二手 AIXTRON 3000 #9121782 待售
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ID: 9121782
Planetary reactor system
P/N: 31010224
(95) Hi volume reactors, 2"
MO-IR3000 Heating unit
MOE-3000 Growth cabinet
MO-V300 Low pressure system
MO-EO Control cabinet
MO-GO Gas blending cabinet
Process materials:
Trimethylaluminum: (ch3)3al
Trimethylgallium: (ch3)3ga
Trimethylindium: (ch3)3in
Dimethylzinc: (ch3)2zn
Phosphine: ph3
Arsine: ash3
MO-R3000 AIX MOCVD Reactor:
Integrated in stainless steel glovebox
Water cooled stainless steel
Aluminum reactor
Quartz plate
Gas distributor
Exhaust gas collector
Hydraulic lift for reactor lid
Double O-ring system
LEYBOLD d1.6 pump
Graphite susceptor:
Current configuration: (95) 2" Wafers
Supply: (4) 8" Wafers
Tools for handling transfer system unit
Mo-IR3000 AIX 3000 infrared heating unit:
(30) IR Stripe heaters
Power control unit (thyristor system)
Current distribution
Fused
Individual control
Electronic control system
Water cooling system
MOE-3000 Growth cabinet:
Glove box with automatic pressure control containing:
Planetary reactor AIX 3000
Inert gas purification system for glove box
Achievable gas purity 1 ppm H2O and O2
Filters regenerative
Control panel for glove box
Low pressure operating unit MO-V3000 AIX 3000
Transfer chamber for reactor parts
Wafer transfer chamber
N2 Blow off gun
Hydraulic system for reactor lid operation
MO-V3000 Low pressure system:
High capacity particulate filter
Pressure sensor
Throttle valve
Pressure control
(2) IF 100 Particle traps
Vacuum valves
Vacuum tweezers
N2 Purge of pump
Dual port MKS pressure readout
PIS Indication system
MO-EO Control cabinet:
Ventilated steel cabinet for electronic control units
Power supplies for reactor heater and electronics
Control panel for reactor temperature with EUROTHERM 818s pid
Control panel for reactor pressure regulation with MKS 652
Control panel for pneumatic valves in gas blending system
Control panel for reactor cooling
Control panel for double O-ring leak monitoring
Control panel for moisture sensor
Safety control:
Hard-wired
Pal programmable logic
Computer control console
Printer
Emergency power off button
Power distribution
Signal distribution
Mo-go gas blending cabinet:
Exhausted steel cabinet
Metalorganic
Hydride sources
Controlled temperature baths
Integrated N2H2 distribution manifold
Asec pressure regulators
Run and vent lines
Auxiliary lines for reactor
Gas foil rotation
Particle filters
Check valves in all gas supply lines
Pneumatic distribution panel
Signal distribution panel
Integrated pd-diffuser.
AIXTRON 3000是一种专门生产超高质量半导体材料的化学气相沉积(CVD)反应器,用于生产先进的电子器件。它的模块化设计和独特的专利特性使其非常适合在实验室环境和更大的生产作业中使用。3000由一个沉积室组成,包含一个单源电子束枪和两个目标电极。能量来源是650°C的隔离电子束,为生产优质材料而优化。在真空密室内部,来自枪的高能电子与气态反应物材料相互作用,在目标基板上产生物质沉积。由此产生的响应是高度统一和可重复的,为受控生产过程提供了基础。AIXTRON 3000的设计目的是对沉积环境进行无与伦比的控制,从而能够对压力、温度和沉积速率等参数进行精确的监测和随意调整。其他功能包括先进的自动供气系统和先进的晶圆处理机器人,用于快速高效的基板传输。AILTRON 3000材料有多种选择,包括IV类、III-V类和II-VI类化合物。这些化合物是专门配制的,以提供沉积过程的均匀性和可重复性,并确保设备生产的最高质量。该反应堆还具有合并一系列底物的能力,包括氧化硅、氧化铝和氮化物。AIXTRON 3000在生产先进电子设备方面有着广泛的应用。值得注意的用途包括高效率的红外探测器、光学数据存储设备、先进的超薄膜和无传输光刻。它还用于石墨烯基材料的成功制造,用于生物技术和纳米电子学。
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