二手 EATON NOVA / AXCELIS NV 8250HT #9366390 待售
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ID: 9366390
优质的: 2000
Implanter
Vacuum system:
CTI-CRYOGENIC 9600 Cryo compressor
OB 8 Beam line cryo pump
(2) OB 8 Process cryo pumps
STP1003C Source pump
STP301C Beam line turbo pump
STP1003C Beam line turbo pump
Vacuum controller: HCIG
End-station:
Cassette capability: 2-Cassette
Wafer size: 8"
Wafer notch alignment: Automatic notch alignment capability
Wafer handling system: In-air / In-vacuum high throughput
Particle filter system: Class 1, UPLA Filtered wafer handling system
Implant angle capability:
Quad implant
Real-time beam profiler (Single dimension)
Tilt axis: 45°
Twist axis: 360°
Beam monitoring system: Real-time patented dose control
Chuck: Electro-static clamp
Chuck cooling interlock
ASYST LPT 2200 SMIF Interface
Chiller
E-Clamp
E-Shower controller and power supply unit
Flag faraday relay box
Beam profiler card include external box
DSP Motor controller
CP1 Pump
Dosimetry frame include side cup and P-Cup
Cell controller
Aligner assembly
CPU
Tx Arm include pneumatic assy
Oscilloscope
FFU
Terminal:
Four string gas box:
Gas box option: Modular gas box
High pressure string
(2) SDS String hydride: Arsine and phosphine
SDS String fluoride: Boron trifluoride
(3) Pressure transducer on SDS string (Per string): PSIA
Mass flow controller:
UNIT 1660
(3) UNIT 1662
Extraction voltage monitor: 0-40 keV
Vaporiser
Ion source: ETERNA Extended Life Source (ELS)
Source bushing: Extended life bushing
Extraction electrode: (3) Axis extraction electrode
AMU System: Triple indexed mass analysis magnet and power supply
Beam shutter
Beam line quads beam focus and scanner
P-Lens power supply: 0-68 keV
Decel power supply: 0-40 keV
Accel power supply: 0-142 keV
Terminal transformer: Oil-cooled transformer
Angular energy filter
Energy slit
Beam profiler with P-cup
Flag faraday with side cups
Cathode power supply unit
Filament power supply unit
Arc power supply unit
Source controller
(3) Turbo pump include controller / Harness
Ext electrode assy
Source and cooling flange
Source magnet power supply unit
High resolution scanner scan generator DI
AMU Power supply unit
Terminal PD DI
Beam Shutter DI: Dose DI
Terminal beam line DI: General IO DI
Gas box DI
Ground interface DI: Terminal DI
Disk thermocouple DI: TC Di
(4) IG Controllers and cables
HV Supply power supply unit
Extraction power supply unit
Quad power supply unit
Right scan amplifier
Digital tesla meter
Scan suppression power supply unit
Accel power supply unit
Decel power supply unit
AEF power supply unit
Charge control technology: E-Shower
NESLAB / AFFINITY Chiller
Control UPS
Main isolation transformer
Smoke detector
Exhaust flow switch
Water leakage sensor
Light tower
SECS I and SECS II Protocols
GEM Interface
Ethernet ports
IG and TC Gauge
2000 vintage.
EATON NOVA/AXCELIS NV 8250HT是一种用于半导体制造工艺的离子植入器。这种工具是一种高能、高通量、中直径的离子植入器。它用于将各种类型的离子植入材料基板中,用于制造电气或电子元件。AXCELIS NV 8250HT配备了高性能、30 keV GaAs增强屏幕,可实现聚焦植入物轮廓、增强基板吞吐量和提高工艺可靠性。采用集成的高分辨率光学传感器对离子束进行监测,以提供准确的植入物监测。EATON NOVA NV 8250 HT具有先进的IntelliActivityTM腔室控制设备,可实现精确的光束操作和离子束控制。这种精确的离子束控制允许植入和控制广泛的离子种类,包括硼和磷。此外,NV 8250HT还配备了七个可互换的目标位置,以精确植入不同材料的方法。这些腔室也可以用来增加离子植入的均匀性。EATON NOVA NV 8250HT采用六级直流磁束传输系统和50kV预加速级。它具有集成、高压、低电流的光束评分单元,可精确控制离子束。EATON NOVA/AXCELIS NV 8250 HT还具有先进的闭环离子电流监测仪,具有自适应反馈回路,可调节离子电流水平,以适应不同的基质和植入条件。AXCELIS NV 8250 HT设计用于处理多种植入材料,包括硼、磷、砷和硅化物。可用于单剂量和批次/连续剂量植入应用。离子植入器配有FluenceMapTM图形用户界面(GUI),可提供植入物过程的实时反馈,并能实时监测植入物状况。此外,NV 8250 HT的设计便于维护和高效运行,从而降低了停机时间和维护成本。EATON NOVA/AXCELIS NV 8250HT是一种可靠、通用的离子植入器,可用于多种高容量、高精度的植入应用。它旨在为用户提供精确高效的植入过程,提高吞吐量,提高均匀性,提高可靠性。
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