二手 AMAT / APPLIED MATERIALS Centura 5200 Phase I #9133092 待售
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ID: 9133092
Oxide etcher, 8"
Wafer shape: JMF
Chamber Type/ Location Selected Option
System Configuration BASE
Position A Oxide Main Etch
Position B Oxide Main Etch
Position C Oxide Main Etch
Position F ORIENTER
Position A Configuration Oxide Main Etch
Position B Configuration Oxide Main Etch
Position C Configuration Oxide Main Etch
Position D Configuration
System Safety Equipment Selected Option
EMO Switch Type TURN TO RELEASE EMO ETI COMPLIANT
EMO Guard Ring INCLUDED
Smoke Detector At MF No Skin YES
Smoke Detector At Gen Rack YES
Smoke Detector At AC Rack YES
Water and Smoke Detector ALARM
System Labels ENGLISH
CHA - CHA - OXIDE
Chamber Options Selected Option
Process Kit USED
Turbo Pump Seikoseiki 301
Emission Endpoint Type Monocro
Oxide ESC USED Flat
BIAS RF GEN OEM-28B
MxP Oxide Throttle Butter fly
MxP Oxide Gate Valve VAT
CHB - CHB - OXIDE
Chamber Options Selected Option
Process Kit USED
Turbo Pump Seikoseiki 301
Emission Endpoint Type Monocro
Oxide ESC USED Flat
BIAS RF GEN OEM-28B
MxP Oxide Throttle Butter fly
MxP Oxide Gate Valve VAT
CHC - CHC - OXIDE
Chamber Options Selected Option
Process Kit USED
Turbo Pump Seikoseiki 301
Emission Endpoint Type Monocro
Oxide ESC USED Flat
BIAS RF GEN OEM-28B
MxP Oxide Throttle Butter fly
MxP Oxide Gate Valve VAT
Gas Delivery Options
Pallet Options Selected Option
Valve Fujikin
Regulator Fujikin
Gas Panel Pallet A Gas Panel Pallet A
Gas Line Requirement Selected Option
Pallet Pallet
Gas Line Configuration Selected Option
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Pallet B Gas Panel Pallet B
Gas Line Requirement Selected Option
Pallet Pallet
Gas Line Configuration Selected Option
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Pallet C Gas Panel Pallet C
Gas Line Requirement Selected Option
Pallet Pallet
Gas Line Configuration Selected Option
Pallet Corrosive Gas Line Qty 3
Pallet Inert Gas Line Qty 5
Filter Qty 8
Gas Panel Features Gas Panel Features
Gas Panel Features Selected Option
Gas Panel Controller VME I
Mainframe
General Mainframe Options Selected Option
Facilities Type REGULATED
Facilities Orientation MAINFRAME FACILITIES BACK CONNECTION
Loadlock/Cassette Options Selected Option
Loadlock Type NBLL W/ AUTO-ROTATION
Loadlock Cover Finish ANTI-STATIC PAINTED
Loadlock Slit Valve Oring Type VITON
Wafer Mapping STD
Wafer Out of Cassette Sensor YES
Cassette Present Sensor YES
Transfer Chamber Options Selected Option
Transfer Ch Manual Lid Hoist YES
Robot Type CENTURA HP ROBOT
Wafer On Blade Detector BASIC
Loadlock Vent BOTTOM VENT
Front Panel Selected Option
Front Panel ANTI-STATIC PAINTED
Signal Light Tower 4 COLOR SIGNAL LIGHT TOWER INCLUDING RED LIGHT
4 Color Signal Light Tower Configuration Selected Option
Top Light Color RED
Second Light Color YELLOW
Third Light Color GREEN
Fourth Light Color BLUE
Signal Light Tower Buzzer ENABLED
Second Signal Light Tower YES
Remote
System Controller Selected Option
Controller Type 86 INCH COMMON CONTROLLER
Cntrlr Electrical Interface BOTTOM FEED
Controller Exhaust TOP EXHAUST
Controller Cover Option YES
System Monitors Selected Option
System Monitor 2 TTW / different cable lengths
Monitor Cursor 2 BLINKING CURSOR
AC Rack Selected Option
GFI 30mAMP
AC Rack Types 84 INCH SLIM AC GEN RACK
Exhaust Collar 84 INCH SLIM RACK EXHAUST COLLAR
Umbilical Selected Option
Ctrlr to Mainframe Umbilical 25Ft
HX Control Cable Length 50Ft
Heat Exchanger Hose Length 65Ft
Pump Cable Length 65Ft
RF Generator Cable 65Ft
Pump Interface Only Selected Option
Pump Interface Qty Interface Only.
AMAT/APPLIED MATERIALS Centura 5200 I期是为半导体制造而设计的反应堆。它具有具有SiH4/NH3/DOP射频源的56MHz端点蚀刻,并且能够利用基于三氯化磷(PCl3)的蚀刻模块将蚀刻深度降至8.5微米。该腔室由不锈钢制成,具有低温操作,以更好的蚀刻/工艺兼容性。反应堆配有一个过程控制箱和一个单独的气闸,用于装卸腔室。AMAT Centura 5200 I期具有一个内部加热、气密的大型工艺室。该腔室设计用于防止微粒和蚀刻试剂在蚀刻过程中进入晶片。可容纳高达2英寸(5.08厘米)和8000磅(3.63吨)的半导体晶圆。该室设有真空设备和带偏转挡板的排气烟囱,以确保均匀蚀刻和低背面污染。内置端点控制器通过测量腔室内部的压力、气体输送系统的状态以及通过电源磁控管的电流来监控蚀刻过程。该工艺室还包含一个自动温度补偿模块(ATCM),以提高工艺一致性和性能。ATCM的范围从180°到260 °C,并提供了广泛的工艺优化调整。它还具有灵活的温度控制和用户可选择的参数来优化工艺参数。端点蚀刻工艺旨在对蚀刻深度进行高效、精确的控制。APPLIED MATERIALS Centura 5200 Phase I具有自调56 MHz射频电源和全波形过程控制单元。这台机器允许操作员蚀刻具有不同蚀刻深度的晶片,也有助于防止晶片的损坏和疤痕。最后,Centura 5200第一阶段旨在提供安全、可靠和可重复的过程,并具有出色的最终效果。它具有内置的安全功能,可以在发生潜在故障时提醒操作员。该工具还具有内置的维护和故障排除功能,便于分析和故障排除。因此,AMAT/APPLIED MATERIALS Centura 5200 I期是高效生产半导体晶片的理想资产。
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