二手 AMAT / APPLIED MATERIALS Endura 5500 #190620 待售
看起来这件物品已经卖了。检查下面的类似产品或与我们联系,我们经验丰富的团队将为您找到它。
单击可缩放
已售出
ID: 190620
晶圆大小: 8"
优质的: 1995
PVD Sputtering system, 8"
Chamber Type: 4 Chamber (1 Standard Body, 3 Wide Body), Pre-Clean 1 Type
Process: Al Cu, Ti, TiN
Wafer size: 8" / JMF
Configuration:
Chamber A: Pass through
Chamber B: Cool down
Chamber D: Preclean I
Chamber F: Orienter degas
Chamber 1: ALCu (clamp)
Chamber 2: TiN (101)
Chamber 3: Ti (101)
Chamber 4: Ti (clamp)
Robot:
Buffer: HP
Transfer: HP
Load Lock:
Narrow body with tilts in/out
No sliding sensor kit
Chamber A:
Type: pass through
Lid: metal
Cooling method: N/A
Chamber B:
Type: cool down
Lid: metal
Cooling method: by PCW / by gas
Chamber D:
Type: Preclean I
Process: oxide etch
RF Gen/DC power supply 1: CPS-1001
RF Gen/DC power supply 2: N/A
Leybold 361C: Turbo/Cryo pump Type
Chamber 1:
Type: standard body
Process: Al Cu, 0010-20225
RF Gen/DC power supply 1: AE MDX-L12M (Master)
RF Gen/DC power supply 2: AE MDX-L12 (Slave)
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve type: 2-position
Pedestal type: Clamp (4F)
Process Gas:
Ar STEC 100 N2 100sccm
Ar-HTR STEC 100 N2 100sccm
Chamber 2:
Type: wide body
Process: TiN, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve: 3-position
Pedestal type: 101
Process Gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Chamber 3:
Type: wide body
Process: Ti, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve: 3-position
Pedestal type: 101
Process Gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Chamber 4:
Type: wide body
Process: Ti, 0010-20223 B+
RF Gen/DC power supply 1: AE MDX-L12
RF Gen/DC power supply 2: N/A
RF Gen/DC power supply 3: N/A
Turbo/Cryo pump Type: Cryo Pump, 3 phase
Gate valve type: 3-position
Pedestal type: clamp (4F)
Process gas:
N2 STEC 200 N2 200sccm
Ar STEC 100 N2 100sccm
Ar-HTR STEC 100 N2 100sccm
Heat exchanger: Neslab Type II
Compressor type: CTI 8500, CTI 9600
SBC type in controller: V21
Ion gauge type: nude
Main AC box: 220VAC, 3 Phase, 60Hz
System Monitor:
1st Monitor: stand alone
2nd Monitor: through the wall
3rd Monitor: -
Installed
1995 vintage.
AKT AMAT/APPLIED MATERIALS/AKT Endura 5500反应堆是一种先进的热处理设备，设计用于高效烧结陶瓷电容器。该系统具有优化的热工艺控制能力，保证了陶瓷材料的均匀重复加热，在广泛的工艺范围内提供了更好的温度控制。AKT Endura 5500还提供了高吞吐率和全面的污染预防功能,可用于可靠且可重复的烧结过程。AMAT ENDURA 5500具有低压、反应性气体的最佳烧结环境.一个独立的调制控制允许最大程度的灵活性，个别工艺参数。多区低压加热工艺室隔热良好，可用于快速加热和冷却工件。APPLIED MATERIALS ENDURA 5500还允许修改周期时间以满足特定要求。该单元配备了先进的过程监控功能，可用于优化机器性能。这些功能包括主动区域控制、温度均匀性、故障恢复、过温保护、热失控保护、压力监控、循环终止和剖面监控。这有助于用户最大限度地提高烧结循环精度，以获得更好的质量和可重复的结果。Endura 5500还具有自动晶圆映射和跟踪功能,可在烧结过程中完全追溯。为了满足最高的可靠性要求,该工具旨在支持过程清洁以防止污染,并且符合行业标准。AMAT/APPLIED MATERIALS/AKT ENDURA 5500是专门为陶瓷电容器烧结而设计的先进可靠的反应器。该资产通过主动区域控制、温度均匀性、故障恢复、过温保护和压力监控提供了增强的过程控制,以获得更好的可重复结果。它还具有自动晶圆映射和跟踪功能,以实现可追踪性。该模型旨在防止污染，符合行业标准，是陶瓷电容器烧结的理想选择。
还没有评论