二手 AMAT / APPLIED MATERIALS Endura 5500 #166249 待售
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ID: 166249
优质的: 1993
Sputtering system, 8"
Wafer size: 8" flat (not notch)
Configuration:
Chamber 1: AlCu
Chamber 2: TiN
Chamber 3: Ti
Chamber 4: Ti
Preheat
Etch
Clean bench
Clamp (not electrostatic chuck)
Robot:
Buffer: AMAT HP, ceramic blade
Transfer: AMAT HP, metal blade
System monitor:
1: stand alone
2: through the wall
3: stand alone
(1) each monitor rack
Load lock:
Narrow body with tits in and out
No sliding sensor kit
Chamber A
- Chamber type: Pass through
- Chamber Lid: Metal Lid
- Cooling method: NA
Chamber B
- Chamber type: Cool down
- Chamber Lid: Metal lid
- Cooling method: By PCW
Chamber D
- Chamber type: Preclean I
- Chamber process:
- RF Gen/DC power supply1:
- RF Gen/DC power supply2:
- Turbo pump
Chamber F:
- Chamber type: Orient/Degas
Chamber 1
- Chamber type: Standard body
- Chamber process: AlCu, Preheat
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K SLAVE
- RF Gen/DC power supply2: A, MDX-20K MASTER
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: P/N 0010-70086
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 2
- Chamber type: Wide Body
- Chamber process: TiN
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: : CTI CRYO 8F 2phase
- Source(Lid) type : UNIDENTIFIED
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 3
- Chamber type: Wide Body
- Chamber process: Ti
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE, MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: UNIDENTIFIED
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Chamber 4
- Chamber type: Wide body
- Chamber process: Ti, Preheat
- Process kit type/items/material: UNKNOWN
- RF Gen/DC power supply1: AE MDX-10K MASTER
- RF Gen/DC power supply2: N/A
- Chamber pump: CTI CRYO 8F 2phase
- Source (Lid) type: UNIDENTIFIED
- Pedestal type: A101 HEATER, Lifter : P/N 0010-20300
- Process gas: Ar, N2
Includes:
- Heat exchanger type: Neslab III 1ea
- Compressor type: CTI 8500 2ea
- EMO on source cover : No
- Shutter : No
- SBC : V440
- KSI Shild Treatment DC Power Supply 1ea
- AE, MDX-052, SHILD TREATMENT CONTROLLER
- COMDEL, CPS-1001 RF POWER SOURCE 60.00Hz
- 15V P.S. ASSEMBLY / 24V P.S. ASSEMBLY
- 2Board MISC. on MASS STROAGE BOARD
Includes pumps
Installed
1994 vintage.
AMAT/APPLIED MATERIALS/AKT Endura 5500是一种等离子体蚀刻反应器,设计用于高精度加工和生产精细微电子元件。AKT Endura 5500是一种全封闭设备,由一个工艺室、一个外部真空泵和一些其他外围部件组成。该系统旨在提供可靠、一致的工艺结果,非常适合蚀刻、制图和其他精密的微电子加工需要。AMAT ENDURA 5500的製程室是一个铝圆顶的外壳,内衬陶瓷窗口,以保护内部的製程元件。反应堆使用各种气体和能源来创建和定义错综复杂的模式。气瓶或歧管可以连接到腔室,视应用情况而定,并提供反应化学,按照可编程控制器的指示与表面材料相互作用。还安装了电磁场发生器,为过程控制提供必要的离子能。ENDURA 5500允许可调压力、流量和温度控制设置,由反应性气体阀和腔室热电偶管理。压力由两级外部真空泵维持,启动时自动除气。这样可以确保在生产开始之前,工艺室没有任何杂质.除了控制外,AMAT/APPLIED MATERIALS/AKT ENDURA 5500还为操作员提供先进的监测和诊断工具,以确保最大限度的生产力。其中包括实时数据显示、压力监视器和可设置用于管理流程持续时间的精确计时器。此外,该装置还具有超压和过热防护等内置安全功能。这确保了最高质量的产品和高效的生产率。Endura 5500以可靠性着称,一贯提供高品质的蚀刻效果。这使得它成为各种微电子加工需求的理想选择。其可调的控制、诊断工具和内置的安全功能也确保了机器高效,并呈现出优异的效果。
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