二手 EATON NOVA / AXCELIS NV GSD 200E2 #9224295 待售

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ID: 9224295
晶圆大小: 8"
High current ion implanter, 8" 180 keV SMIF System: ASYST LPT2200 SMIF Interface capability Hardware configuration (Subfab / Auxiliary units): Cryo compressor Disk chiller Vacuum system: Cryo compressor 1: CTI-8200 (P2) Cryo compressor 2: CTI-9700 (P3) Beam line cryo pump 1: OB 8 ( P2 ) Beam line cryo pump 2: OB 10 (P3 ) No process cryo P9 Source pump: STPA2203C ( P1 ) No AMU Turbo pump Terminal rough pump: EBARA Pump 40x20 ( RP1 ) Endstation rough pump: EBARA Pump 40x20 ( RP2 ) Vacuum controller: HCIG End station: (4) Cassettes Wafer notch alignment: Automatic notch alignment capability with buffer cassette Dummy wafer: Integrated dummy wafer fill-in capability Wafer handling system: In-air / In-vacuum high throughput wafer handling system Particle filter system: Class 1, UPLA filtered wafer handling system Implant angle capability: Two axis variable implant angle (+/- 11 deg in two axes) Quad implant capability Process disk spindle: GSD Series belt drive process disk With active cooling and external close loop chiller Beam monitoring system: In situ beam potential monitor Real-time patented dose control Real-time beam profiler (Single dimension) Process disk: Silicon coated process disk (UHD Small radius fence) Process disk cooling interlock Gas box options: Modular gas box (4) String gas box options High pressure string (2) SDS String hydride (Arsine and phosphine) SDS String flouride (Boron trifluoride) (3) Pressure transducers on SDS string: PSIA Mass flow controller: 1660 Kit (3) 1662 Kits Extraction PS: 0-90 kV Extraction voltage monitor Vaporiser Ion source: Eterna ELS (Extended life source) Source bushing: Extended life bushing Source liner for extended life bushing N2 Purge: Bypass valve and nitrogen purge Extraction electrode 34 Source injection kit AMU System: Triple indexed mass analysis magnet and power supply Post accel PS: 0 -90 kV No post accel electrode Terminal transfomer: Dry transformer Bias aperture assy Flag faraday Charge control technology: Secondary electron flood gun: PEF Closed-loop cooling system selection: Cooling system: Single loop affinity chiller Control UPS Main isolation transformer Abatement system: EGS237 Novapure Smoke detector Exhaust flow switch Water leakage sensor Light tower No real time particle detection system Advanced automation package: SUN SOLARIS Operator workstation: Hard drive, 21" monitor SECS I and SECS II Protocols GEM Interface and ethernet ports CIM Linked Missing parts: Gauss probe / Controller Arm servo motor assemble Wafer handler / Gyro controller Cryo controller interface Cell controller part Extraction electrode board MFC Interface board Source assembly Post stack assembly.
EATON NOVA/AXCELIS NV GSD 200E2是一种离子植入器和监控器。这类设备用于通过薄膜将离子植入基材或靶材中。该装置专为高速高温植入而设计,非常适合半导体等技术应用。AXCELIS NV GSD-200E2采用四极管类型的离子源,在2至200 KeV的能量下加速离子。这类离子源的覆盖范围很广,可以精确定位离子束。该设备还具有可调的初级加速电压,可以根据目标材料的需要进行更改。此功能可确保设备提供一致的离子束,从而实现最均匀的植入。此外,还可以调节离子源以提供一定范围的离子束能量,从而确保目标材料的最佳植入深度。离子植入过程的监测是通过多种不同方式完成的。EATON NOVA NV-GSD 200E2配备了数字显示屏,可以精确读取离子电流、能级等等。此外,设备还配备了离子束数据记录器,可以准确读取所有离子注入参数。此外,该设备还能够实时分析离子束参数,使操作员能够快速响应束参数的任何变化。EATON NOVA NV-GSD 200E-2旨在在各种植入环境中提供安全可靠的操作。该装置采用高压隔离变压器制造,防止对用户造成危险的电击。此外,该装置设计为使用低气压环境,确保植入过程的安全。此外,此设备还配备了防错误读出系统,使操作员能够快速识别植入过程中的任何错误。总体而言,EATON NOVA/AXCELIS NV-GSD 200E-2是一种有效可靠的离子植入装置和监测器。凭借其可调离子源、多种监控和分析选项,以及一系列安全特性,这款设备是半导体等技术应用的理想选择。
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