二手 AMAT / APPLIED MATERIALS Endura 5500 #166248 待售

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ID: 166248
Sputtering system, 8" Process: AlCu / TiN / Ti Specifications: Robot: Buffer: AMAT HP, ceramic blade Transfer: AMAT HP, metal blade System monitor: 1: stand alone 2: through the wall 3: stand alone (1) each monitor rack Load lock: Narrow body with tits in and out No sliding sensor kit Chamber A - Chamber type: Pass through - Chamber Lid: Metal Lid - Cooling method: NA Chamber B - Chamber type: Cool down - Chamber Lid: Metal lid - Cooling method: By PCW Chamber C - Chamber type: N/A - Chamber process: - RF Gen/DC power supply - Turbo pump: - Process gas Chamber D - Chamber type: Preclean I - Chamber process: - RF Gen/DC power supply1: - RF Gen/DC power supply2: - Turbo pump Chamber F: - Chamber type: Orient/Degas Chamber 1 - Chamber type: Standard body - Chamber process: AlCu, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K SLAVE - RF Gen/DC power supply2: A, MDX-20K MASTER - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: P/N 0010-20059 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 2 - Chamber type: Wide Body - Chamber process: TiN - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: : CTI CRYO 8F 2phase - Source(Lid) type : P/N 0010-20059 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 3 - Chamber type: Wide Body - Chamber process: Ti - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: P/N 0010-70059 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 4 - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: P/N 0010-20059 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Includes: - Heat exchanger type: Neslab III 1ea - Compressor type: CTI 8500 2ea - EMO on source cover : No - Shutter : No - SBC : V440 - KSI Shild Treatment DC Power Supply 1ea - AE, MDX-052, SHILD TREATMENT CONTROLLER - COMDEL, CPS-1001 RF POWER SOURCE 60.00Hz - 15V P.S. ASSEMBLY / 24V P.S. ASSEMBLY Installed 1994 vintage.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500反应堆是为满足现代半导体器件制造商的需求而设计的下一代等离子蚀刻设备。该反应堆系统能够为各种先进的CMOS、3D NAND和DRAM存储器和逻辑设备提供精确的蚀刻过程。AKT Endura 5500采用专有集成喷嘴和高密度等离子体源,可提供出色的蚀刻速率、大晶圆区域的高均匀性以及快速腔室循环以提高吞吐量。AMAT ENDURA 5500配有强大的真空泵单元和较高的动力压力,便于从工艺室内快速清除排气材料。该机配备了最新的等离子体源和分布技术,允许用户实时调整蚀刻参数,微调蚀刻结果,最大限度地减少加工过程中对细腻表面的损伤。该工具的塑料外壳旨在抑制声响,保护资产的精密部件免受振动和电磁干扰。它还包含一个集成的气体输送模型和散装气体供应,允许精确输送和控制多个蚀刻气体。APPLIED MATERIALS ENDURA 5500配备了可配置的工作站和控制器,允许用户根据材料或产品要求存储、召回和调整蚀刻配方。其他功能包括多流程功能、手动/自动流控制、可配置的批处理参数、诊断和报告。AMAT Endura 5500专为在Class 1 Clean Room环境中进行清洁操作而设计,它具有多种灵活操作配置,包括手动/远程/控制台操作。这种反应堆设备的制造达到了最高质量标准,提供了可靠和可重复的结果。它在一个灵活的平台上提高了产量、吞吐量和操作经济性。
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