二手 ALLWIN21 AW 2001R #9201803 待售
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ID: 9201803
晶圆大小: 2"-6"
Plasma etcher, 2"-6"
Wafer loading: 3-Axis robot
Plasma power: Microwave
Type: Parallel / Single wafer process
Stand alone
Gas lines: (4) Lines
Applications:
BPSG Etcher
LTO Etcher
TEOS Etcher
Thermal oxide etcher
LPCVD Nitride etcher
PECVD Nitride etcher
Trench rounding
Descum
RIE Damage removal
Sodium removal
Planarization
Backside etcher: Poly, nitride, oxide
Nitride pattern removal:
PBL, LOCOS With pad oxide: >400Å
Low temp photoresist ashing over: Oxides, Poly, Al, W, Ti
Main frame with breakers, relays and wires
Pentium class PC
Keyboard
Mouse
USS
SW Backup and cables
Fixed cassette stations:
(2) Cassette stations
One cassette station / One centering / Alignment station
Door assembly
Metal shower head
Extended alumina plasma tube for better uniformity
Orifice, gas cap
Chamber body and top plate
Main control, distributor PCB and DC
H1-7 x 10.5 Integrated (3) Axis solid robot
Water cooled MAGNETRON and wave guide
Water cooled 1000W MAGNETRON / Wave guide with an AGL
Microwave power generator: 2.45GHz
(4) Isolated gas lines
With pneumatic valves and MFC
AC Box
Main & slow vacuum valves
MKS Baratron
Throttle valve
Front EMO
Interlocks
Touch screen GUI, 15"
Options:
GEM / SECS II Function
Light tower
Vacuum pump
Chuck temperature: 60-110ºC (±2 ºC)
Gases: NF3, CF4, HE, O2
Uniformity:
100 mm: ± 3% (5% 3 σ)
150 mm: ± 5% (8% 3 σ)
Maximum - minimum / 2 x average
Reproducibility (w-t-w): 10% 3 σ
Particulate: 0.05p / cm2 > 0.3µm
Vacuum chamber pump: 165 cfm
Cabinet exhaust: >250 cfm
Plumbed gases:
CF4
O2
He
NF3
Electrical requirements: 208 VAC, 3 Phase, 6 Hz, 30 Amps.
ALLWIN21 AW 2001R是一种快速热处理器,它使用其独特的专利设计,为各种应用执行快速热处理。该处理器非常适合晶圆级封装以及MEMS和复合半导体器件制造。AW 2001R具有独特的双面平行线性热区,用户可以在其中监视和控制每个区的温度设置。此功能可确保晶片表面均匀加热。专利控制和监控设备对每个热区的温度和速率进行独立的连续控制和监控,自动控制最靠近晶圆的热浴,以补偿晶圆的任何不均匀加热。ALLWIN21 AW 2001R采用了强大的5千瓦五区脉冲激光加热系统,以确保精确的热控制。先进的电源控制装置旨在快速响应工艺配方或热条件的变化。该2000R配有3 kW金属卤化物灯,用于退火和扩散应用。AW 2001R还提供了一种可编程的气体流动机,可以精确控制热区以外的环境。这两个单独的可控气体输入端口可用于氧气和氮气等气体溷合物,也可用于冷却操作期间的氮气/氙气净化。这为使用相同的设备执行不同的过程提供了灵活性。ALLWIN21 AW 2001R结构坚固,并配有安全工具以进行适当操作。该资产有助于确保设备的安全可靠运行。利用这些功能,AW 2001R为用户提供了一个可靠且易于操作的热处理模型,用于半导体行业的各种应用。
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