二手 ALLWIN21 AW 2001R #9201803 待售

ALLWIN21 AW 2001R
ID: 9201803
晶圆大小: 2"-6"
Plasma etcher, 2"-6" Wafer loading: 3-Axis robot Plasma power: Microwave Type: Parallel / Single wafer process Stand alone Gas lines: (4) Lines Applications: BPSG Etcher LTO Etcher TEOS Etcher Thermal oxide etcher LPCVD Nitride etcher PECVD Nitride etcher Trench rounding Descum RIE Damage removal Sodium removal Planarization Backside etcher: Poly, nitride, oxide Nitride pattern removal: PBL, LOCOS With pad oxide: >400Å Low temp photoresist ashing over: Oxides, Poly, Al, W, Ti Main frame with breakers, relays and wires Pentium class PC Keyboard Mouse USS SW Backup and cables Fixed cassette stations: (2) Cassette stations One cassette station / One centering / Alignment station Door assembly Metal shower head Extended alumina plasma tube for better uniformity Orifice, gas cap Chamber body and top plate Main control, distributor PCB and DC H1-7 x 10.5 Integrated (3) Axis solid robot Water cooled MAGNETRON and wave guide Water cooled 1000W MAGNETRON / Wave guide with an AGL Microwave power generator: 2.45GHz (4) Isolated gas lines With pneumatic valves and MFC AC Box Main & slow vacuum valves MKS Baratron Throttle valve Front EMO Interlocks Touch screen GUI, 15" Options: GEM / SECS II Function Light tower Vacuum pump Chuck temperature: 60-110ºC (±2 ºC) Gases: NF3, CF4, HE, O2 Uniformity: 100 mm: ± 3% (5% 3 σ) 150 mm: ± 5% (8% 3 σ) Maximum - minimum / 2 x average Reproducibility (w-t-w): 10% 3 σ Particulate: 0.05p / cm2 > 0.3µm Vacuum chamber pump: 165 cfm Cabinet exhaust: >250 cfm Plumbed gases: CF4 O2 He NF3 Electrical requirements: 208 VAC, 3 Phase, 6 Hz, 30 Amps.
ALLWIN21 AW 2001R是一种快速热处理器,它使用其独特的专利设计,为各种应用执行快速热处理。该处理器非常适合晶圆级封装以及MEMS和复合半导体器件制造。AW 2001R具有独特的双面平行线性热区,用户可以在其中监视和控制每个区的温度设置。此功能可确保晶片表面均匀加热。专利控制和监控设备对每个热区的温度和速率进行独立的连续控制和监控,自动控制最靠近晶圆的热浴,以补偿晶圆的任何不均匀加热。ALLWIN21 AW 2001R采用了强大的5千瓦五区脉冲激光加热系统,以确保精确的热控制。先进的电源控制装置旨在快速响应工艺配方或热条件的变化。该2000R配有3 kW金属卤化物灯,用于退火和扩散应用。AW 2001R还提供了一种可编程的气体流动机,可以精确控制热区以外的环境。这两个单独的可控气体输入端口可用于氧气和氮气等气体溷合物,也可用于冷却操作期间的氮气/氙气净化。这为使用相同的设备执行不同的过程提供了灵活性。ALLWIN21 AW 2001R结构坚固,并配有安全工具以进行适当操作。该资产有助于确保设备的安全可靠运行。利用这些功能,AW 2001R为用户提供了一个可靠且易于操作的热处理模型,用于半导体行业的各种应用。
还没有评论