二手 AMAT / APPLIED MATERIALS Centura 5200 Phase I #9133089 待售

ID: 9133089
Poly etcher, 8" Wafer shape: JMF Chamber Type/ Location System Configuration BASE Position A Poly Main Etch Position B Poly Main Etch Position C Poly Main Etch Position F ORIENTER System Safety Equipment EMO Switch Type TURN TO RELEASE EMO ETI COMPLIANT EMO Guard Ring INCLUDED Smoke Detector At MF No Skin YES Smoke Detector At Gen Rack YES Smoke Detector At AC Rack YES Pallet Corrosive Gas Line Qty 3 Pallet Inert Gas Line Qty 5 Filter Qty 8 Gas Panel Pallet B Gas Panel Pallet B Gas Line Requirement Pallet Pallet Gas Line Configuration Line 1 Gas MFC Size Line 2 Gas MFC Size Line 3 Gas MFC Size Line 4 Gas MFC Size Line 5 Gas MFC Size Line 6 Gas MFC Size Line 7 Gas MFC Size Line 8 Gas MFC Size Pallet Corrosive Gas Line Qty 3 Pallet Inert Gas Line Qty 5 Filter Qty 8 Gas Panel Pallet C Gas Panel Pallet C Gas Line Requirement Pallet Pallet Gas Line Configuration Pallet Corrosive Gas Line Qty 3 Pallet Inert Gas Line Qty 5 Filter Qty 8 Gas Panel Features Gas Panel Features Gas Panel Features Gas Panel Facilities Hook Up Gas Panel Exhaust Gas Panel Controller VME I Mainframe General Mainframe Options Facilities Type REGULATED Facilities Orientation MAINFRAME FACILITIES BACK CONNECTION Loadlock/Cassette Options Loadlock Type NBLL W/ AUTO-ROTATION Loadlock Cover Finish ANTI-STATIC PAINTED Loadlock Slit Valve Oring Type VITON Wafer Mapping STD Wafer Out of Cassette Sensor YES Cassette Present Sensor YES Transfer Chamber Options Transfer Ch Manual Lid Hoist YES Robot Type CENTURA HP ROBOT Wafer On Blade Detector BASIC Loadlock Vent BOTTOM VENT Front Panel Front Panel ANTI-STATIC PAINTED Signal Light Tower 4 COLOR SIGNAL LIGHT TOWER INCLUDING RED LIGHT 4 Color Signal Light Tower Configuration Top Light Color RED Second Light Color YELLOW Third Light Color GREEN Fourth Light Color BLUE Signal Light Tower Buzzer ENABLED Second Signal Light Tower YES Remote System Controller Controller Type 86 INCH COMMON CONTROLLER Cntrlr Electrical Interface BOTTOM FEED Controller Exhaust TOP EXHAUST Controller Cover Option YES System Monitors System Monitor 2 TTW / different cable lengths Monitor Cursor 2 BLINKING CURSOR AC Rack GFI 30mAMP AC Rack Types 84 INCH SLIM AC GEN RACK Exhaust Collar 84 INCH SLIM RACK EXHAUST COLLAR Umbilical Ctrlr to Mainframe Umbilical 25Ft HX Control Cable Length 50Ft Heat Exchanger Hose Length 65Ft Pump Cable Length 65Ft RF Generator Cable 65Ft Signal Light Tower Ext Cable Pump Interface Only Pump Interface Qty Interface Only.
AMAT/APPLIED MATERIALS Centura 5200 I期是一种高通量化学气相沉积(CVD)反应器,设计用于半导体制造。设备由十个晶圆处理室以及各种工具管理能力组成。设计用于氮化硅、氧化硅、氧化硅等硅基材料的低温处理。利用电容耦合等离子体(CCP)技术,AMAT Centura 5200 I期提供了高度均匀和精确的沉积过程。它具有先进的数字腔室体积(DV)能力,旨在精确控制晶圆的沉积速率。该系统由于其双过程控制器的设计,也可以在多个过程配方中使用。APPLIED MATERIALS Centura 5200第一阶段提供了独特的可扩展处理体系结构,可提高沉积速率和更高的吞吐量。这个单元可以加工直径达200毫米的晶片,最高工艺温度可达1200 °C。晶片可以在机器中进行预清洗和预冷,并进行后冷却以防止沉积物料氧化。Centura 5200第一阶段提供了先进的行业标准安全功能,并且符合所有政府安全法规。该工具的设计目的是尽量减少与晶片的接触,确保以后不会受到污染。对于洁净室设置,该工具配有气流控制包,以及用于晶圆处理的通过缓冲室。通过提供多种功能组合,资产可以优化CVD过程,以提供均匀性和均匀的厚度增益。这样可以保持表面质量,同时提供所需的覆盖范围和薄膜厚度。此模型无与伦比的精度和精确度提供了最先进的制造解决方桉之一。
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