二手 AMAT / APPLIED MATERIALS Endura 5500 #166249 待售

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ID: 166249
优质的: 1993
Sputtering system, 8" Wafer size: 8" flat (not notch) Configuration: Chamber 1: AlCu Chamber 2: TiN Chamber 3: Ti Chamber 4: Ti Preheat Etch Clean bench Clamp (not electrostatic chuck) Robot: Buffer: AMAT HP, ceramic blade Transfer: AMAT HP, metal blade System monitor: 1: stand alone 2: through the wall 3: stand alone (1) each monitor rack Load lock: Narrow body with tits in and out No sliding sensor kit Chamber A - Chamber type: Pass through - Chamber Lid: Metal Lid - Cooling method: NA Chamber B - Chamber type: Cool down - Chamber Lid: Metal lid - Cooling method: By PCW Chamber D - Chamber type: Preclean I - Chamber process: - RF Gen/DC power supply1: - RF Gen/DC power supply2: - Turbo pump Chamber F: - Chamber type: Orient/Degas Chamber 1 - Chamber type: Standard body - Chamber process: AlCu, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K SLAVE - RF Gen/DC power supply2: A, MDX-20K MASTER - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: P/N 0010-70086 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 2 - Chamber type: Wide Body - Chamber process: TiN - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: : CTI CRYO 8F 2phase - Source(Lid) type : UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 3 - Chamber type: Wide Body - Chamber process: Ti - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 4 - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Includes: - Heat exchanger type: Neslab III 1ea - Compressor type: CTI 8500 2ea - EMO on source cover : No - Shutter : No - SBC : V440 - KSI Shild Treatment DC Power Supply 1ea - AE, MDX-052, SHILD TREATMENT CONTROLLER - COMDEL, CPS-1001 RF POWER SOURCE 60.00Hz - 15V P.S. ASSEMBLY / 24V P.S. ASSEMBLY - 2Board MISC. on MASS STROAGE BOARD Includes pumps Installed 1994 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种等离子体蚀刻反应器,设计用于高精度加工和生产精细微电子元件。AKT Endura 5500是一种全封闭设备,由一个工艺室、一个外部真空泵和一些其他外围部件组成。该系统旨在提供可靠、一致的工艺结果,非常适合蚀刻、制图和其他精密的微电子加工需要。AMAT ENDURA 5500的製程室是一个铝圆顶的外壳,内衬陶瓷窗口,以保护内部的製程元件。反应堆使用各种气体和能源来创建和定义错综复杂的模式。气瓶或歧管可以连接到腔室,视应用情况而定,并提供反应化学,按照可编程控制器的指示与表面材料相互作用。还安装了电磁场发生器,为过程控制提供必要的离子能。ENDURA 5500允许可调压力、流量和温度控制设置,由反应性气体阀和腔室热电偶管理。压力由两级外部真空泵维持,启动时自动除气。这样可以确保在生产开始之前,工艺室没有任何杂质.除了控制外,AMAT/APPLIED MATERIALS/AKT ENDURA 5500还为操作员提供先进的监测和诊断工具,以确保最大限度的生产力。其中包括实时数据显示、压力监视器和可设置用于管理流程持续时间的精确计时器。此外,该装置还具有超压和过热防护等内置安全功能。这确保了最高质量的产品和高效的生产率。Endura 5500以可靠性着称,一贯提供高品质的蚀刻效果。这使得它成为各种微电子加工需求的理想选择。其可调的控制、诊断工具和内置的安全功能也确保了机器高效,并呈现出优异的效果。
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