二手 ALLWIN21 AW 903e #9201808 待售
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ID: 9201808
晶圆大小: 3"-6"
Plasma etcher, 3"-6"
Wafer loading: 3-Axis robot
Stationary cassette plate
Plasma power: RF 13.56 MHz
Type: Parallel / Single wafer process
Stand alone
Gas lines: 1-3 Lines
Throughput: 30-60 WPH, Process dependent
Temperature: 6-65ºC (±2 ºC) Capability
Gas Lines: (4) Gas lines with MFCs
Etcher rate:
AW-901eR: 0-8000A / minute
AW-903eR: 0-4000A / minute
Process dependent
Uniformity: Up to ±3%, Process dependent
Particulate: <0.05 / cm2
Selectivity:
901eR: 2-20:1
AW-903eR: 2-20:1
Process dependent
MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours
Options:
EOP Module with PCB
GEM/SECS II Function
Lamp tower alarm with buzzer
Throttle valve pressure control
Vacuum pump
Chiller for chuck and chamber
Through the wall
Main frame, standard
Pentium class PC with
Keyboard
Mouse
USB
SW Backup
Cables
Chuck:3"-6"
Wafer aligner / Cooling station
3-Axis integrated solid robot:
H-Zero (Standard)
H1-7 x 10.5 (TTW)
Fixed cassette station:
Chuck assembly
901eR Non-anodized
903eR Anodized with flat
903eR Anodized with flat
903eR Non-anodized with flat
Reactor Assembly:
901eR Non-anodized
903eR Anodized
903eR Non-anodized
903eR High performance
Direct cooling
Non direct cooling
Pins:
Quartz
Ceramic SST
Centering ring:
Aluminum
Ceramic
Main control board:
Gas box with (4) inline gas lines, MFC, filters, and pneumatic valves
RF Matching network with PCB
RF Generator: 13.56 MHz
MKS Elite: 300 HD
MKS Elite: 600 HD
MKS Elite: 1000 HD
ENI ACG 3
ENI ACG 10
AC / DC Box
ATM Sensor
UPC Pressure control
225 SCCM: 901eR
2000 SCCM: 903eR
MKS Baratron with peumatic Iiolation valve
Main vacuum valves
Front EMO interlocks
Touch screen GU, 15"
AW-901eR AW-903eR
Material Etched Polysilicon / Nitride Oxide,SOG,Nitride
Main etchant gases SG6, O2 / SF6,O2 CHF3,SF6,He
Other gases CHCLF2 / None None
Pressure (mTorr) 200-450 / 250-350 1600-3000
RF Power (Watts) 100-250 / 200-300 400-600
Temperature (C) 30 / 30 23
AC Power:
AC Module: 200-240 VAC Selectable, 50/60 Hz, 3-wire single-phase
Temperature controller: 200-240 VAC, 50/60 Hz, 3-wire single-phase
Vacuum pump: 208-230 / 460 VAC, 60 Hz or 200-220 / 380 VAC, 50Hz, 3 Phase
RF Generator: 200-240 VAC
PC / Monitor: 115 VAC
Cabinet exhaust: 100 cfm.
ALLWIN21 AW 903e快速热处理器(RTP)是一种高度先进的半导体器件测试和封装设备。与其他热处理系统相比,它具有极高的速度和卓越的效率。AW 903e是一个多级热处理系统,包括一个具有先进温度控制单元的炉,一个LED模具温度管理(DTM)模块,以及一个用于精确辨别表面氧化物的压力传感器。RTP炉设计为在加工室内产生均匀的温度,以确保准确的结果。它可以被编程为快速达到高温,并且可以减少高达90%的循环时间。先进的温度控制机允许通过触摸面板功能设置炉子的确切温度。此高级温度控制可确保性能一致。LED模具温度管理模块可确保晶片内的每个模具都加热到所需温度。这确保了所取得成果的统一性。它还通过减少晶片之间的等待时间来提高吞吐量。压力传感器用于检测表面氧化物,这会影响结果的准确性。通过检测这些表面氧化物,ALLWIN21 AW 903e可以消除它们的形成。这样可以确保结果的准确性不受影响。AW 903e在设计时也考虑到了灵活性。它可以加入晶圆加热工具(Wafer Heating Tool)和晶圆映射资产(Wafer Mapping Asset)等附加模块,以获得额外的精度。它是完全自动化的,设计时考虑到了安全和维护,使其成为一个非常高效的设备。ALLWIN21 AW 903 e是一种高度先进的RTP,其设计目的是在处理晶片时提供最高精度和吞吐量。其均匀的温度和先进的DTM确保了均匀的性能,并且能够集成其他模块以提高精度和效率,因此非常适合许多应用程序。它高效、安全、维护和操作,并且易于与现有系统集成。
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