二手 AMAT / APPLIED MATERIALS Centura Ultima X #9107256 待售
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ID: 9107256
晶圆大小: 12"
优质的: 2003
CVD System, 12"
Wafer Shape JMF
Position A ULTIMA X HDP-CVD
Position B ULTIMA X HDP-CVD
Position C ULTIMA X HDP-CVD
Position D NA
Position A Process OXIDE - USG / STI
Position B Process OXIDE - USG / STI
Position C Process OXIDE - USG / STI
Position D Process NA
Line Voltage 208 VAC
Line Amperage PRIMARY 320A, SECONDARY 240A
(A) ULTIMA X HDP-CVD
Ultima X Chamber Options Selected Option
Integrated Process Module IPM : YES
Turbo Pump TMP-3203LMC-A1
Nozzle Type
Gas Ring 36 PORT
Top Baffle
Upper Chamber ENHANCED
Process Application USG / STI
Process Kit STANDARD
Clean Method NPP RPS (NEW POWER PLASMA)
Independent Helium Cooling ENABLED
(B) - (Z7) ULTIMA X HDP-CVD
Ultima X Chamber Options Selected Option
Integrated Process Module IPM : YES
Turbo Pump TMP-3203LMC-A1
Nozzle Type
Gas Ring 36 PORT
Top Baffle
Upper Chamber ENHANCED
Process Application USG / STI
Process Kit STANDARD
Clean Method NPP RPS (NEW POWER PLASMA)
Independent Helium Cooling ENABLED
(C) - (Z7) ULTIMA X HDP-CVD
Ultima X Chamber Options Selected Option
Integrated Process Module IPM : YES
Turbo Pump TMP-H3603LMC-A1
Nozzle Type
Gas Ring 36 PORT
Top Baffle
Upper Chamber ENHANCED
Process Application USG / STI
Process Kit STANDARD
Clean Method NPP RPS (NEW POWER PLASMA)
Independent Helium Cooling ENABLED
Gas Delivery Options
Gas Panel Selected Option
Gas Feed BOTTOM
Gas Panel Exhaust BOTTOM
MFC Type UNIT 8565 & 8565C
Gas Panel Door STANDARD
Valves VERIFLO
Display Gas Pallets
Gas Lines
Transducers NONE
Regulators NONE
Filters Millipore/Mykrolis/NAS Clean
A - (Z7) ULTIMA X HDP-CVD PALLET Selected Option
Gas Pallet
Line 1 Upper N2 PURGE
Line 1 Lower O2 - 1L
Line 2 H2 (MFC Missing)
Line 3 HE - 600SCCM
Line 4 SiH4 - 400SCCM
Line 5 AR - 1L
Line 6 HE - 600SCCM
Line 7 H2 - 1L
Line 8 SiH4 - 50SCCM
Line 9 AR - 50SCCM
Line 10 NF3 - 400SCCM
Line 11 NF3 - 15SLM
Line 12 Ar - 3L
Line 13 Lower
Line 13 Upper N2 PURGE
Plasma Detect YES
B - (Z7) ULTIMA X HDP-CVD PALLET
Gas Pallet
Line 1 Upper N2 PURGE
Line 1 Lower O2 - 1L
Line 2 H2 (MFC Missing)
Line 3 HE - 600SCCM
Line 4 SiH4 - 400SCCM
Line 5 AR - 1L
Line 6 HE - 600SCCM
Line 7 H2 (MFC Missing)
Line 8 SiH4 - 50SCCM
Line 9 AR - 50SCCM
Line 10 NF3 - 400SCCM
Line 11 NF3 - 15SLM
Line 12 Ar - 10SLM
Line 13 Lower
Line 13 Upper N2 PURGE
Plasma Detect YES
C - (Z7) ULTIMA X HDP-CVD PALLET
Gas Pallet
Line 1 Upper N2 PURGE
Line 1 Lower O2 - 400SCCM
Line 2 NF3 - 400SCCM
Line 3 H2 - 1L
Line 4 SiH4 - 400SCCM
Line 5 HE - 600SCCM
Line 6 AR - 50SCCM
