二手 AMAT / APPLIED MATERIALS Centura DPS II #9189888 待售

Metal etcher, 12" Chamber configuration: (3) DPS II Axiom Chamber configuration: Chamber A: Chamber model: DPS II Bias generator: AE APEX 1513, 13.56 MHz, maximum 1500 W Bias match: AE 13.56 MHz,3 kV navigat Source generator: AE APEX 3013, 13.56 MHz, maximum 3000 W Source match: AE 13.56 MHz,6 kV navigat Lid: Ceramic lid, Single gas nozzle Turbo pump: STP-A2503PV Throttle valve: VAT Pendulum valve DN-250 ESC: Dual zone ceramic ESC Endpoint type: Monochromator Cathode chiller: SMC POU Wall chiller: SMC INR-496-016C Process kits coating: Anodize coating Cooling: HT 200 / FC 40 Chamber B: Cathode chiller: SMC POU Chamber C: Cathode chiller: SMC POU Wall chiller: SMC INR-496-016C Mainframe configuration: IPUP Type: ALCATEL A100L Gas panel type: NextGen VHP Robot: Dual blade MF PC Type: CPCI Factory interface configuration: Frontend PC type: 306 Server FIC PC type: 306 Server (3) Load ports Atmospheric robot: Yaskawa track robot Side storage: Right side MFC Configuration: Chamber A: Gas line Gas name Max flow MFC Type Gas 1 BCL3 200 ARGD40W1 Gas 2 C2H4/HE 400 AAPGD40W1 Gas 3 NF3 200 AAPGD40W1 Gas 4 CL2 400 SC-24 Gas 5 N2_50 50 AAMGD40W1 Gas 6 N2_300 300 AAPGD40W1 Gas 7 CF4 100 AAPGD40W1 Gas 8 O2 1000 AASGD40W1 Gas 9 SF6 100 AAPGD40W1 Gas 10 CHF3 50 AANGD40W1 Gas 12 AR 400 AAPGD40W1 Chamber B: Gas line Gas name Max flow MFC Type Gas 1 BCL3 200 AARGD40W1 Gas 2 C2H4/HE 400 AAPGD40W1 Gas 3 NF3 200 AAPGD40W1 Gas 4 CL2 400 AARGD40W1 Gas 5 N2_50 50 AAMGD40W1 Gas 6 N2_300 300 AAPGD40W1 Gas 7 CF4 100 AAPGD40W1 Gas 8 O2 1000 AASGD40W1 Gas 9 SF6 100 AAPGD40W1 Gas 10 CHF3 50 AANGD40W1 Gas 12 AR 400 AAPGD40W1 Chamber C: Gas line Gas name Max flow MFC Type Gas 1 BCL3 200 AARGD40W1 Gas 2 C2H4/HE 400 AAPGD40W1 Gas 3 NF3 200 AAPGD40W1 Gas 4 CL2 400 AARGD40W1 Gas 5 N2_50 50 AAMGD40W1 Gas 6 N2_300 300 AAPGD40W1 Gas 7 CF4 100 AAPGD40W1 Gas 8 O2 1000 AASGD40W1 Gas 9 SF6 100 AAPGD40W1 Gas 10 CHF3 50 AANGD40W1 Gas 12 AR 400 AAPGD40W1 2006 vintage.