二手 AMAT / APPLIED MATERIALS Centura HP PVD #9266424 待售
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ID: 9266424
优质的: 1995
Sputtering system, 6"
Chamber type:
Chamber A: AL
Chamber B: AL
Chamber C: PC-II
Chamber D: TiTiN
Chamber E (Orient / Degas)
Chamber F (Orient / Degas)
Chamber A:
Heater type: 4F
Source type: 11.3"
Body: STD
Adaptor: STD
Manometter: Single 0.1 torr (6274A)
Ion gauge: Nude
Lift cylinder: STD
Basic motorize
Gate vavle: 2P
Cryo pump: EHN-OB8F
Chamber B:
Heater type: 4F
Source type: 11.3"
Body: STD
Adaptor: STD
Manometter: Single 0.1 torr (6274A)
Ion gauge: nude
Lift cylinder: STD
Basic motorize
Gate vavle: 2P
Cryo pump: EHN-OB8F
Chamber D (PVD):
Heater type: 101
Source type: 11.3"
Body: STD
Adaptor: STD
Manometter: Single 0.1 torr (6274A)
Ion gauge: nude
Lift cylinder: STD
Basic motorize
Gate vavle: 3P
Cryo pump: EHN-OB8F
Chamber C (PC-II):
Resonator: STD
Body: Turbo
Basic pedestat
Turbo adaptor: Short
Manometter: Single 0.1 torr (6274A)
LEYBOLD 361C Turbo pump
Match box: 6"
Lift cylinder
Electrical requirements:
Controller type: Centura standard
Electrical interface: Top feed AC cable
Main frame:
Type: Main frame I
System placement: Stand alone
Robot type: HP Robot
Robot blade: NICKEL Coated AI
Loadlock:
Loadlock cassette: Wide body
Index type: With rotation
Cassette handler: Metal
Basic loadlock wafer mapping
Dual stage vent type
Gas delivery:
Filters:
Veriflo 10 Ra Max
Pall
Generator:
Chamber A:
MDX Power: MDX-L12-650
Chamber B:
MDX Power:
MDX-L12M
MDX-L12
Chamber C: LF-10A Generator
CPS-1001S Missing
Chamber D:
MDX Power: MDX-L12
NESLAB-I Heat exchanger
(2) 9600 Compressors
Umbilicals:
MF - AC rack: 300"
Pumps:
System: A30W
PC-II: A07
Includes:
Serial isolator
System reset
Lk Det 5 and 6 / Conv / TC
(3) Lk Det 7 and 8 / Conv / TC
Floppy Disk Drive (FDD)
Hard Disk Drive (HDD)
Chamber A, B, C, D & E: Interface
Mainframe interface
Loadlock interface
Chamber A, B, C & D:
Dl/O 1
Dl/O 2
Chamber E: Dl/O
Synergy SBC
Video
SEI
Chamber A, B, C & D: Al/O
Chamber E/MF: Al/O 2
Mainframe:
Al/O 1
Dl/O 1
Dl/O 2
Dl/O 3
Dl/O 4
Dl/O 5
Dl/O 6
(3) Steppers
OMS
No shutter (Chamber A, B & D)
1995 vintage.
AMAT/APPLIED MATERIALS Centura HP PVD（物理气相沉积）反应器是一种下一代沉积设备，旨在提供先进、高性能的薄膜沉积能力。这一创新系统通过多个工具和腔室提供各种沉积配方，并针对提高工艺灵活性和生产效率进行了优化。AMAT Centura HP PVD反应堆能够沉积多种材料，包括但不限于铜、铝、氮化钛和钨等。利用多种选择性气体和惰性气体精确控制物料来源，创造最佳薄膜沉积所需的完美环境和压力。Select Source™ （SS）线性加速器和Turbo-Pumped™电源（TPP）确保保持过程所需的无功压力和温度。APPLIED MATERIALS Centura HP PVD单元还具有温度控制的升空/蚀刻模块和集成的高温烘烤。此模块设计用于在提升和蚀刻过程中自动控制基板周围的温度,以最大程度地减少有害热接触的影响。它还具有快速热扫描功能，以准确地描述薄膜的生长和蚀刻深度。除了卓越的PVD功能外,Centura HP PVD反应堆的设计还提供卓越的正常运行时间和工作效率。机器的模块化配置允许快速轻松地加载工具,并带有功能强大的软件和图形用户界面,任何技能级别的操作员都可以轻松使用。该工具还带有自动配方功能，通过节省用户时间和精力简化沉积过程。总体而言,AMAT/APPLIED MATERIALS Centura HP PVD反应器是一种先进的沉积资产,具有出色的薄膜沉积能力和卓越的工艺灵活性。其温度控制的升降/蚀刻模块、Select Source线性加速器、Turbo-Pumped电源和自动配方功能使其成为高性能薄膜沉积的理想工具。
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