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ID: 9115015
Poly etcher, 8" Wafer shape: JMF flat 208 V, 400A, 60 Hz Centura type: Centura 1 No SMIF interface Chamber A: MXP+ Chamber B: MXP+ Chamber C: MXP+ Chamber D: Empty Chamber E: Empty Chamber F: Orient Buff robot type: HP, metal blade Narrow body loadlock Standard Wafer sensor Water detector alarm Smoke detector alarm Monitor & EDP monitor: Wall mount AC Rack types: Phase 1 AC Rack MF Facilities: Bottom EMO's: Turn to release Control rack type: Phase 1 controller Chamber A: MXP+ Polymide ESC MKS640 IHC 1 Torr manometer Quick release lid Vitron slit valve o-ring Standard bias RF match OEM 12B RF gen bias No Autobias Monochrometer endpoint system ENDP30 endpoint software SEIKO SEIKI 301 turbo pump Magnet driver full installed Chamber pump not included Simply cathode type Butterfly throttle valve Vat gate valve Process kit not included Gas 1: CF4, 100, STEC SEC-4400MC Gas 2: CHF3, 300, STEC SEC-4400MC Gas 3: O2, 50, STEC SEC-4400MC Gas 4: O2, 200, STEC SEC-4400MC Gas 5: AR, 100, STEC SEC-4400MC Gas 6: N2, 100, STEC SEC-4400MC Chamber B: MXP+ Polymide ESC MKS640 IHC 1 Torr manometer Quick release lid Vitron slit valve o-ring Standard bias RF match OEM 12B RF gen bias No Autobias Monochrometer endpoint system ENDP30 endpoint software SEIKO SEIKI 301 turbo pump Magnet driver full installed Chamber pump not included Simply cathode type Butterfly throttle valve Vat gate valve Process kit not included Gas 1: CF4, 100, STEC SEC-4400MC Gas 2: CHF3, 300, STEC SEC-4400MC Gas 3: O2, 50, STEC SEC-4400MC Gas 4: O2, 200, STEC SEC-4400MC Gas 5: AR, 100, STEC SEC-4400MC Gas 6: N2, 100, STEC SEC-4400MC Chamber C: MXP+ Polymide ESC MKS640 IHC 1 Torr manometer Quick release lid Vitron slit valve o-ring High efficiency bias RF match OEM 12B RF gen bias No Autobias Monochrometer endpoint system ENDP30 endpoint software SEIKO SEIKI 301 turbo pump Magnet driver full installed Chamber pump not included Simply cathode type Butterfly throttle valve Vat gate valve Process kit not included Gas 1: CF4, 100, STEC SEC-4400MC Gas 2: CHF3, 300, STEC SEC-4400MC Gas 3: O2, 50, STEC SEC-4400MC Gas 4: O2, 200, STEC SEC-4400MC Gas 5: AR, 100, STEC SEC-4400MC Gas 6: N2, 100, STEC SEC-4400MC Gas delivery options: MFC maker: STEC Transducer displays: core tool MOTT filter Regulator: core tool Transducer: core tool Valve: core tool Gas connection: Sing line drop Gas line feed side: AC side Gas line feed direction: bottom Exhaust: Top Exhaust feed side: BD side Chiller: Heat exchanger for cathode: ETC Heat exchanger for wall: ETC (2) Total chiller W/ RS-485 interface Chiller valve connections: Manifold Generator rack valve connection: Manifold Valve connections: 1 each for wall and cathode per chamber (A, B, C) Chiller hose size: 3/8 Quick.
AMAT/APPLIED MATERIALS Centura MxP+是一种先进的半导体反应器,设计用于双金属蚀刻和离子植入应用。它具有集成的真空设备、化学预处理系统以及先进的数字控制器和编程功能,所有这些都给用户提供了为各种用途定制其工艺配方的灵活性。该装置采用多区反应性气体分配机,可均匀输送反应性气体,并对过程进行良好控制。此外,该工具还包括一组独特的可移动腔室,提供了自定义进程的能力。使AMAT Centura MxP+与其他反应堆脱颖而出的主要特点是其先进的多区反应性气体分配资产。该模型允许均匀输送反应性气体,从而能够精确控制该过程。多区气体分配设备由一组连接到多条气体管线的高压喷嘴促成,信号将气体释放到反应室中。然后可以溷合气体以获得所需的效果,允许用户自定义其过程以获得最佳结果。喷嘴采用高性能材料制造,确保了较长的使用寿命。APPLIED MATERIALS Centura MxP+系统还包括一组独特的可移动腔室,使用户能够自定义流程或探索新参数。此外,反应堆的数字控制器提供一流的精度和编程能力。先进的数字控制器利用传感器和反馈点组成的阵列,在整个过程中监视和控制腔室的参数,从而产生比手动控制更详细和准确的过程。Centura MxP+上的集成真空单元提供稳定可靠的真空压力,以维持腔室内精确一致的反应。这个整合式机器还利用一个单独的清除工具来消除腔室中的任何残留气体。此外,该资产采用了一种化学预处理模型,允许在每一批中引入新鲜的反应性气体。AMAT/APPLIED MATERIALS Centura MxP+的设计和制造符合质量和性能的最高标准。它由优质材料如不锈钢和铝打造而成,确保坚固耐用。此外,这些设备的设计易于维护和维修,为用户提供了一种简便和经济高效的方式,使他们的系统保持最佳状态。AMAT Centura MxP+是一种先进的、多区、支持数字控制器的反应器,设计用于双金属蚀刻和离子植入应用。其集成的真空、化学预处理和气体分配系统允许精确和统一的过程控制和定制。此外,它的可移动腔室和数字编程功能使用户能够根据自己的需要定制其工艺配方。由于其高质量的构造和先进的特性,APPLIED MATERIALS Centura MxP+是需要可靠精确结果的科学家和工程师的绝佳选择。
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