二手 CANON MPA 600 FA #9060105 待售

看起来这件物品已经卖了。检查下面的类似产品或与我们联系,我们经验丰富的团队将为您找到它。

製造商
CANON
模型
MPA 600 FA
ID: 9060105
Projection aligner, 6" Slit: 1.6mm Includes: Illumination power check meter, 7” Focus tilt mask, 7” DR Mask Projection system: Projection mirror: Total reflection UM02 Magnification: 1x Image size: Stationary: Arcuate image 150 mm (L) x 1.6 to 2.0 mm (W), with radius of 95 mm Scanning: Φ6 (150 mm) Over entire surface, excluding that under (3) disk claws Magnification: 1x Effective F number: Fe 3.5 Wavelengths used: Printing (UV): 365 nm (i-line), 405 nm (h-line) & 436 nm (g-line) Manual alignment: E-line (546 nm) & orange light Auto alignment: 633 nm (He-Ne Gas laser) Illuminator: Light source: USHIO ELECTRIC USHY-2002MA 2 kW Super-high-pressure mercury lamp Illumination range: Length: 150 mm Width: 1.6 to 2.0 mm Radius: 95 mm Illumination uniformity: Within ±3% Effective light source: σ = 0.7, σ = 0.6, σ = 0.5 Exposure: Scanning speed: Φ5" (Φ125 mm) Setting range: 5.0 - 150.0 sec (for 5" wafer) Setting units: Uniform 0.1 sec increments Scanning mechanism: Feed / Control methods Closed loop method with DC servo motor drive Scanning speed: 5.0 to 150.0 sec (25 mm/sec-0.83 mm/sec) for 5" wafer Carriage position setting: Setting range: -75 mm to 75 mm Increment: 0.01 mm Setting accuracy: ±10 /µm Alignment scope: Objective lens: 10x, NA 0.2 Eyepiece: 10x, 15x Erector lens: 1x, 2x, 3x Low-magnification lens: 0.3x Distance between objective lenses: 30 to 109.6 mm (Traveling simultaneously on both sides of center position) Setting range of objective lens distance: 30.00 to 109.6 mm in 0.02 mm increments Focusing travel (both fields of view): ±2 mm Auto alignment: Laser beam scanning Light source: He-Ne Gas laser (633 nm), polarized type 5 mW Dedicated patterns are used for auto alignment Offset control: Read/write possible in range of 0 to 7.9 /µm Tolerance setting: 0.25 (0.15) /µm, 0.5µm, 1 µm Auto alignment time: Within 7 sec Observation in auto alignment mode possible Auto feeder: Auto/manual switching: Automatic / Manual wafer feed selectable Feed method: Belt & auto hand Wafer size: 4"-6" Applicable carrier: FLUOROWARE Type carrier: Standard Capacity: 25 wafers Pitch: 3/16" Projection system focusing: Focus adjustment: ±1.5 mm Travel amount obtained by one rotation of knob: 10 µm Power supply: MPA-600FA: 200 VAC, 3Φ, 6 kVA, 50/60 Hz Air supply unit: 200 VAC, 3Φ, 8 kVA, 50/60 Hz.
CANON MPA 600 FA是CANON开发的用于晶圆级封装的高精度掩模对准器。它是一种功能齐全的仪器,具有多种特性和功能,非常适合用于各种设备制造应用程序。佳能MPA600FA利用高分辨率投影对准设备,利用红外光精确投射和对准面罩图桉到晶圆表面。该系统可进行精细的位置调整,并有助于将掩模图桉精确且可重复地对准晶片表面。MPA-600FA还配备了一个大功率激光退火装置,允许用户为各种目的对晶片的选定区域进行热处理。这台机器能够在整个晶片上产生均匀的热量,确保均匀的表面形成,并防止由于温度相关的问题而导致设备故障。MPA 600 FA配备了定制设计的金属面罩支架,使用户能够在对准时将金属面罩精确定位并连接到晶片上。它还具有自动光学步进器,大大提高了对准过程的速度和精度。CANON MPA 600FA还包括一个自动化控制工具,使仪器易于操作和管理。该资产包括一个用户友好的图形界面,允许用户在没有任何事先培训的情况下执行各种操作,如选择参数或控制掩码。CANON MPA-600 FA还提供了多种安全功能来保护用户和设备,包括在操作异常时自动关闭模型和内置除尘器,以防止灰尘和碎屑进入仪器。CANON MPA-600FA是需要高精度遮罩对准仪表的半导体器件制造商的绝佳选择。凭借其强大的功能、精确的对准设备和先进的安全功能,MPA-600 FA是在晶圆级封装应用中实现最佳效果的理想工具。
还没有评论