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ID: 9189343
Bond aligner, 8"
Wafer to wafer aligner: Subsequent wafer bonding applications
General:
Software adjustable
Wafer separation distance: 0 - 300 μm
Wafer thickness: 0.1 - 4.4 mm
Total stack thickness: 4.5 mm
Semi automatic loading with mechanical prealignment
Quick change of chuck
Automatic pressure
Vacuum transfer
Alignment accuracy: ± 1μm
High process objectives
NRTL Listing mark: UL STD 61010A-1
Storage rack: (5) Aligner tools
Software:
MS-Windows
PC Controlled operating environment
Self explaining commands
Remote diagnostics1
Software for bond alignment:
Recipe parameters
User guidance
Optical alignment: (2) Wafers
Silicon direct bonding (SDB)
Substrate configurations: Si+Glass, Si+Si
Subsequent anodic
Thermo-compression
Fusion bonding processes: EVG 500 series bond system
Nanoalign technology package:
High performance frame grabber running
COGNEX PatMax vision software technology
Increases EVG aligner microscope resolution: Factor ~2
Image quality: 100 % Digital signal processing
Key identification feature: Multi layer alignment key design
Scaled (Over / Under etched) alignment keys
Enhanced digital zoom capabilities
Crosshair mode: Standard backside alignment processes
Alignment stage motorized:
Alignment stage: X, Y, theta, Z
Joystick alignment: Via (3) axes
DC Motor controllers: Cursor key fine alignment
Automatic wedge compensation system: Optimized print gap control
WEC Contact force: 0.5 - 40 N adjustable
Shift between mask and wafer: No
Automatic alignment for top / bottom side:
Vision system (Integrated in PC)
Storage:
Trained mask
Substrate patterns on hard disk
Software integrated in EVG 6200 computer controller
Alignment marks: Top / Bottom side alignment
Alignment results:
Process conditions
Material properties
Bottom side microscope:
Motorized splitfield microscopes
Visible light with high resolution CCD cameras
Digitized alignment keys (Mask) / Cross hair
Travel range:
X: 78 mm - 180 mm
Y: ± 12 mm
(2) Objectives: 5x (3.6x - 20x)
Objective: 3.6x:
Field of view per objective: ~ 1.5 mm x 1 mm
Rack unit:
Integrates EVG 6200 system
Operating elements
Monitor vibration isolated
Prepared for robotic auto load system
Bond tool universal, 8":
Anodic
Thermo compression
Silicon direct bonding process
Bond chuck with mechanical clamping
Loading chuck
Separation flags
Currently warehoused
2008 vintage.
EVG/EV GROUP 6200 Infinity是一款掩模对齐器,旨在帮助以更高效的方式制造和分析复杂的微型光学设备。EVG 6200 Infinity将专利蒙版和晶片级与软件集成在一起,以创建高度可重复和精确的对齐过程。它由具有集成成像和自动化配方的全自动对齐系统组成,以帮助简化整个流程。EV GROUP 6200 Infinity具有先进的功能,例如优化了两个基板的定位,并具有顶部和底部成像功能,全面自动设置和执行各种过程,并能够创建各种成像系统。6200 Infinity提供精确的对齐方式,特别是在光学过程中。它在两个基板上对齐参考点,确保精确的配准和可重复性,即使结构较小或有多个方向。它还配备了一个获得专利的0.3微米分辨率对准设备和一个最先进的光学系统,该系统能够准确地检测亚微米特征,并显示单个或两个基板应用中的特征的精确对准。此外,EVG/EV GROUP 6200 Infinity提高了运行速度,使用户能够在最短的时间内生成过程中的优化数据。EVG 6200 Infinity在机组中央进一步配备晶圆夹头,即使在较高的温度条件下也能提供长期的稳定性。它还具有扩展的运动功能,允许定制所有运动轴,包括XYZ/V/Z、XYZ/ICH/DCN、XYZ/E/PN和XYZ/V/CN。此外,该机器还提供各种吞吐量优化程序,以适应高容量的产量,以及各种辅助技术,以进一步降低总体成本,同时提高准确性和可重复性。EV GROUP 6200 Infinity确实是一款现代化的蒙版对齐器,为用户提供精确、可重复的对齐能力,同时提高操作速度和准确性。这使得它成为创建复杂的微型光学设备的理想解决方桉,这些设备需要高精度和重复性。
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