二手 EATON NOVA / AXCELIS NV GSD-HE #9163722 待售

EATON NOVA / AXCELIS NV GSD-HE
ID: 9163722
晶圆大小: 8"
优质的: 2000
High energy implanter, 8" Wafer type: Notch Vaccum system: Cryo compressor: CTI 9600, CTI 8500 Beamline cryo pump 1: OB8 (P2) Beamline cryo pump 2: OBIO (P3) AMU Turbo pump: TMP1000 (P8) Terminal rough pump: EBARA LINAC Rough pump: EBARA Endstation rough pump: EBARA Vacuum controller: HCIG IG3: Ion gauge Endstation info: (4) Cassettes Dummy wafer: Integrated "Dummy wafer" Fill-In capability Wafer handling system: In-Air / In-Vacuum high throughput Particle filter system: Class 1, UPLA Filtered Implant angle capability: Two axis variable implant angle (+/-11 deg in two axes) (Quad) Process disk spindle: GSD series process disk (installed ) Beam monitoring system: Real-time patented Dose Control Process Disk: Non silicon coated process disk Process disk cooling interlock: Yes Terminal info: Gas box option: Modular gas box / Four string gas box options Extraction PS: 90KV Extraction voltage monitor: Yes Ion source: ELS Type Extraction electrode: (3) Axis extraction electrode (Sen type) AMU system: Triple indexed mass analysis magnet and power supply Injector faraday: Injector flag faraday Dry transformer LINAC and FEM: (10) Power supplies: 3kW 13.56 MHz (10) High energy resonator cavitites and electrodes (5) Upgraded quadrupole lens assemblies and power supplies Resolving faraday: Yes Double indexed final energy magnet (FEM) and power supply: Yes Charge control technology (SEF - Secondary electron flood): No SVR: No Closed-Loop cooling system selection: Cooling system: Sen type Disk chiller: Sen type General Info: Main isolation transformer: Yes Smoke detector: Yes Exhaust flow switch: Yes Light tower: Yes Currently de-installed 2000 vintage.
EATON NOVA/AXCELIS NV GSD-HE是一种离子植入器和监控器以及一个完全集成的设备,设计用于将掺杂离子植入半导体基板。这个用途广泛的系统使用高科技监控系统,以确保精度和准确性,允许广泛的植入配置文件。它是为满足最先进的植入项目的最先进的技术要求而建造的,能够提供始终如一的高质量替代品。AXCELIS NV GSD HE以I=V和脉冲高压两种模式运行。利用低噪声前置放大器和EATON NOV-GSD HE的光束位置监测器确定了各种应用的最佳条件。这些监视器采用各种反馈控制设备,包括波束电流监视器、高压电源和离子质量分析仪。这样可以完全控制植入型材,在大多数晶圆前端操作中具有出色的光束稳定性和光束控制。该单元使用各种高级编程选项来精确控制植入。这些编程功能包括:可调光束方向、电流、电压、偏置和能量选择,以及精密的高纯度离子源。离子源是单独购买的。它还包括数字定时和可编程的模数转换,允许快速和容易地校准处理协议。EATON NOVA NV-GSD-HE机器的设计考虑到安全性,配有全面的电子健康监测工具和紧急关闭装置,使人员免受辐射或其他危险的伤害。该资产还配备了顶级充电和离子源稳定性,以及减束干扰技术。内置诊断程序使用户能够快速轻松地排除处理错误并发现问题。EATON NOVA/AXCELIS NV-GSD HE提供及时准确的数据,允许用户确定植入结果并在需要时进行调整。其先进的编程能力保证了高质量的植入效果,安全特性保证了人员安全。该模型结合了高性能和可靠性,是任何植入任务的理想选择。
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