二手 SEN / SUMITOMO EATON NOVA NV-GSD-HE3 #9283246 待售
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ID: 9283246
晶圆大小: 12"
High energy implanter, 12"
(4) FOUP
Energy range: 10 KeV to 3750 KeV with RTEM (Real Time Energy Monitoring Capability)
UPS: MUF3051-BL
Mass analysis magnet and power supply
Inject flag faraday
Power supply: 3 kW 13.56 MHz
High voltage beacon
Does not include Hard Disk Drive (HDD)
Liner accelerator:
(12) High energy resonator cavities
(14) Quadrupole
Quadrupole lens and power supply
Final energy magnet and power supply
Resolving faraday
Continuous variable aperature
End station wafer handling:
In-air / In-vacuum high throughput wafer handling system
Sub-class 1, ULPA filtered wafer handling area
Automatic notch alignment capability with buffer cassette
Integrated "dummy wafer fill-in capability
Slot to slot wafer integrity
End station disk:
Two axis variable implant angle
(13) Wafers process disk with direct, 12"
End station dose control:
Real time patented dose control
End station robot: SEN MACOROB 300
End station option:
Valved RGA Port on end station resolving
Valved RGA Port on disk module
Faraday burn through sense
Facilities utilities:
Feed from bottom
Feed gas box exhaust from top
Facilities cable:
Remote cryo pump compressor cable
Remote disk chiller cable
Facilities:
Main PD assembly
Signal tower light assy
(4) Light CE
Fire safety kit:
Smoke detector
VESDA
60 Hz Standard
Gas box exhaust needs to feed from top
High voltage warning display - English
Gas box:
Gas 1 type Gas box gas type position Ar with HP
Gas 2 type Gas box gas type position BF3 with SDS
Gas 3 type Gas box gas type position BF3 with SDS
Gas 4 type Gas box gas type position PH3 with SDS
Gas 5 type Gas box gas type position PH3 with SDS
MFC2 Unit 8160 10 ccm
MFC3 Unit 8162 5 ccm
MFC4 Unit 8162 10 ccm
MFC5 Unit 8162 10 ccm
Remote rack:
SEN chiller
Heater exchange from FAC
Service PC X-terminal
Door Bypass Switch:
Source head: ELS
3-AXIS Extraction electrode:
Vacuum Cryopump CP2 BROOKS OB-8
Vacuum Cryopump CP3 BROOKS OB-10
Vacuum Cryopump CP7 BROOKS OB-250F
Vacuum Cryopump CP8 BROOKS OB-250F
Vacuum STP-2203C TP1
Vacuum STP-A803C TP4
Vacuum STP-A1303C TP5
Vacuum STP-A803C TP10
Vacuum STP-A1303C TP11
Vacuum STP-A803C TP12
Manuals included.
SEN/SUMITOMO EATON NOVA NV-GSD-HE3是一种具有监控技术的高性能高能离子植入器。这种装置能够提供受控的、高效的重离子植入，如砷、的、和的，用于半导体制造。该植入器还提供超精密印迹和极快的高压开关，用于精密植入控制。SEN NV-GSD-HE3可以接受广泛的材料，包括金属和无机材料，以及其他化合物和底物。它允许高精度的离子加速度和光束控制，具有广泛的能量和剂量设置。该设备采用符合人体工程学的设计,以实现最高的效率和安全性。该装置配有先进的光束监测系统，使用高精度探测器检测光束漂移和污染。此功能有助于确保材料的最高质量植入。该装置具有高精度离子源、高精度光束光学器件、精确光束传输和高精度紫外线光学器件。由高品质材料打造而成，具有耐用性和高性能。该装置提供对离子释放量和位置的精确控制，以实现高度精确的离子注入。SUMITOMO EATON NOVA NV GSD-HE3最独特的特点之一就是它能够直接实时测量光束的剂量。这种技术和容量使用户能够调整其设置，就像他们正在改变其标线的电子束电流的输出一样。该设备还具有更高的吞吐量速率,从而提高了生产率。此外,此设备还提供闭环反馈调节,允许用户以高精度调整光束移动速度。该装置还可与各种类型的植入物，如线条、均匀、形状植入物的多种图桉生成器配合使用。该装置设计用于广泛的应用，包括半导体晶片的处理、无机材料的退火以及基板膜的制造。也可用于制造薄膜，控制重离子和电荷交换元件的植入。NV GSD-HE3在安全和易于使用的封装中提供高度先进的植入技术和性能。该设备非常适合各种植入和处理应用，并提供高精度、可靠和可重复的植入。这种可靠多用途的装置在重离子和其他材料的植入方面提供了一致的性能、安全性和效率。
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