二手 EATON NOVA / AXCELIS NV GSD 200E2 #9224295 待售
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已售出
ID: 9224295
晶圆大小: 8"
High current ion implanter, 8"
180 keV
SMIF System: ASYST LPT2200 SMIF Interface capability
Hardware configuration (Subfab / Auxiliary units):
Cryo compressor
Disk chiller
Vacuum system:
Cryo compressor 1: CTI-8200 (P2)
Cryo compressor 2: CTI-9700 (P3)
Beam line cryo pump 1: OB 8 ( P2 )
Beam line cryo pump 2: OB 10 (P3 )
No process cryo P9
Source pump: STPA2203C ( P1 )
No AMU Turbo pump
Terminal rough pump: EBARA Pump 40x20 ( RP1 )
Endstation rough pump: EBARA Pump 40x20 ( RP2 )
Vacuum controller: HCIG
End station:
(4) Cassettes
Wafer notch alignment: Automatic notch alignment capability with buffer cassette
Dummy wafer: Integrated dummy wafer fill-in capability
Wafer handling system: In-air / In-vacuum high throughput wafer handling system
Particle filter system: Class 1, UPLA filtered wafer handling system
Implant angle capability:
Two axis variable implant angle (+/- 11 deg in two axes)
Quad implant capability
Process disk spindle: GSD Series belt drive process disk
With active cooling and external close loop chiller
Beam monitoring system:
In situ beam potential monitor
Real-time patented dose control
Real-time beam profiler (Single dimension)
Process disk: Silicon coated process disk (UHD Small radius fence)
Process disk cooling interlock
Gas box options:
Modular gas box
(4) String gas box options
High pressure string
(2) SDS String hydride (Arsine and phosphine)
SDS String flouride (Boron trifluoride)
(3) Pressure transducers on SDS string: PSIA
Mass flow controller:
1660 Kit
(3) 1662 Kits
Extraction PS: 0-90 kV
Extraction voltage monitor
Vaporiser
Ion source: Eterna ELS (Extended life source)
Source bushing:
Extended life bushing
Source liner for extended life bushing
N2 Purge: Bypass valve and nitrogen purge
Extraction electrode 34
Source injection kit
AMU System: Triple indexed mass analysis magnet and power supply
Post accel PS: 0 -90 kV
No post accel electrode
Terminal transfomer: Dry transformer
Bias aperture assy
Flag faraday
Charge control technology:
Secondary electron flood gun: PEF
Closed-loop cooling system selection:
Cooling system: Single loop affinity chiller
Control UPS
Main isolation transformer
Abatement system: EGS237 Novapure
Smoke detector
Exhaust flow switch
Water leakage sensor
Light tower
No real time particle detection system
Advanced automation package:
SUN SOLARIS Operator workstation: Hard drive, 21" monitor
SECS I and SECS II Protocols
GEM Interface and ethernet ports
CIM Linked
Missing parts:
Gauss probe / Controller
Arm servo motor assemble
Wafer handler / Gyro controller
Cryo controller interface
Cell controller part
Extraction electrode board
MFC Interface board
Source assembly
Post stack assembly.
EATON NOVA/AXCELIS NV GSD 200E2是一种离子植入器和监控器。这类设备用于通过薄膜将离子植入基材或靶材中。该装置专为高速高温植入而设计,非常适合半导体等技术应用。AXCELIS NV GSD-200E2采用四极管类型的离子源,在2至200 KeV的能量下加速离子。这类离子源的覆盖范围很广,可以精确定位离子束。该设备还具有可调的初级加速电压,可以根据目标材料的需要进行更改。此功能可确保设备提供一致的离子束,从而实现最均匀的植入。此外,还可以调节离子源以提供一定范围的离子束能量,从而确保目标材料的最佳植入深度。离子植入过程的监测是通过多种不同方式完成的。EATON NOVA NV-GSD 200E2配备了数字显示屏,可以精确读取离子电流、能级等等。此外,设备还配备了离子束数据记录器,可以准确读取所有离子注入参数。此外,该设备还能够实时分析离子束参数,使操作员能够快速响应束参数的任何变化。EATON NOVA NV-GSD 200E-2旨在在各种植入环境中提供安全可靠的操作。该装置采用高压隔离变压器制造,防止对用户造成危险的电击。此外,该装置设计为使用低气压环境,确保植入过程的安全。此外,此设备还配备了防错误读出系统,使操作员能够快速识别植入过程中的任何错误。总体而言,EATON NOVA/AXCELIS NV-GSD 200E-2是一种有效可靠的离子植入装置和监测器。凭借其可调离子源、多种监控和分析选项,以及一系列安全特性,这款设备是半导体等技术应用的理想选择。
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