二手 AMAT / APPLIED MATERIALS Endura 5500 HP #9223524 待售
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ID: 9223524
晶圆大小: 8"
PVD System, 8"
Multi-chamber sputtering system
Process: Copper
Dry pump type: EBARA AA40W (System)
LLA
LLB
(2) Al
(2) Ta PVD
(2) PCII
(2) DG
System controller
SMIF System:
(2) LPT 2200
(2) Load locks
Handler system:
Buffer Hp
Transfer VHp
(2) Hoisters
Process chambers:
(2) ImpTa
(2) ClampAl
(2) PcII
(2) Degas
Main AC
NESLAB Chiller
(3) General racks
(2) Compressors
(4) EBARA Pumps
Chamber 1: B101 IMP Ta
Shutter disk
Body type: WB
Source type: Vectra IMP
Magnet type: RH-2
MFCs: Ar 140sccm
DC Generator: ADVANCED ENERGY MDX-L6
RF Generator:
ADVANCED ENERGY HFV8000 (RF Coil)
COMDEL CX-600S (AC Bias)
RF Match:
HE
BIAS
Vectra IMP
010CAP 2MHz (RF Coil)
13.56 MHz (AC Bias)
Cryo Pump: CTI On-Board 8F
No turbo pump
Chamber 2 & 3: Clamp Al
Body type: WB
Source type: 12.9''
Magnet type: Al A, 12.9''
DC Generator: ADVANCED ENERGY MDX-L12M
MFCs:
Ar 140sccm
Ar-H 70sccm
Cryo pump: CTI On-board 8F
No shutter disk
No RF Generator
No RF Match
No turbo pump
Chamber: 4 B101 IMP Ta
Shutter disk
Body type: WB
Source type: Vectra IMP
Magnet type: RH-2
MFCs: Ar 140 sccm
ADVANCED ENERGY MDX-L6 DC Generator
RF Generator:
ADVANCED ENERGY HFV8000 RF Coil
COMDEL CX-600S AC Bias
RF Match:
HE
BIAS
Vectra IMP
010CAP 2MHz (RF Coil)
13.56MHz (AC Bias)
Cryo pump: CTI On-board 8F
No turbo pump
Chamber A & B: Cool down
Dry pump: EBARA AA20N
Pedestal type: Clncool
Chamber C & D: PCII
Process: Etch
PK Type: PIKII Pinless
Dry pump: EBARA AA20N
Turbo pump: LEYBOLD TMP
RF Generator:
COMDEL CPS1001S 13.56MHz
RFPP LF10A 400KHz
RF Match: PC II 13.56MHz
MFCs:
Ar 28sccm
Ar 420sccm
No DC Generator
No cryo pump
Chamber E & F: O/D
Degas type: Standard
Buffer & Transfer:
Cryo pump: CTI On-board 8F
Robot type: HP
Load lock:
Body type WB
Venting & pumping mode:
Soft slow
Fast
Wafer mapping: Standard
No scrubber / CDO
Heat exchanger: NESLAB III (PVD Chm)
Cryo compressor: Water cooled 9600
CIM Linked.
AMAT/APPLIED MATERIALS Endura 5500 HP Reactor是一种紧凑、自动化的CVD工具,旨在为高级材料应用可靠地进行高精度处理。该反应堆具有无与伦比的速度和精度能力,其微米级精度和长达10分钟的垂直扫描时间。AMAT Endura 5500 HP配备了一个设计强大的腔室,非常适合大批量作业和最复杂的作业。它利用双频等离子体在广泛的工艺条件下实现优化沉积能力。双引擎、高性能射频动力模块、多个独立沉积源和可调腔室温度为最先进的应用提供了一套高度可重复的工艺参数。Endura的突出功能包括强大的控制和自动化功能。它有一个先进的机器人手臂,带有集成的端效应器,使它能够精确控制晶圆载体通过腔室的轨迹。Endura还提供了一个用户友好的Graphical User Interface系统,该系统允许快速更改参数和实时监控流程。机动室元件,如机械手臂、石英室和气体输送系统,使APPLIED MATERIALS Endura 5500 HP可以无限调整超精确薄膜功能。该反应堆可用于使用有机金属试剂的沉积过程,如基于臭氧的过程,以及使用固相前体的沉积过程。Endura 5500 HP旨在提供卓越的可靠性和性能。它的高级功能提供灵活的流程开发功能,包括流程分析、诊断、远程监视和数据日志记录。反应堆还具有各种安全功能,以保护操作员和系统本身免受潜在危害。AMAT/APPLIED MATERIALS Endura 5500 HP是一种高效可靠的反应堆,可以处理最具挑战性的沉积应用。它是先进材料应用的理想选择,允许以前所未有的产量生产高质量的薄膜和表面。
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