, 500 CFM, 8" PVC, has exhaust hood (2) RP Exhaust, SEX, 2" Sus, has exhaust hood (1) Cyro pump, SEX, 20 CFM, 2" Sus, no exhaust hood (1) Gas cabinet, SEX, 500 CFM, 8" PVC, 1, has exhaust hood (1) Source cleaning exhaust, SEX, 65, 2.5" PVC, no exhaust hood Cooling water: (2) RP Cooling water, 14~28 psi, 5~8 GPM, 24º C, 3/8" (1) City water, 55~75 psi, 7.5 GPM, 24º C, 1", to DI cooling water (1) Cyro compressor, 14~28 psi, 5~8 GPM, 24º C, 1" Endstation module: (4) Cassette table (280 mm) (2) Load buffer (1) Dummy buffer Mini-environment: Synetics ATM Robot: OK Notch/Flat finder: Notch type Vacuum cassette: STD (VESPEL Support pin) Load port interface: N/A Beam profile oscilloscope: Tektronix TDS 210 Cell controller/version: Cell 177 (1915690, Rev. A) Loadlock type: STD Main SUN computer: Sparc station 5 Main monitor: 17", LCD Second SUN computer: Yes (function unknown) Second SUN monitor: N/A Tape reader: NG Printer: N/A Process module: Disk: Seg Si Coated, P/N: 11027061 Flag faraday with SRA: OK (11019550) Electron/plasma shower: P-shower (1190160) Plasma shower filament PS: Yes (EMS) Bias aperature: Yes Shower gas panel: Yes (STEC SEC-7320, 2 sccm) Water bleed MFC: MKS (Type: 1150) Ar/Xe Beamguide gas: Motor control In-Vac arm: Yes Wafer holder: Yes Disk wafer clamp/unclamp: Roller type (1180270) Gyro/Angle: NV-GSD-100 Linear drive: OK Rotary drive: Direct drive HYT Sensor: Yes (20SX) Beam profile holes: N/A Disk RGA Port: Yes Resolving housing RGA Port: N/A Wafer charge sensor: Yes P-Shower charge monitor: Yes P-Shower disk current: Yes Loadlock controller type: 4-Axis DI In-air wafer xfer controller: 4-Axis DI Robot controller: 4-Axis DI Beamline module: HV Power supply: Hitek Power Inc. HV Stack: OL8000/104/30, 100 KV Post Accel. Volt: N/A Extraction suppression PS: Glassman, PS/NV-15NN33, 2200158 AMU: Acelis AMU PS: EMS 40-150-2-D0816 Hall probe: Axcelis Max. extraction voltage: 90 KeV Beam profiler hole: N/A Decel function: N/A Beamline purge kit: N/A Source module: Source head/vaporizer: ELS/No vaporizer Filament PS: EMS 10-60 Arc PS: EMS 150-7 Cathode PS: yes Vaporizer PS: N/A Source magnet: Axcelis Source magnet PS: EMS 25-25 Source bushing: Orange Extraction assembly: Yes Variable resolving aperture: Yes Source ISO Transformer: STD Source injection kit: N/A Source cleaning exhaust: Yes Block type: N/A Gas box module: Gap Loop #1: Ar, HP Gap Loop #2: BF3, SDS Gap Loop #3: AsH3, SDS Gap Loop #4: PH3, SDS Loop #1 MFC: MKS 1179A-14493, Ar, 10 sccm Loop #2 MFC: MKS 1640A-011, BF3, 10 sccm Loop #3 MFC: MKS 1640A-011, AsH3, 10 sccm Loop #4 MFC: MKS 1640A-011, PH3, 10 sccm Vacuum system: P1/Source turbo: A2203C, SEIKO SEIKI P1 Controller: STP-A2203C, SEIKO SEIKI P2/Beamguide Cyro pump: CTI OB-8 P3/V3 Cyro pump: CTI OB-10 P9/Disk Cyro pump: N/A RP1: Remote RP2: Remote IG1: SUZUKI G-75-NTT P IG1: SUZUKI G-75-NTT IG2: SUZUKI G-75-NTT IG3: Stabile ion gauge IG Controller: M/N: 360 Safety options: (4) Smoke detectors VESDA: N/A CES Options: N/A Others: (2) Ground bars Enclosures: OK Ground indication lamp: N/A INO Kit: N/A Drawings/Manuals: N/A SECS/GEM Function: OK System 24V UPS: N/A Light tower: G/Y/R SPC Function: OK Does controller pcomp. algorithm type: Turbo dose DI (1526990) Spare parts: N/A Alignment tools: N/A Sub-systems: Main Transformer: TAVR, 3 Phase, 60 Hz, 50 KVA, Pri. 440 V RP1: Ebara, A70WN RP2: Ebara, A70W Compressor 1: CTI_CRYOGENICS, 9650 Input power: 208 V, 60 Hz, 3 Phase, 95 A, 35 KVA Output power: 90 KeV, 20 mA 2001 vintage.
EATON NOVA/AXCELIS GSD 200E2是由EATON NOVA Technologies, Inc.的子公司AXCELIS开发的离子植入器和监视器。它为离子植入过程提供了卓越的性能、可靠性和多功能性。AXCELIS GSD 200E-2提供各种植入深度和直径,分别高达8kV和3.0 T/m。它结合了封闭式束流设计,并配备了源和束流气体系统。气体系统,从束线外调节,提供最佳的粒子能量,工作压力,角度形状,和灯丝的位置。EATON NOVA GSD 200 E2配备了最先进的手动和自动操作控制系统。在触摸面板显示屏上,用户可以控制腔室压力、灯丝和设置。它还具有内置的诊断功能,使操作员能够实时和远程监视系统,包括温度、电压和气体水平。EATON NOVA/AXCELIS GSD 200E-2采用可移动机械快门打造,提供额外的安全性和准确性。在安全性等性能特点上,AXCELIS GSD 200 E2配备了声学外壳,以及符合半导体加工安全要求的辐射和真空外壳。AXCELIS GSD 200E2是高性能植入器服务市场中唯一能够提供快速、精确读数的离子植入器和显示器。不仅GSD 200E2提供精确的植入,它还监控和控制整个过程中的环境。它能够检测和响应粒子轨迹、光束轮廓和统计参数。通过先进的传感器和软件设计,系统能够确保精确的植入性能和更少的颗粒损伤。此外,EATON NOVA/AXCELIS GSD 200 E2允许小颗粒的紧密植入。这对于MEMS和其他微设备制造等技术过程至关重要。EATON NOVA GSD 200E-2还具有广泛的粒子类型和大小,以及不同离子种类之间的高速切换。GSD 200E-2是市场上性能最高的离子植入器和监控器。
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