二手 EATON NOVA / AXCELIS GSD 200E2 #9312589 待售

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ID: 9312589
High current implanter, 8" SMIF System: Interface Handle systems: SDLC System In air robot Load buffer Dummy buffer Vacuum cassette Tilt stand Notch aligner Process chamber: Batch Disk 13-pads, 8" In-vacuum arm Wafer holder AFFINITY Disk chiller AFFINITY Single close loop cooling chiller Vacuum system: CTI-CRYOGENICS 8200 Cryo compressor CTI-CRYOGENICS 9700 Cryo compressor CTI-CRYOGENICS OB 8 Beam line cryo pump CTI-CRYOGENICS OB 10 Beam line cryo pump No process cryo pump EDWARDS STP-2203C Source high vacuum pump EDWARDS QDP Rough pump HCIG Vacuum gauge controller End station: 4-Cassette table Wafer aligner type: Notch aligner Wafer handling system: In air / In vacuum high throughput Particle filter system: Class 1 UPLA Implant angle: 2-Axis variable: ± 7° Quad implant capability Process disk spindle: GSD Direct drive Beam monitor system: In situ beam potential monitor Real-time patented dose control Real-time beam profiler (1D) Process disk: Silicon coated UHD small radius fences Process disk cooling interlock ASYST LTP2000 SMIF Interface Gas box option: Modular gas box / 4-Strings option 1 HP (MFC Unit 1660) 3 SDS (MFC Unit 1662) Extraction power supply: 90 keV Extraction voltage monitor Vaporizer Ion source: ELS Source bushing: Extended life bushing Extraction electrode: Type 34 Source injection kit AMU System: Triple index Post accel power supply: 90 keV Post accel electrode Terminal isolation transformer: Dry transformer Bias aperture assembly Flag faraday Secondary electron flood gun: PEF Control UPS Main isolation transformer Smoke detector Exhaust flow switch Water leak sensor Light tower No real-time particle detection Earthquake retrofit SUN Solaris operator workstation Hard Drive Drive (HDD) LCD Monitor, 21" SECS I and SECS II Protocols GEM Interface and Ethernet ports CIM: Solaris 2006 vintage.
EATON NOVA/AXCELIS GSD 200E2是一种离子植入器和监控设备,旨在提供卓越的离子植入性能、过程控制和均匀性。该系统为离子化和非离子化物种的高能离子注入提供了多种配置,性能和准确性都很高。AXCELIS GSD 200E-2是一个多轴单元,结合了2轴扫描加速器和4轴伺服运动工具,用于定位和优化离子植入。该资产使用直径200毫米的射频驱动植入枪在整个基板表面以光滑、均匀的轮廓产生离子。该枪的运动是通过先进的伺服控制器和独立的磁场来实现的。该模型配备了一个板载探测器,用于监测植入过程。该检测器还可以与专门的监控策略结合使用,以控制植入率和均匀性。EATON NOVA GSD 200 E2旨在满足现代半导体加工的苛刻要求。它符合严格的安全法规,并配备了一系列安全功能,以保护操作员免受辐射风险和植入过程中使用的潜在危险材料的伤害。此外,该设备还配备了业界领先的自动化能力,允许直接操作和优化植入过程。总体而言,EATON NOVA GSD 200E-2是一个可靠、可控和精确的离子植入系统,旨在提供卓越的效果。它提供了广泛的能力,包括电离和非电离物种的高能离子植入,出色的过程控制和舒适的操作。单位还符合严格的安全要求,保证了宜人安全的工作环境。
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