二手 VARIAN VIISta 3000HP #9203292 待售

看起来这件物品已经卖了。检查下面的类似产品或与我们联系,我们经验丰富的团队将为您找到它。

ID: 9203292
晶圆大小: 12"
优质的: 2005
High energy implanter, 12" Energy range: 10 keV to 3750 keV Voltage divider Base system Power Distribution: 60 Hz Solid state: 0.75 MV D.C.Tandetron(TM) Accelerator provides: High output tandem NSI power supply ASME/TUV Certified accelerator pressure vessel VIISta single wafer processing end station with integral orientation control 0º- 360º at +/-1º accuracy Precise control of tilt angle combined with fast recipe controlled stepped tilt modes up to +/- 60º at An accuracy of +/- 0.1º Gas cooled electro-static platen Vertical scanning using linear servo motor driven Industrial air bearing Dual wafer capacity: 25 Polished load-locks with independent vacuum control Load lock: 300 mm Automatic pumping system includes: VARIAN Triscroll 300 dry pump for the air-bearing differential seals stage One Diaphragm roughing pump for the air bearing differential seals stage two Venturi pump for the air-bearing differential seals stage three (5) HELIX cryo pumps (3)400mm HELIX standard capacity cryo pumps on the process chambers (2) 250F HELIX high capacity cryo pumps located on beamline (2) PFEIFFER TMH-261 turbomolecular pumps for the end station load locks Turbomolecular pumping system consisting of: PFEIFFER TPH 2101 for the source (2) PFEIFFER TPH 2101 Pumps for the beamline locations Remote pump kit: To locate two cryo compressors DI water system Remote power distribution system includes Standard and included in base system: 15 meters Base system does not include roughing pumps VARIAN VIISta control system Microsoft windows NT(TM)/Windows 2000(TM) Multitasking operating system Next generation software control system monitoring over 3500 implant Equipment parameters for optimal system performance Automatic recipe set-up Optimization Control Production scheduling WIP Tracking System diagnostics Single wafer data logging HSMS SECS / GEM Compliant Multilevel password protected security system SPC Capability Small WIP buffer with 4 load ports Toxic gas box including: Standard inert gas module Exhaust connections from the top source (3) Standard process gas modules (3) manometers (2) exhausts (5) Gas modules plus Inerts (3) Plus Inerts are supplied as standard Long life indirectly heated cathode ion source Differentially pumped ion source chamber System S2-93 CE Compliance High voltage warning displays 3 Locations System signal tower Telemechanique (3) Lights: Green Amber Red Un-interruptible power supply (UPS) to support control system platen EMO Interlocked vesda smoke detection system Source exhaust flow interlock Integrated weight handling tools EMO Safety interlock Lead floor not required Required selects Standard power kit: UES Standard frequency kit: 60 Hz Facilities from top Signal tower: 3 Light standard RYG Standard gas box internal process / External purge Gas box exhaust from the top HP Ar / N2 DISS 718 HP BF3 DISS 642 SDS PH3 VCR 1/2" SDS AsH3 VCR 1/2" Standard on tool chiller Phase 2 IHC source without vaporizer HELIX standard cryo kit: 400 Standard polyflow cryo exhaust Customer supplied pumps to VSEA - Edwards iH-80 VSEA Supplied pfeiffer turbo pump kit Load lock vent standard finish Vent connection standard finish High voltage warning display Remote connection kit standard cryos: 15 Meters (3)Anometer gauges 0: 1kPa Monitors exhaust pressure of the main gas box Source shroud Rough pump Standard UPS V3000 Factory automation kit: Micron Includes indicator control kit E11134600 Hermos integration kit E11139470 Hokuyu E20000323 x 4 Vacuum connections from the bottom Thru-beam wafer mapping Installed Options: Wafer viewing and wafer Id SW - SEMI E58 ARAMS compliance HP BF3 DISS 642 Graphite kit metals reduction Service monitor PC Modification in 2009: V-Mask II upgrade kit Roplat: 300MM NCS Computer kit Modification in 2013: VIISta 3000 S/N ES154017 upgrade E11451460 2Ghz Control system UES NCS IAN Dose controller eprom kit for medium current implanters E11408090 for EHP dose contrllers E11436450 for XP/XPT Dose controllers reference PSB3312L EHP dose contrllrs PSB3651-XP/XPT dose contrllrs 2005 vintage.
VARIAN VIISta 3000HP是一种先进的离子植入器设备,用于半导体晶圆或玻璃等基板中离子的植入和分析。该系统由几个组件组成,使其能够高精度运行。VARIAN VIISTA 3000 HP束线从离子源开始,在离子源产生、操纵和聚焦离子束。离子源既可以是金属蒸发器,也可以是金属氧化物源,例如钛、锌,也可以是移场离子枪。在形成初始光束后,光束线随后穿过光束光学元件,包括质量分析仪和最终孔径,以控制光束并调节能量。VIISta 3000HP包括各种分析和植入室。分析室允许同位素分离,而真空相容的植入室允许将离子植入底物和监测剂量均匀性。在该单元中发现的其他特征包括一个健壮的电容或电感耦合等离子体(CPI)源,它确保稳定和快速的植入,同时还允许低能量和单离子植入能力。VIISTA 3000 HP还配备了全方位的外围设备,包括1kV安装、四通道波束电流变压器、节气门和离子电流监视器。它还包括一个全自动的机器人样机。所有这些组件协同工作,以确保可重复和准确的植入性能。VARIAN VIISta 3000HP位于植入技术的最前沿,允许精确的掺杂物控制与用户友好和灵活的机器能力。这台先进的机器提供低能量的高性能植入,在保持高植入率的同时最大限度地减少离子轰击造成的伤害。它还具有高级控制工具,为自动化流程提供用户可编程配方和参数设置。通过利用最新技术,VARIAN VIISTA 3000 HP提供了最可靠和一致的植入系统之一。
还没有评论