二手 ALLWIN21 AW 901e #9201807 待售
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ID: 9201807
晶圆大小: 3"-6"
Plasma etcher, 3"-6"
Wafer loading: 3-Axis robot
Stationary cassette plate
Plasma power: RF 13.56 MHz
Type: Parallel / Single wafer process
Stand alone
Gas lines: 1-3 Lines
Throughput: 30-60 WPH, Process dependent
Temperature: 6-65ºC (±2 ºC) Capability
Gas lines: (4) Gas lines with MFCs
Etcher rate:
AW-901eR: 0-8000A / minute
AW-903eR: 0-4000A / minute
Process dependent
Uniformity: Up to ±3%, Process dependent
Particulate: <0.05 / cm2
Selectivity:
901eR: 2-20:1
AW-903eR: 2-20:1
Process dependent
MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours
Options:
EOP Module with PCB
GEM/SECS II Function
Lamp tower alarm with buzzer
Throttle valve pressure control
Vacuum pump
Chiller for chuck and chamber
Through the wall
Main frame, standard
Pentium class PC with
Keyboard
Mouse
USB
SW Backup
Cables
Chuck:3"-6"
Wafer aligner / Cooling station
3-Axis integrated solid robot:
H-Zero (Standard)
H1-7 x 10.5 (TTW)
Fixed cassette station:
Chuck assembly
901eR Non-anodized
903eR Anodized with flat
903eR Anodized with flat
903eR Non-anodized with flat
Reactor Assembly:
901eR Non-anodized
903eR Anodized
903eR Non-anodized
903eR High performance
Direct cooling
Non direct cooling
Pins:
Quartz
Ceramic SST
Centering ring:
Aluminum
Ceramic
Main control board:
Gas box with (4) inline gas lines, MFC, filters, and pneumatic valves
RF Matching network with PCB
RF Generator: 13.56 MHz
MKS Elite: 300 HD
MKS Elite: 600 HD
MKS Elite: 1000 HD
ENI ACG 3
ENI ACG 10
AC / DC Box
ATM Sensor
UPC Pressure control
225 SCCM: 901eR
2000 SCCM: 903eR
MKS Baratron with peumatic Iiolation valve
Main vacuum valves
Front EMO interlocks
Touch screen GU, 15"
AW-901eR AW-903eR
Material etched Polysilicon / Nitride Oxide,SOG,Nitride
Main etchant gases SG6, O2 / SF6,O2 CHF3,SF6,He
Other gases CHCLF2 / None None
Pressure (mTorr) 200-450 / 250-350 1600-3000
RF Power (Watts) 100-250 / 200-300 400-600
Temperature (C) 30 / 30 23
AC Power:
AC Module: 200-240 VAC Selectable, 50/60 Hz, 3-wire single-phase
Temperature controller: 200-240 VAC, 50/60 Hz, 3-wire single-phase
Vacuum pump: 208-230 / 460 VAC, 60 Hz or 200-220 / 380 VAC, 50Hz, 3 Phase
RF Generator: 200-240 VAC
PC / Monitor: 115 VAC
Cabinet exhaust: 100 cfm.
ALLWIN21 AW 901e是一种用于各种半导体和电子器件制造过程的快速热处理器（RTP）。它是一种多区设备，结合了高速样品装卸、独立加热/冷却、精确的温度控制和可选的降氢能力。其设计使系统比传统RTP系统运行更快、效率更高，节省了时间和资源。AW 901e采用动态优化控制单元（DOCS）,可根据负载的物理特性精确调整各个加热和冷却速率。这样可以确保过程的均匀性和可重复性,而不管处理的材料如何。它还配备了车载数据采集机和各种报警功能，可以对过程的各个方面进行详细的监测和记录。ALLWIN21 AW 901 e采用三阶段工艺，确保了准确和可重复的加热和冷却。第一阶段是温度坡道，迅速达到目标温度。第二阶段是浸泡循环，使样品达到热平衡。接下来是快速冷却过程，快速降低温度，防止样品损坏。AW 901 e设计为用户友好,具有自动配方和序列控制设置,可以快速轻松地设置整个过程。它还具有各种安全功能,例如风扇覆盖和超温检测。这样可以安全操作,并确保过程的准确性。ALLWIN21 AW 901e可用于各种氧化物去除、快速退火、快速冷却、固化、高温烘烤和焊接应用。它灵活的设计允许定制过程,紧凑的尺寸允许在不同的位置进行安装。对于许多要求苛刻的应用程序,它是一个可靠、经济高效的解决方桉。
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