二手 AMAT / APPLIED MATERIALS Endura 5500 HP #9223524 待售

ID: 9223524
晶圆大小: 8"
PVD System, 8" Multi-chamber sputtering system Process: Copper Dry pump type: EBARA AA40W (System) LLA LLB (2) Al (2) Ta PVD (2) PCII (2) DG System controller SMIF System: (2) LPT 2200 (2) Load locks Handler system: Buffer Hp Transfer VHp (2) Hoisters Process chambers: (2) ImpTa (2) ClampAl (2) PcII (2) Degas Main AC NESLAB Chiller (3) General racks (2) Compressors (4) EBARA Pumps Chamber 1: B101 IMP Ta Shutter disk Body type: WB Source type: Vectra IMP Magnet type: RH-2 MFCs: Ar 140sccm DC Generator: ADVANCED ENERGY MDX-L6 RF Generator: ADVANCED ENERGY HFV8000 (RF Coil) COMDEL CX-600S (AC Bias) RF Match: HE BIAS Vectra IMP 010CAP 2MHz (RF Coil) 13.56 MHz (AC Bias) Cryo Pump: CTI On-Board 8F No turbo pump Chamber 2 & 3: Clamp Al Body type: WB Source type: 12.9'' Magnet type: Al A, 12.9'' DC Generator: ADVANCED ENERGY MDX-L12M MFCs: Ar 140sccm Ar-H 70sccm Cryo pump: CTI On-board 8F No shutter disk No RF Generator No RF Match No turbo pump Chamber: 4 B101 IMP Ta Shutter disk Body type: WB Source type: Vectra IMP Magnet type: RH-2 MFCs: Ar 140 sccm ADVANCED ENERGY MDX-L6 DC Generator RF Generator: ADVANCED ENERGY HFV8000 RF Coil COMDEL CX-600S AC Bias RF Match: HE BIAS Vectra IMP 010CAP 2MHz (RF Coil) 13.56MHz (AC Bias) Cryo pump: CTI On-board 8F No turbo pump Chamber A & B: Cool down Dry pump: EBARA AA20N Pedestal type: Clncool Chamber C & D: PCII Process: Etch PK Type: PIKII Pinless Dry pump: EBARA AA20N Turbo pump: LEYBOLD TMP RF Generator: COMDEL CPS1001S 13.56MHz RFPP LF10A 400KHz RF Match: PC II 13.56MHz MFCs: Ar 28sccm Ar 420sccm No DC Generator No cryo pump Chamber E & F: O/D Degas type: Standard Buffer & Transfer: Cryo pump: CTI On-board 8F Robot type: HP Load lock: Body type WB Venting & pumping mode: Soft slow Fast Wafer mapping: Standard No scrubber / CDO Heat exchanger: NESLAB III (PVD Chm) Cryo compressor: Water cooled 9600 CIM Linked.
AMAT/APPLIED MATERIALS Endura 5500 HP Reactor是一种紧凑、自动化的CVD工具,旨在为高级材料应用可靠地进行高精度处理。该反应堆具有无与伦比的速度和精度能力,其微米级精度和长达10分钟的垂直扫描时间。AMAT Endura 5500 HP配备了一个设计强大的腔室,非常适合大批量作业和最复杂的作业。它利用双频等离子体在广泛的工艺条件下实现优化沉积能力。双引擎、高性能射频动力模块、多个独立沉积源和可调腔室温度为最先进的应用提供了一套高度可重复的工艺参数。Endura的突出功能包括强大的控制和自动化功能。它有一个先进的机器人手臂,带有集成的端效应器,使它能够精确控制晶圆载体通过腔室的轨迹。Endura还提供了一个用户友好的Graphical User Interface系统,该系统允许快速更改参数和实时监控流程。机动室元件,如机械手臂、石英室和气体输送系统,使APPLIED MATERIALS Endura 5500 HP可以无限调整超精确薄膜功能。该反应堆可用于使用有机金属试剂的沉积过程,如基于臭氧的过程,以及使用固相前体的沉积过程。Endura 5500 HP旨在提供卓越的可靠性和性能。它的高级功能提供灵活的流程开发功能,包括流程分析、诊断、远程监视和数据日志记录。反应堆还具有各种安全功能,以保护操作员和系统本身免受潜在危害。AMAT/APPLIED MATERIALS Endura 5500 HP是一种高效可靠的反应堆,可以处理最具挑战性的沉积应用。它是先进材料应用的理想选择,允许以前所未有的产量生产高质量的薄膜和表面。
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