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AMAT / APPLIED MATERIALS Centura I P1
ID: 9133087
WxZ system, 6" Chamber Type/ Location Position A WXZ Position B WXZ Position C WxP Position D WxP Position E MULTE COOLDOWN Position F ORIENTER Electrical Requirements Line Voltage 200/208 VAC Line Frequency 50~60 Hz System Safety Equipment EMO Guard Ring INCLUDED Water and Smoke Detector ALARM System Labels ENGLISH with Chinese simplified Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Wxz Chamber Options Bias Generator STANDARD ENI 12B3 Slit Valve Oring STANDARD Throttle Valve STANDARD THROTTLE Orienter Chamber Options Chamber Type MULTE COOL DOWN Pallet Options General Mainframe Options Facilities Type REGULATED Facilities Orientation MAINFRAME FACILITIES BOTTOM CONNECTION Weight Dispersion Plates Mainframe And Remote Chamber Flow Switch Options Loadlock/Cassette Options Loadlock Type Narrow Body AUTO ROTATION Loadlock Platform UNIVERSAL Cassette Type Supported 200 mm Loadlock Cover Finish ANTI-STATIC PAINTED Loadlock Slit Valve Oring Type VITON Wafer Mapping ENHANCED Integrated Cassette Sensor YES Transfer Chamber Options Transfer Ch Manual Lid Hoist YES Robot Type HP Robot Blade Option ROUGHENED AL BLADE Wafer On Blade Detector BASIC Loadlock Vent BOTTOM VENT System Controller Controller Type Cntrlr Electrical Interface BOTTOM FEED Controller Exhaust TOP EXHAUST System Monitors System Monitor 1 STANDALONE Monitor Cursor BLINKING CURSOR AC Rack Controller Facility Interface REMOTE UPS INTERFACE ONLY
AMAT/APPLIED MATERIALS Centura I P1是用于半导体制造的单晶片集群工具。它旨在创建独特的低温浅沟槽隔离(STI)工艺,以减少由于抛光、蚀刻和真空处理而产生的器件应力。该反应堆支持低k和介电抛光工艺,使设备结构具有更高的缩放能力和更好的性能。它还拥有先进的晶圆转移机制,以提高制造过程中工艺步骤的准确性和可重复性。AMAT Centura I P1反应堆是一种热化学氧化物(TCO)聚类工具,旨在提供高性能的STI溶液,同时减轻不利的环境和制造风险。该工具的核心是DEIONIZED WATER (DI) Ultrashower,它在处理过程中确保精确且可重复的晶圆温度曲线。该工具执行一个DI流和一组特定的气态前体,在晶圆中形成孤立的沟槽或凹坑。其结果是一个真正统一的晶片规模的STI过程,降低设备应力水平和提高性能。APPLIED MATERIALS Centura I P1反应堆还配备了低温端点探测器(LTEP),可精确测量过程的端点。LTEP保持了科学、技术和创新进程的预设统一性,从而产生了干净、可重复和统一的结果。该工具还提供低k抛光能力,减少相邻晶体管节点之间的寄生电容。对于需要更多扩展和改进性能的设备结构,这是一个关键过程。该工具还配备了先进的晶圆传递机制,方便晶圆的加载和卸载。它提供垂直晶片对准,在过程中对晶片边缘进行更精确的跟踪,从而提高晶片到基板的可重复性。Centura I P1反应堆非常适合那些需要低成本和高性能STI工艺应用的人。它具有低k抛光和晶片传输能力,是一种经济高效且可靠的工具,适用于那些需要产量临界、应力减轻、可持续重复和统一的STI结果的用户。
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