二手 AIXTRON 3000 #9121782 待售

製造商
AIXTRON
模型
3000
ID: 9121782
Planetary reactor system P/N: 31010224 (95) Hi volume reactors, 2" MO-IR3000 Heating unit MOE-3000 Growth cabinet MO-V300 Low pressure system MO-EO Control cabinet MO-GO Gas blending cabinet Process materials: Trimethylaluminum: (ch3)3al Trimethylgallium: (ch3)3ga Trimethylindium: (ch3)3in Dimethylzinc: (ch3)2zn Phosphine: ph3 Arsine: ash3 MO-R3000 AIX MOCVD Reactor: Integrated in stainless steel glovebox Water cooled stainless steel Aluminum reactor Quartz plate Gas distributor Exhaust gas collector Hydraulic lift for reactor lid Double O-ring system LEYBOLD d1.6 pump Graphite susceptor: Current configuration: (95) 2" Wafers Supply: (4) 8" Wafers Tools for handling transfer system unit Mo-IR3000 AIX 3000 infrared heating unit: (30) IR Stripe heaters Power control unit (thyristor system) Current distribution Fused Individual control Electronic control system Water cooling system MOE-3000 Growth cabinet: Glove box with automatic pressure control containing: Planetary reactor AIX 3000 Inert gas purification system for glove box Achievable gas purity 1 ppm H2O and O2 Filters regenerative Control panel for glove box Low pressure operating unit MO-V3000 AIX 3000 Transfer chamber for reactor parts Wafer transfer chamber N2 Blow off gun Hydraulic system for reactor lid operation MO-V3000 Low pressure system: High capacity particulate filter Pressure sensor Throttle valve Pressure control (2) IF 100 Particle traps Vacuum valves Vacuum tweezers N2 Purge of pump Dual port MKS pressure readout PIS Indication system MO-EO Control cabinet: Ventilated steel cabinet for electronic control units Power supplies for reactor heater and electronics Control panel for reactor temperature with EUROTHERM 818s pid Control panel for reactor pressure regulation with MKS 652 Control panel for pneumatic valves in gas blending system Control panel for reactor cooling Control panel for double O-ring leak monitoring Control panel for moisture sensor Safety control: Hard-wired Pal programmable logic Computer control console Printer Emergency power off button Power distribution Signal distribution Mo-go gas blending cabinet: Exhausted steel cabinet Metalorganic Hydride sources Controlled temperature baths Integrated N2H2 distribution manifold Asec pressure regulators Run and vent lines Auxiliary lines for reactor Gas foil rotation Particle filters Check valves in all gas supply lines Pneumatic distribution panel Signal distribution panel Integrated pd-diffuser.
AIXTRON 3000是一种专门生产超高质量半导体材料的化学气相沉积(CVD)反应器,用于生产先进的电子器件。它的模块化设计和独特的专利特性使其非常适合在实验室环境和更大的生产作业中使用。3000由一个沉积室组成,包含一个单源电子束枪和两个目标电极。能量来源是650°C的隔离电子束,为生产优质材料而优化。在真空密室内部,来自枪的高能电子与气态反应物材料相互作用,在目标基板上产生物质沉积。由此产生的响应是高度统一和可重复的,为受控生产过程提供了基础。AIXTRON 3000的设计目的是对沉积环境进行无与伦比的控制,从而能够对压力、温度和沉积速率等参数进行精确的监测和随意调整。其他功能包括先进的自动供气系统和先进的晶圆处理机器人,用于快速高效的基板传输。AILTRON 3000材料有多种选择,包括IV类、III-V类和II-VI类化合物。这些化合物是专门配制的,以提供沉积过程的均匀性和可重复性,并确保设备生产的最高质量。该反应堆还具有合并一系列底物的能力,包括氧化硅、氧化铝和氮化物。AIXTRON 3000在生产先进电子设备方面有着广泛的应用。值得注意的用途包括高效率的红外探测器、光学数据存储设备、先进的超薄膜和无传输光刻。它还用于石墨烯基材料的成功制造,用于生物技术和纳米电子学。
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