二手 ALLWIN21 AW 903e #9201808 待售

ALLWIN21 AW 903e
ID: 9201808
晶圆大小: 3"-6"
Plasma etcher, 3"-6" Wafer loading: 3-Axis robot Stationary cassette plate Plasma power: RF 13.56 MHz Type: Parallel / Single wafer process Stand alone Gas lines: 1-3 Lines Throughput: 30-60 WPH, Process dependent Temperature: 6-65ºC (±2 ºC) Capability Gas Lines: (4) Gas lines with MFCs Etcher rate: AW-901eR: 0-8000A / minute AW-903eR: 0-4000A / minute Process dependent Uniformity: Up to ±3%, Process dependent Particulate: <0.05 / cm2 Selectivity: 901eR: 2-20:1 AW-903eR: 2-20:1 Process dependent MTBF / MTTA / MTTR: 450 Hours / 100 Hours / 3.5 Hours Options: EOP Module with PCB GEM/SECS II Function Lamp tower alarm with buzzer Throttle valve pressure control Vacuum pump Chiller for chuck and chamber Through the wall Main frame, standard Pentium class PC with Keyboard Mouse USB SW Backup Cables Chuck:3"-6" Wafer aligner / Cooling station 3-Axis integrated solid robot: H-Zero (Standard) H1-7 x 10.5 (TTW) Fixed cassette station: Chuck assembly 901eR Non-anodized 903eR Anodized with flat 903eR Anodized with flat 903eR Non-anodized with flat Reactor Assembly: 901eR Non-anodized 903eR Anodized 903eR Non-anodized 903eR High performance Direct cooling Non direct cooling Pins: Quartz Ceramic SST Centering ring: Aluminum Ceramic Main control board: Gas box with (4) inline gas lines, MFC, filters, and pneumatic valves RF Matching network with PCB RF Generator: 13.56 MHz MKS Elite: 300 HD MKS Elite: 600 HD MKS Elite: 1000 HD ENI ACG 3 ENI ACG 10 AC / DC Box ATM Sensor UPC Pressure control 225 SCCM: 901eR 2000 SCCM: 903eR MKS Baratron with peumatic Iiolation valve Main vacuum valves Front EMO interlocks Touch screen GU, 15" AW-901eR AW-903eR Material Etched Polysilicon / Nitride Oxide,SOG,Nitride Main etchant gases SG6, O2 / SF6,O2 CHF3,SF6,He Other gases CHCLF2 / None None Pressure (mTorr) 200-450 / 250-350 1600-3000 RF Power (Watts) 100-250 / 200-300 400-600 Temperature (C) 30 / 30 23 AC Power: AC Module: 200-240 VAC Selectable, 50/60 Hz, 3-wire single-phase Temperature controller: 200-240 VAC, 50/60 Hz, 3-wire single-phase Vacuum pump: 208-230 / 460 VAC, 60 Hz or 200-220 / 380 VAC, 50Hz, 3 Phase RF Generator: 200-240 VAC PC / Monitor: 115 VAC Cabinet exhaust: 100 cfm.
ALLWIN21 AW 903e快速热处理器(RTP)是一种高度先进的半导体器件测试和封装设备。与其他热处理系统相比,它具有极高的速度和卓越的效率。AW 903e是一个多级热处理系统,包括一个具有先进温度控制单元的炉,一个LED模具温度管理(DTM)模块,以及一个用于精确辨别表面氧化物的压力传感器。RTP炉设计为在加工室内产生均匀的温度,以确保准确的结果。它可以被编程为快速达到高温,并且可以减少高达90%的循环时间。先进的温度控制机允许通过触摸面板功能设置炉子的确切温度。此高级温度控制可确保性能一致。LED模具温度管理模块可确保晶片内的每个模具都加热到所需温度。这确保了所取得成果的统一性。它还通过减少晶片之间的等待时间来提高吞吐量。压力传感器用于检测表面氧化物,这会影响结果的准确性。通过检测这些表面氧化物,ALLWIN21 AW 903e可以消除它们的形成。这样可以确保结果的准确性不受影响。AW 903e在设计时也考虑到了灵活性。它可以加入晶圆加热工具(Wafer Heating Tool)和晶圆映射资产(Wafer Mapping Asset)等附加模块,以获得额外的精度。它是完全自动化的,设计时考虑到了安全和维护,使其成为一个非常高效的设备。ALLWIN21 AW 903 e是一种高度先进的RTP,其设计目的是在处理晶片时提供最高精度和吞吐量。其均匀的温度和先进的DTM确保了均匀的性能,并且能够集成其他模块以提高精度和效率,因此非常适合许多应用程序。它高效、安全、维护和操作,并且易于与现有系统集成。
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