二手 AMAT / APPLIED MATERIALS Endura 5500 #194704 待售

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ID: 194704
晶圆大小: 8"
优质的: 1993
Sputtering system, 8" Wafer size: 8" flat (not notch) Process: AlCu/ TiN/Ti Configuration: Chamber 1: AlCu Chamber 2: TiN Chamber 3: Ti Chamber 4: Ti Chamber 5: cooling chamber Preheat Etch Clamp (not electrostatic chuck) Robot: Buffer: AMAT HP, ceramic blade Transfer: AMAT HP, metal blade System monitor: 1: stand alone 2: through the wall 3: stand alone Includes (1) each monitor rack Load lock: Narrow body with tilts in/out No sliding sensor kit Chamber A: - Chamber type: Pass through - Chamber Lid: Metal Lid - Cooling method: NA Chamber B: - Chamber type: Cool down - Chamber Lid: Metal lid - Cooling method: By PCW Chamber D: - Chamber type: Preclean I Chamber F: - Chamber type: Orient/Degas Chamber 1: - Chamber type: Standard body - Chamber process: AlCu, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K SLAVE - RF Gen/DC power supply2: A, MDX-20K MASTER - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: P/N 0010-70086 - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 2: - Chamber type: Wide Body - Chamber process: TiN - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: : CTI CRYO 8F 2phase - Source(Lid) type : UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 3: - Chamber type: Wide Body - Chamber process: Ti - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE, MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Chamber 4: - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas: Ar, N2 Includes: - Chamber type: Wide body - Chamber process: Ti, Preheat - Process kit type/items/material: UNKNOWN - RF Gen/DC power supply1: AE MDX-10K MASTER - RF Gen/DC power supply2: N/A - Chamber pump: CTI CRYO 8F 2phase - Source (Lid) type: UNIDENTIFIED - Pedestal type: A101 HEATER, Lifter : P/N 0010-20300 - Process gas Installed 1993 vintage.
AKT/AMAT/APPLICED MATERIALS/AKT Endura 5500系列反应堆是先进的等离子体蚀刻沉积工具。AKT Endura 5500采用紧凑、易于使用的系统,可提供卓越的功能和准确性,以及低的拥有和维护成本。AMAT ENDURA 5500在大量食谱的过程灵活性和均匀性方面为蚀刻和沉积提供了全面的服务。获得专利的Uniformity Control Technology、Advanced Ultra High Plasma和蚀刻时间控制等功能允许用户优化流程以实现卓越性能。ENDURA 5500还提供了一系列出色的安全和环境特性,使其成为实验室和生产级别操作的理想选择。创新的Ultra-Flow工艺、热优化和动态压力控制可保护基板免受高温和腐蚀性材料的影响,同时确保结果一致。该系统有一系列令人印象深刻的工具可供使用,以进一步提高其性能和准确性。Endura 5500能够利用特殊的过程硬件,如线性电子束(LEB)发射器、微波源和离子束源,这取决于应用。它还能够利用优化的源材料、源功率和湍流管理功能最大限度地提高过程的重复性和均匀性。APPLICED MATERIALS Endura 5500的高性能设计结合其易用性和广泛的安全特性,使其成为各种等离子体蚀刻和沉积应用的理想选择。该反应堆可靠性高,能效高,结果一致,拥有和维护成本低。此外,它还提供了AMAT提供的一整套售后支持,让用户放心,他们的设备将在未来数年内保持运行状态。
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