二手 AMAT / APPLIED MATERIALS Centura DPS+ #9395287 待售
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ID: 9395287
晶圆大小: 6"
Poly etcher, 6"
Mainframe:
Position A, B: DPS Plus poly
Position F: Orienter
Front panel: Anti-static painted
Signal light tower: 3 Color (R, A, G)
Type: AC Rack
Type: EMO Switch
EMO Guard ring
Flow sensor chamber:
Wall
Cathode
Turbo pump 4
DPS
Type: Wide body loadlock
Slit valve: O-Ring type (viton)
Wafer mapping: Enhanced (fast)
Type: HP and robot
Robot blade option
Wafer on blade detector: Basic
Vent filter: Ceramic
Heater
Loadlock vent: Top
Orienter chamber:
Type: Hoop
DTCU: ES
Voltage distributor
Mount ring
Lower chamber cover: STD
Type: Lip seal
EDWARDS TMP
Pressure gauge: CM 100 Mt (MKS)
Pressure gauge: CM 10 Torr (MKS)
ESC HV Module P/N: 0010-30139
BIAS RF Matcher P/N: 0010-00854
Source RF Matcher: Install
HE Pressure controller
Type: MKS649A (50 SCCM)
ATLAS 2012 Source RF Generator
ACG-6B RF Generator (BIAS)
Throttling Gate Valve (TGV)
EDWARDS TMP Etcher pump pipe line
With heater
Cathode assy type: HE Single supply
Upper chamber: Full A-coat
Ceramic dome P/N: 0200-39137
Gas panel:
MFC Type: AERA FC-D980C
Position / Gas / MFC Size
Gas 1, 11 / CL2 / 200 SCCM
Gas 2, 12 / HBR / 200 SCCM
Gas 6, 16 / CF4 / 200 SCCM
Gas 7, 17 / CHF3 / 100 SCCM
Gas 8, 18 / O2 / 100 SCCM
Gas 9, 19 / SF6 / 100 SCCM
Gas 10, 20 / AR / 200 SCCM
Gas panel facilities:
BD Side
SLD Box bottom feed
AC Chamber TOP side
VMEII Gas panel controller
VERIFLO Valve
MKS 872 Transducer
VERIFLO SQ2 Regulator
MILIPORE Filter
Transducer display per stick
CRT Endpoint monitor
Rack mount
Type: (2) Monochromators
Type: V452 SBC Controller
Umbilicles: 40 Feet base
Mainframe umbilical: 40 ft
AC Mainframe umbilical: 40 ft
Chiller control cable length: 40 ft
Chiller hose length: 50 ft
Pump signal cable length: 50 ft
RF RACK To MF Cable length: 75 ft
Type: SMC H2000 Chiller
Cathode (chamber A, B): SMC H2000
Wall (chamber A, B): SMC H2000
Dome (chamber A, B): Facility cooling water
Coolant Type: DI and EG
(2) Chiller power lines (Tool C/B Chiller)
Type: (4) Chiller hoses (50 Ft)
Signal I/O
EBARA AA40W / AA10
(4) Pump interfaces
(4) Pump power lines (Tool C/B Pump)
M/F Utility connection: Rear side
UPS
Lamp CB: 20 A
RF Generator CB: (B)15 A / (S)30 A
Pump CB: 30 A
CRT Monitor
Type: DTCU Hoist
Power supply: 200 - 208 VAC, 60 Hz, 100 mA.
AMAT/APPLIED MATERIALS Centura DPS是一种用于基于等离子体的工业制造应用的高性能集成设备。它专为生产先进技术节点、平板显示器、计算机内存芯片和微处理器等半导体器件而设计。该系统采用串联驱动机构,具有6个区域的负载锁和几个智能的终端效应器,可实现准确和可重复的产品放置。该反应堆能够同时处理多达25个晶片，可重复和可重复的结果。该单元包括一台具有实时配方生成选项、高级安全功能和专有硬件的自动配方控制机器,在定制处理参数时具有近乎无限的灵活性。这使工具能够轻松适应不断变化的生产需求,例如新产品设计或过程更改。AMAT Centura DPS可以处理多种先进的材料和基材，包括纯单晶硅、金属和聚合物。它能够提供多种沉积和蚀刻过程，如原子层、电子束和离子束处理。该资产还具有先进的分析和监测能力，使沉积和蚀刻过程具有高精度和可重复性，从而在生产过程中实现高产和提高质量。APPLIED MATERIALS Centura DPS旨在适应最新的高级流程步骤,并且与高级流程自动化工具和技术（如自动对齐、自动调整和机器视觉等）兼容。这样可以实现更快、更高效的处理,同时保持最高的质量和准确性。机器没有活动部件,允许它全天候运行,优化资源并将停机时间缩短到最低限度。Centura DPS模型符合欧盟的安全、报告和环境标准,是工业环境的理想选择。AMAT/APPLICED MATERIALS Centura DPS除了具有强大的高性能处理优势外,还易于使用和维护。它具有用户友好的界面、现场人员培训和实时故障排除支持,使其成为市场上最可靠、最具成本效益的生产工具之一。
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