二手 AMAT / APPLIED MATERIALS Centura Ultima HDP CVD #62203 待售

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ID: 62203
晶圆大小: 8"
优质的: 2000
Etcher, 8" (2) Ultima chamber (1) Ultima plus chamber Technology :IMD      Wafer Size : 8"      Wafer Shape : SNNF (Semi Notch No Flat)      Software Version : B4.3.14      CHAMBER TYPE AND LOCATION      Ch A : Ultima HDP-CVD      Ch B : Ultima HDP-CVD      Ch C : Ultima + HDP-CVD      Ch E : Multislot Cool Down      Ch F : Orientor      CHAMBER A,B Ultima HDP-CVD :     Nozzle : Long/Long Side      Clean Gas Distribution : Baffle      Turbo Pump : Ebara ET1600WS w/ HVA      Wafer Temperature Monitoring : Yes      Top Gas Feed : Without Top O2      Dual Independent He Control : Standard 10/10 TORR      Clean Method : Microwave      CHAMBER C - Ultima + HDP-CVD :      Nozzle : Long/Long Side      Clean Gas Distribution : Baffle      Turbo Pump : Ebara ET1600WS w/ HVA      Wafer Temperature Monitoring : Yes      Top Gas Feed : Without Top O2      Dual Independent He Control : Standard 10/10 TORR      Clean Method : Top Mount      EXISTING ELECTRICAL REQUIREMENTS      Line Frequency : 60Hz      Line Voltage : 200/208V      Line Amperage : 600A Platform      EXISTING SAFETY EQUIPMENT :      EMO type : Turn to release EMO      EMO Guard Ring : Yes      System Labels : English w/Chinese Non-simplified      System Smoke Detector : Controller      EXISTING MAINFRAME :      Mainframe Type : Ultima HDP w/Multislot      Frame Type : Standard Frame      System Placement : Through the Wall      Mainframe Skins : No      Mainframe Exhaust Duct : No      Mainframe Facilities Connection : Back      Robot Type : HP Robot      Robot Blade : Ceramic      Loadlock Cassette : Narrow Body      Narrow body Loadlocks : Cassette Present Sensor      Loadlock Wafer Mapping : Basic      N2 Purge Type : STEC 4400MC 10 Ra Max      EXISTING GAS DELIVERY :      Gas Panel Surface Finish : Standard Gas Panel      MFC Type : STEC 4400MC 10 Ra Max      Valves : Fujikin 5 Ra Max      Filters : Pall Ni 10 Ra Max      Transducers : MKS w/ Display      Regulators : Veriflo      System Cabinet Exhaust : Top      Gas Panel Gas/Flow Direction Labels : Yes      APC Seriplex Cover : Yes      Gas Panel Doors : Solid      Gas Pallet Configuration :      Chamber A, B, C      Gas Stick/Process Gas/MFC size/Regulator/Transducer      #1 SiF4 100 Y Y      #2 O2 400 Y Y      #3 SiH4 200 Y Y      #4 Ar 300 Y Y      #5 SiH4 20 Y Y      #6 Ar 50 Y Y      #7 NF3 2000 Y Y      #8 Ar 2000 Y Y      REMOTES :      RF Generator Rack - Ultima Gen. Rack      ASTEX 80S09mW (3)      Quantity : Two      Ultima Stand-Alone RF Generator Rack : Yes      Generator Rack Cooling - RF Gen Rack Manifold with Quick Disconnect Ultima Gen Rack H20 Connection - Barbed Brass      Existing Heat Exchanger : SMC Thermo      Umbilicals :      System Controller Signal Cable Length : 55ft      RF Gen Rack Cable Length : 50ft      Ultima Stand-Alone Generator Rack : 98 ft      HX Hose Length : 50ft      HX Cable Length : 50ft      Pump Cable : 50ft      Ultima Microwave Generator Cable Length : 50 ft      Ultima WTM Cable Length : 32.8 ft (10m)      Vacuum Pumps, Exhaust Scrubber not included in sale Currently crated and stored      System Can be inspected 1999-2000 vintage.
AMAT/APPLIED MATERIALS Centura Ultima HDP CVD是一种化学气相沉积(CVD)反应器,具有专有的热壁输送等离子体(HWDP)处理室。这种反应堆是专门为便利化学气相沉积一系列具有优化的热均匀性和等离子体均匀性的材料而设计的。反应堆使用化学前体在金属、硅或陶瓷等基板上创建材料层。该反应器能够产生难以置信的高密度等离子体辅助沉积(HDP)薄保形层,是从半导体封装和先进互连到生物医学和纳米技术相关应用的理想工具。AMAT Centura Ultima HDP CVD反应堆设计为在CVD过程中提供最大的均匀性和可重复性。HWDP处理室的设计允许前体的精确蒸发,这些前体在与热等离子体源接触时转化为等离子体状态。这个等离子体源具有高度的均匀性,为得到的涂层在整个基板上提供了一致的层厚度。此外,HWDP腔室设计消除了冷却的需要,允许更高的温度控制,以改善层密度。在整个腔室中使用温度传感器还可以实现精确的温度控制,以改善层的均匀性和性能控制。APPLICED MATERIALS Centura Ultima HDP CVD反应堆也被设计为促进高通量性能。加工室设计为在低压下运行,允许前体和过程控制气体的高流量。可以利用这种高吞吐量最大限度地提高产量和产量,同时保持最高级别的工艺和质量控制。Centura Ultima HDP CVD是各种CVD应用的绝佳工具。从制造半导体封装的高密度层到生物医学材料和纳米技术,这种反应器的特点是能够促进涂层的沉积,提高了均匀性和可重复性。这种反应器非常适合需要精确控制层厚度、温度和均匀性的应用,能够为最先进的技术沉积HDP层。
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