二手 AMAT / APPLIED MATERIALS Centura 5200 Phase I #9133089 待售
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ID: 9133089
Poly etcher, 8"
Wafer shape: JMF
Chamber Type/ Location
System Configuration BASE
Position A Poly Main Etch
Position B Poly Main Etch
Position C Poly Main Etch
Position F ORIENTER
System Safety Equipment
EMO Switch Type TURN TO RELEASE EMO ETI COMPLIANT
EMO Guard Ring INCLUDED
Smoke Detector At MF No Skin YES
Smoke Detector At Gen Rack YES
Smoke Detector At AC Rack YES
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Pallet B Gas Panel Pallet B
Gas Line Requirement
Pallet Pallet
Gas Line Configuration
Line 1 Gas
MFC Size
Line 2 Gas
MFC Size
Line 3 Gas
MFC Size
Line 4 Gas
MFC Size
Line 5 Gas
MFC Size
Line 6 Gas
MFC Size
Line 7 Gas
MFC Size
Line 8 Gas
MFC Size
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Pallet C Gas Panel Pallet C
Gas Line Requirement
Pallet Pallet
Gas Line Configuration
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Features Gas Panel Features
Gas Panel Features
Gas Panel Facilities Hook Up
Gas Panel Exhaust
Gas Panel Controller VME I
Mainframe
General Mainframe Options
Facilities Type REGULATED
Facilities Orientation MAINFRAME FACILITIES BACK CONNECTION
Loadlock/Cassette Options
Loadlock Type NBLL W/ AUTO-ROTATION
Loadlock Cover Finish ANTI-STATIC PAINTED
Loadlock Slit Valve Oring Type VITON
Wafer Mapping STD
Wafer Out of Cassette Sensor YES
Cassette Present Sensor YES
Transfer Chamber Options
Transfer Ch Manual Lid Hoist YES
Robot Type CENTURA HP ROBOT
Wafer On Blade Detector BASIC
Loadlock Vent BOTTOM VENT
Front Panel
Front Panel ANTI-STATIC PAINTED
Signal Light Tower 4 COLOR SIGNAL LIGHT TOWER INCLUDING RED LIGHT
4 Color Signal Light Tower Configuration
Top Light Color RED
Second Light Color YELLOW
Third Light Color GREEN
Fourth Light Color BLUE
Signal Light Tower Buzzer ENABLED
Second Signal Light Tower YES
Remote
System Controller
Controller Type 86 INCH COMMON CONTROLLER
Cntrlr Electrical Interface BOTTOM FEED
Controller Exhaust TOP EXHAUST
Controller Cover Option YES
System Monitors
System Monitor 2 TTW / different cable lengths
Monitor Cursor 2 BLINKING CURSOR
AC Rack
GFI 30mAMP
AC Rack Types 84 INCH SLIM AC GEN RACK
Exhaust Collar 84 INCH SLIM RACK EXHAUST COLLAR
Umbilical
Ctrlr to Mainframe Umbilical 25Ft
HX Control Cable Length 50Ft
Heat Exchanger Hose Length 65Ft
Pump Cable Length 65Ft
RF Generator Cable 65Ft
Signal Light Tower Ext Cable
Pump Interface Only
Pump Interface Qty Interface Only.
AMAT/APPLIED MATERIALS Centura 5200 I期是一种高通量化学气相沉积(CVD)反应器,设计用于半导体制造。设备由十个晶圆处理室以及各种工具管理能力组成。设计用于氮化硅、氧化硅、氧化硅等硅基材料的低温处理。利用电容耦合等离子体(CCP)技术,AMAT Centura 5200 I期提供了高度均匀和精确的沉积过程。它具有先进的数字腔室体积(DV)能力,旨在精确控制晶圆的沉积速率。该系统由于其双过程控制器的设计,也可以在多个过程配方中使用。APPLIED MATERIALS Centura 5200第一阶段提供了独特的可扩展处理体系结构,可提高沉积速率和更高的吞吐量。这个单元可以加工直径达200毫米的晶片,最高工艺温度可达1200 °C。晶片可以在机器中进行预清洗和预冷,并进行后冷却以防止沉积物料氧化。Centura 5200第一阶段提供了先进的行业标准安全功能,并且符合所有政府安全法规。该工具的设计目的是尽量减少与晶片的接触,确保以后不会受到污染。对于洁净室设置,该工具配有气流控制包,以及用于晶圆处理的通过缓冲室。通过提供多种功能组合,资产可以优化CVD过程,以提供均匀性和均匀的厚度增益。这样可以保持表面质量,同时提供所需的覆盖范围和薄膜厚度。此模型无与伦比的精度和精确度提供了最先进的制造解决方桉之一。
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