Line 7 H2 - 1L
Line 8 SiH4 - 50SCCM
Line 9 HE - 600SCCM
Line 10 NF3 - 400SCCM
Line 11 NF3 - 15SLM
Line 12 Ar - 3L
Line 13 Lower
Line 13 Upper N2 PURGE
Plasma Detect YES
Mainframe Options
Process Chamber Isolation
CHAMBER A SLIT VALVE
CHAMBER B SLIT VALVE
CHAMBER C SLIT VALVE
Mainframe and FI Alignment MF AND FI ALIGNMENT FIXTURES
CFW Manifold YES
LL and Xfer Ch Vac and Vent
Mainframe Type AP MAINFRAME
SWLL Doors AP STD SWLL DOOR
SWLL Cooldown
Wafer Hoop Type WAFER HOOP
Transfer Chamber Robot Blades
Transfer Chamber Robots STD REACH DUAL BLADE ROBOT
Transfer Chamber Lid CLEAR LID
Factory Interface Options
WIP Delivery Type OHT WIP DELIVERY
Number of Load Ports 2 LOAD PORTS
Atmospheric Robots KAWASAKI 2 FIXED ROBOTS WITH EDGE GRIP(C61D-B001)
Load Port Types ENHANCED 25 WAFER FOUP
E84 Carrier Handoff UPPER E84 INTERFACE ENABLED OHT
OHT Light Curtain LIGHT CURTAIN
Operator Access Switch YES
Configurable Colored Lights YES
Light Towers
Air Intake Systems
Remote Options
Sytem Monitors Selected Option
Monitor 1 FLAT PANEL WITH KEYBOARD ON STAND
Monitor 2
Heat Exchanger Selected Option
Heat Exchanger Type NA
Umbilicals Selected Option
Heat Exchanger Hose Length
Pumps Selected Option
Pump Supplied By NA
Pump Interface Type NA
AC Racks Selected Option
Facilities UPS Interface YES
Chamber Generator Type ENI GENERATOR RACK
SMC HX H2O Connection NA
QIL HX Qty
Ch A RF Generator Type ENI GENERATOR RACK (SPECTRUM B-10513)
Ch B RF Generator Type ENI GENERATOR RACK (SPECTRUM 11002-00)
Ch C RF Generator Type ENI GENERATOR RACK (SPECTRUM 11002-00)
Heat Exchanger Cable Length
Pump Interface Cable Length
Monitor 1 Cables
Monitor 2 Cables
Missing Parts
Turbo Throttle Valve
Ch#B Gas Panel DIO Board
HDD
Currently warehoused
2003 vintage.
AMAT/APPLIED MATERIALS Centura Ultima X是为半导体制造而设计的下一代、高通量、晶圆大小的反应器。它能够处理多达8英寸的晶圆,并提供广泛的处理功能,从分层材料到处理沟槽、垫片和互连。该设备旨在满足半导体行业最先进的制造需求。利用Ultima X平台,AMAT提供了一个集成的晶圆制造解决方桉,具有高级芯片开发项目所需的扩展工艺能力。AMAT Centura Ultima X有两个晶圆处理室，有一个9千瓦的加工室和一个3千瓦的二级辅助室。这两个腔室都连接到一个具有高真空密封的通用工艺阀站，并具有一个通用的气体分配系统来供应工艺气体。反应堆的气体分配单元由单一的中央自动化控制器控制，并在整个机器中提供可靠的均匀气体分配。Ultra X还配备了一个电子隔离阀站，这有助于确保与工艺气体相关的任何潜在污染最小化。Ultima X还提供了低温退火模块,确保晶片在尽可能低的温度下进行处理以获得最佳性能。该工具还可以配置一系列附加功能和附件，包括附加传感器、溅射目标和等离子体处理室。APPLIED MATERIALS Centura Ultima X是为了与多种炉型设计相容而设计的，包括水平和垂直的热壁管炉和多级水平冷晶片反应堆。它具有与通用半导体控制系统一致的接口,使其成为一个可以满足您所有制造需求的多功能集成解决方桉。Ultima X还提供了多种高级功能,包括嵌入金属模块,该模块允许您在不需要将晶片暴露于环境中的情况下对其他金属化层进行分层。此功能还有助于减少周期时间,并使设备制造更加高效和经济高效。Ultima X的高级控制系统还确保所有晶片的工艺配方和温度一致。总之,Centura Ultima X是一款先进的高通量半导体制造工具,提供多种工艺功能。Ultima X高度集成的平台有助于创建可靠的流程,其高级功能缩短了周期时间,并有助于创建具有可靠性能和持久可靠性的经济高效的晶圆。
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