二手 AMAT / APPLIED MATERIALS Centura Ultima HDP #9223731 待售

ID: 9223731
晶圆大小: 8"
优质的: 2001
CVD System, 8" System general: Mainframe: Centura 5200 DCVD Wafer type: Notch Chamber position A, B, C: HDP Ultima plus chamber, 8" Chamber E position: Multi-slot cool down chamber Chamber F position: Wafer orienter chamber System controllers: SBC V452 Board VGA Board P3 Board Facility and safety configurations: EMO Switch type: Turn to release EMO EMO Guard ring EMO Shunt trip Bracket standoff adapter Water and smoke detect output: Alarm Facility power indicator System water leak detector Main frame: Facilities type: Phase II System placement: Stand alone Front panel: Steel white polymer finish Facilities connection: VCR Facilities orientation: Mainframe facilities bottom connection Facilities water: Phase II water Controller IO interface option: I/O Expansion base card with seriplex gas panel card Interface: GEM Interface Load lock chamber type: Narrow body Transfer chamber: Transfer chamber manual lid lift Transfer chamber sensor Process chamber slit valve A, B, C: Bonded door with KALREZ O'ring Robot type: HP+ Robot (Dual speed) Basic wafer on blade detector N2 Purge MFC type: Unit instrument (UFC-1661) 1L Buffer purge slow vent flow: 500 sccm Dedicated transfer rough pump: EDWARDS Pump interface Mainframe inert gas lines: Chamber N2 supply Chambers N2 surface finish: 10 Ra Mainframe N2 supply Mainframes N2 surface finish: 10 Ra Chamber A configuration: Type: HDP Ultima plus chamber Frequency type: Top, side and bias RF Heater type: 0190-46458 Thermalogic board Manometer type: DUAL 10/100 TORR MKS Throttle valve: Turbo throttle valve plus rough throttle valve Gate valve type: 3870-04276, Pendulum ISO250 (Actuator 52.3) Turbo pump type: EBARA ET1600W Turbo pump controller: 1604W Turbo pump ring type: 0010-11762, CTR Ring assy, HDP-CVD Ultima plus Chamber O'ring type: KALREZ 9100 Clean method: RPS 0190-26744, MKS Astroni AX7670 Clean gas: NF3 Chamber A process kit: 0010-03090 ESC Cathode (WTM Type) 0040-18219 ESC (WTM Type) 0190-18430 WTM Probe 0200-18109 Collar 0200-18081 Cover ceramic 0200-01009 Top nozzle 0200-18093 Side nozzle 0200-01006 Dome 0040-04650 Gas ring with (24) nozzles 0200-40156 Lift pin ceramic Chamber B configuration: Type: HDP Ultima plus chamber Frequency type: Top, side and bias RF Heater type: 0190-46458 Thermalogic board Manometer type: Dual 10/100 TORR MKS Throttle valve: Turbo throttle valve plus rough throttle valve Gate valve type 3870-04276, Pendulum ISO250 Actuator 52.3 Turbo pump type: EBARA ET1600W Turbo pump controller: 1606W TF Turbo pump ring type: 0010-11762, CTR Ring assy, HDP-CVD Ultima plus Chamber o ring type: KALREZ 9100 Clean method: RPS 0190-26744RPS, MKS Astroni AX7670 Clean gas: NF3 EDWARDS Rough pump interface 0010-03090 ESC Cathode (WTM Type) 0040-18219 ESC (WTM Type) 0190-18430 WTM Probe 0200-18109 Collar 0200-18081 Cover ceramic 0200-01009 Top nozzle 0200-18093 Side nozzle 0200-01006 Dome 0040-04650 Gas ring with (24) nozzles 0200-40156 Lift pin ceramic Gas panel configurations: Gas panel type: HP 10 Ra Cabinet exhaust: Top exhaust Gas panel door Gas feed: Single-line drop (Bottom feed) Valve type: FUJIKIN 5 Ra max Filter: MILLIPORE Ni 10 ra max Fitting: VCR MFC: SEC-4400 MC (D-Sub 9 pins) Veriflo Regulator MKS Transducer with display unit Gas line configuration chamber A, B, C: Gas pallet: HDP Ultima plus Gas feed: Single-line drop (Bottom feed) Automatic gas line purging capability Gas 1: SiH4, 200 sccm Gas 2: NF3, 2000 sccm Gas 3: SiH4 Top, 20 sccm Gas 4: SIF4, 20 sccm Gas 5: AR Top, 50 sccm Gas 6: AR, 300 sccm Gas 7: HE, 200 sccm Gas 8: SIF4, 100 sccm Gas 9: O2, 400 sccm Gas 10: AR-MW, 2000 sccm System controller: Controller Type: Phase I Controller Controller GFCI: 30MA GFCI Controller UPS: Facilities ups interface Controller electrical interface: Top feed AC cables Controller exhaust: Top exhaust Cursor type: Blinking cursor Heat exchanger type: SMC Themo chiller, INR-498-001D Heat exchanger water fittings: Stainless steel Generator rack: Chamber A, B, and C top RF generator: ENI NOVA-50A Chamber A, B and C side RF generator: ENI NOVA-50A Chamber A, B and C bias RF generator: ENI GHW-50A Power: 200/208 VAC, 50 Hz, 400 A 2001 vintage.
AMAT/APPLIED MATERIALS Centura Ultima HDP Reactor是干式就地蚀刻和保形涂层领域的先进工具。该设备的设计使制造商能够以最小的努力和最小的复杂性实现高精度。HDP代表高密度等离子体,这是一种最新的等离子体技术,旨在对各种过程提供最高级别的性能和周期控制。AMAT Centura Ultima HDP反应堆满足了全球半导体制造商日益复杂的需求。该系统的高级功能和模块化体系结构为各种应用程序提供了快速实施、灵活性和可扩展性。这包括了纤薄的保形涂层、深反应性离子蚀刻(DRIE)、电镀铜升空(ECLO)等应用。应用材料CENTURA ULTIMA+HDP反应堆通过优化的吞吐量和周期控制提供了高水平的生产率。其多频射频等离子体源和水冷阴极可实现较小的特征尺寸控制和较低的薄膜应力,而线性质量流控制器则可实现对过程气体的精确控制。它的模块化体系结构使它能够以最小的干扰重新配置,并配置在多个机房中,从而能够快速、准确地并行处理众多部件。HDP反应堆采用等离子体源技术的最新进展,以优化蚀刻和保形涂层工艺。其全新设计的等离子体源和腔室允许高长宽比蚀刻和涂层。HDP反应堆的高级过程控制功能有助于实现严格的过程分布,从而减少了操作员手动调整的需要。该单位的实时过程监控允许快速决策和快速纠正行动。该机集成了智能诊断功能,可实现快速错误反馈和最小停机时间。它的在线模拟功能使用户能够快速调整配方并进行必要的更改,而无需长时间设置。此外,其数据输出可用于记录相关流程细节和提高流程监控能力。AMAT/APPLIED MATERIALS CENTURA ULTIMA+HDP Reactor是世界上最新型、最先进的干版蚀刻和保形涂层工具。该工具专为寻求具有高精度和重复性的可靠高效资产的半导体制造商而设计。它的高级功能和模块化体系结构实现了快速的实施和可扩展性,使其能够以最小的中断进行重新配置,并配置在多个机房中,以涵盖各种应用程序。AMAT CENTURA ULTIMA+HDP Reactor提供了高水平的生产力,并配备了等离子源技术的最新进步,让用户达到复杂工艺所需的精度。
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