二手 KARL SUSS / MICROTEC MA 4/6 #9258606 待售

Mask aligner, 6" Substrates, 6" x 6" M206 / M236 Split field microscopes Objectives: 5x, 10x, 20x Eyepiece Magnification: 10x Micrometer spindles UV Ranges with optimized diffraction reducing systems Splitfield topside microscope with turret C-Mount for IR camera adaption Alignment stage with loaded IR chuck IR Illuminators and tube stage for target positioning IR Tubes Spare parts Tool kit X-Drive IR Tool: Chuck Maskholder Spacers for maskstage clamp Stage: X, Y Theta Z Alignment Wedge error compensation Microscope manipulator with adapter Movement synchronized with alignment Lamp house LH 1000: 350 W / 1000 W lamp With optical tube and mirror house / Eclipse mirror CRT Display Serial dialog operator interface Substrate size: 1" x 1" - 4" x 4", Pieces Mask size: 7" x 7" Exposure system: Vacuum contact and proximity Gas separation: 0-90 um Gas adjustment resolution: 1 µm Contact pressure: 0.02 - 1.0 N/cm² Exposure optics: Wavelength / Range / Source UV400 / 350 mm - 450 mm / 1000 W Hg UV300 / 208 mm - 350 nm / 1000 W Hg Alignment: Top Side Alignment (TSA) Accuracy: TSA down to 0.5 µm Back side alignment Accuracy: BSA down to 1.5 µm Alignment stage: Alignment range X: ±5 mm Alignment range Y: ±5 mm Alignment range θ: ±3° Mechanical resolution XYθ: 0.05 μm UV400 With high peak intensity at 365nm and 405 nm Exposure area: 6" CIC500 for 350W HBO Maximum intensity at 365nm: 19 ±4% mW/cm² Maximum intensity at 405nm: 30 ±4% mW/cm² Power supply: 110 V / 220V, 50/60 Hz, 1500 W 1993 vintage.