二手 ALLWIN21 AW 1008 #9201817 待售

ALLWIN21 AW 1008
ID: 9201817
晶圆大小: 3"- 6"
Plasma etcher, 3"- 6" Wafer loading: 3-Axis robot Plasma power: Microwave Types: Parallel Single wafer process Gas Lines: 1-4 Production-proven plasma stripper / Asher system Frontside and backside isotropic removal Microwave 1000W: 2.45GHz Pressure control with throttle valve Main frame with breakers, relays and wires Keyboard, mouse, cables EMO, interlocks, and watchdog function Quartz tray: 3-4 inch, 4-6 inch, 5 inch, 6 inch, others Fixed cassette stations: One station Two stations Lamp heat module and quartz window 6" Quartz showerhead and 5" diffusion disk Main control Distributor PCB and DC Integrated solid robot: H1-7 x 10.5 Waveguide and quartz plasma tube Chamber top plate and body: Close loop temperature control (CLTC) Blowers: Magnetron Waveguide MFCs: 1 MFC, 2 MFCs, 3 MFCs, 4 MFCs CLTC: AC Box Lamp control PCB Main vacuum valves: Fast pump: Two, one Slow pump: One MKS Baratron Throttle valve Front EMO, interlocks Touch screen GUI, 15" Options: EOP Module with PCB Lamp tower alarm function Vacuum pump Downstream ashing: NO Bulk resist removal Single wafer process High-dose implanted resist Non-oxidizing metal processing Descum Pressure: 1.75 to 2.5 Torr Gas flow: O2: 4.5 SLPM N2: 0.5 SLPM Variable lamp time: 0-9999 seconds (AW) Variable temperature: 150°C – 350°C Vacuum chamber pump: 165 cfm Cabinet exhaust: >250 cfm Plumbed gases: O2 N2 Asher rate: 1.5u-5u/min Positive photoresist: >8u/min Negative Photoresist Uniformity: 15% Process dependent Particulate: <0.05 /cm2 Selectivity: >1000:1 MTBF / MTTN / MTTR: 450 Hours / 100 Hours / 3.5 Hours or better 95% Electrical requirements: 208VAC 3 Phase 60Hz 30Amps.
ALLWIN21 AW 1008是一种快速热处理器,设计用于对尺寸不超过8英寸的基板进行快速、精确和可靠的热电处理。该设备适合于将晶体硅转化为各种产品,如电源设备、集成电路(IC)和薄膜晶体管(TFT)。也可用于去除掺杂剂、生长极薄的栅极氧化物、钝化层间电介质、平面化、清洁底物等后续应用。AW 1008快速散热处理器的低散热预算为0.5毫瓦-秒,可提高工艺保真度。它还具有快速温度规划(RTP)功能,提供精确的温度控制和快速的热响应.RTP使处理器能够以高速度、准确性和可重复性将温度调整到每周设定值。该系统采用加热响应室和加热卡盘,以实现均匀的温度分布和有效的传热至基板。该装置还设有专用热电偶,使用先进的隔离热电偶实时监测和控制基板温度。机器的温度范围可以从-270°C调节到1100 °C,温度精度在+/-1°C以内。ALLWIN21 AW 1008快速热处理器还包括自动气流控制和等离子体蚀刻等其他便利功能。此外,一个可选的一键式记忆体可让您储存多达10个预设的处理记忆体,以方便检索。处理器还配备了触摸屏控制控制台,允许用户监控和调整流程参数。该处理器非常适合广泛的热处理应用,如氧化物退火、栅极氧化物蚀刻、栅极氧化、等离子体辅助热处理、掺杂、钝化、有源区域清洁和层间介电沉积。它与标准的200 mm晶片和硅、硅、氮化的基板相容。总体而言,AW 1008是一款可靠高效的快速散热处理器,旨在为各种应用程序提供出色的温度控制、快速的响应时间和更高的工艺精度。
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