二手 VARIAN Viista 810 #9191583 待售

Medium current ion implanter, 12" Parts machine Standard power kit High voltage warning display (X3) Tungsten bernas gas ion source Bernas source dual vaporizer Standard gas box External inert purge Polished load lock chamber Dosing performance: Range: 1E11-1E16 ions/cm2 Uniformity: ≤ 0.5% (for implant energies > 5 keV) Repeatability: ≤ 0.5% (wfr-to-wfr, cassette-to-cassette) Implant angles: Tilter: ± 60°in X and Y Orientation: 0 - 360° Rotation: Equivalent multi-tilt, quad mode Angle control accuracy and repeatability: Beam parallelism: ± 0.1° X & Y-tilter: ± 0.1° Orientation: ± 1.0° Wafer cooling: 200 mm: ≤100°C @ 800W Beam power 300 mm: ≤100°C @ 900W Beam power Particles: <0.05/cm2 (mean value) for particle size > 0.16µm Metals contamination: Heavy metals: ≤ 5 ppm (TXRF) Aluminum: ≤ 5 ppm (SIMS) Implant condition: 80keV, 1e16/cm2 Ion mass resolution: Energy > 5 kV, M/ΔM = 30 Energy > 20kV, M/ΔM = 50 Energy > 80kV, M/ΔM = 85 Mechanical throughput: 200 mm: > 270 WPH 300 mm: > 250 WPH (with buffer and 25 wafer cassette, Steady-state) 2008 vintage.